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J

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1
论文数238
被引数
期刊论文 238
发表时间
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Plasma-assisted atomic layer etching of single-crystal diamond等离子体辅助单晶金刚石的原子层刻蚀
deleteJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
delete2026-05-01
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PREAI
deleteDraney, J. S.; Panagiotopoulos, A. Z.; Graves, D. B.
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Atomic layer deposition of SnO2 thin films using tin(IV) acetate as a novel precursor使用醋酸锡(IV)作为新型前驱体进行SnO2薄膜的原子层沉积
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IF2.1
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deleteDeb, Anjan; Mattinen, Miika; Heikkila, Mikko J.; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko; Putkonen, Matti
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Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride气体添加剂对硅氧化物和氮化物低温刻蚀中反应势垒的影响
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IF2.1
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deleteFan, Yichen; Lill, Thorsten; Wang, Mingmei; Wu, Dongjun; Iyer, Gopal; Barsukov, Yuri; Yang, Weitao; Singh, Harmeet
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Optimization of ion energy distribution and ion angular distribution by tuning chamber radius in inductively coupled plasma etching通过调整腔室半径优化感应耦合等离子体刻蚀中的离子能量分布和离子角分布
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IF2.1
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deleteHan, Jian-Hai; Wen, De-qi; Xu, Han-cheng; Xu, Shao-Feng; Guo, Ying; Shi, Jian-Jun
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Role of substrate heating in controlling meltpool behavior and reaction layer formation by the multibeam laser directed energy deposition基板加热在多束激光定向能量沉积中控制熔池行为和反应层形成的作用
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IF2.1
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deleteIlman, Kholqillah Ardhian; Yamashita, Yorihiro; Kunimine, Takahiro
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Microstructure and performance of microarc oxidation coatings doped with yttrium on TA4 commercial pure titanium钇掺杂微弧氧化涂层在TA4商业纯钛上的微观结构与性能
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IF2.1
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deleteNie, Xiaoying; Liu, Ping; Chen, Xiaohong
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Thermal modulation spectroscopy for bandgap determination in plasma-assisted molecular beam epitaxy-grown AlN等离子体辅助分子束外延生长AlN的带隙测定热调制光谱学
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IF2.1
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deleteContreras, E. A.; Vargas-Hernandez, L.; Zambrano-Serrano, M. A.; Trejo-Hernandez, R.; Felix-Quintero, H.; Avila-Gaxiola, J. C.; Casallas-Moreno, Y. L.; Yee-Rendon, C. M.; Lopez-Lopez, M.
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Influence of postdeposition temperature treatment on surface morphology of vanadium oxide grown by ion-beam sputter deposition后沉积温度处理对离子束溅射沉积生长的氧化钒表面形貌的影响
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IF2.1
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deleteWollenweber-Bienerth, Yan Ravil; Chatterjee, Sangam; Klar, Peter J.; Becker, Martin
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Temperature effects in oxidative molecular layer deposition (oMLD) of polypyrrole氧化分子层沉积法(oMLD)中聚吡咯的温度效应
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IF2.1
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deleteMehregan, Mahya; Mehregan, Shima; Young, Matthias J.
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STM and ARPES characterization of quality of GeSn grown on Ge(001) for atomic ordering investigations扫描隧道显微镜和角分辨光电子能谱表征在Ge(001)上生长的GeSn的质量以研究原子有序性
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deleteBaral, Dinesh; Joshi, Ram; Eldose, Nirosh M.; Stanchu, Hryhorii; de Oliveira, Fernando Maia; Zhang, Diandian; Du, Wei; Nakamura, Hiroyuki; Mazur, Yuriy I.; Yu, Shui-Qing; Salamo, Gregory J.
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Local slip resistances and critical resolved shear stresses for edge dislocation glide on high-order planes in two refractory multiprincipal element alloys在两种难熔多主元合金中，刃位错在高级别晶面上滑移的局部滑移阻力和临界分切应力
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deleteRaj, Anshu; Jian, Wu-Rong; Xu, Shuozhi
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Using combinatorial sputtering to uncover new magnetic high entropy alloys采用组合磁控溅射发现新型磁性高熵合金
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deleteMorley, Nicola A.; Rowan-Robinson, Richard M.; Wilkinson, Tom; Bai, Jing; Gu, Jianglong
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Atomic-scale confinement at the graphene/SiC interface: A platform for novel two-dimensional nanomaterials真空科学与技术A; LS Lu, A Vera, F Turker, CY Dong, M Wetherington, JA Robinson; 第44卷; 2026年出版; DOI: 10.1116/6.0005391; CR8
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deleteLu, Li-Syuan; Vera, Alexander; Turker, Furkan; Ananthanarayanan, Krishnan Mekkanamkulam; Dong, Chengye; Wetherington, Maxwell; Robinson, Joshua A.
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Tuning of atomic layer deposition pulse time through physics-informed Bayesian active learning通过物理信息贝叶斯主动学习调节原子层沉积脉冲时间
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deleteNavabi, Pouyan; Takoudis, Christos G.
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Morphology investigation of metalorganic vapor phase epitaxy homoepitaxial (001) β-Ga2O3 growth on on-axis and 6° off-axis substrates金属有机气相外延法在轴和6°偏离轴衬底上(001)β-Ga2O3同质外延生长的形貌研究
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deleteChen, Han-Hsu; Chou, Ta-Shun; Bin Anooz, Saud; Galazka, Zbigniew; Kwasniewski, Albert; Bergmann, Sabine; Popp, Andreas
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In vacuo investigation of atomic layer deposition of HfO2 thin films on TiN: A low energy ion scattering and x-ray photoelectron spectroscopy study of interface evolution真空中HfO2薄膜在TiN上的原子层沉积研究：界面演化的低能离子散射和X射线光电子能谱研究
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deleteChundak, Mykhailo; Nieminen, Heta-Elisa; Vehkamaki, Marko; Keranen, Laura; Putkonen, Matti; Ritala, Mikko
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Tuning the optoelectronic properties of NiOx thin films by atomic layer deposition with a precise incorporation of aluminum atoms通过原子层沉积精确掺铝原子调控NiOx薄膜的光电性质
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deleteCoutancier, Damien; Pinal, Yann; Priaud, Tristan; Johnson, Erik V.; Bechu, Solene; Bouttemy, Muriel; Schneider, Nathanaelle
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Controlled nucleation of metal-sulfide layers via surface functionalization with sulfur species: Enhanced initial growth of GaSx thin films通过硫物种表面功能化控制金属-硫化物层的成核：增强GaSx薄膜的初始生长
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deleteBaji, Zsofia; Kovacs, Zoltan; Szabo, Zoltan; Hakkel, Orsolya; Sulyok, Attila; Fogarassy, Zsolt; Berces, Zsofia; Volk, Janos
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Preparation of high-quality self-supporting aluminum films using a poly(α-methylstyrene) sacrificial layer利用聚(α-甲基苯乙烯)牺牲层制备高质量自支撑铝薄膜
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deleteZhang, Junhui; Cheng, Jiewei; Zhao, Shirong; Peng, Ruiqin; Zhang, Zihong; Huang, Yawen; Zhang, Wen; Zhong, Zhaoxin; Cao, Linhong; Fu, Yajun
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Publishing FAIR and machine-actionable reviews in materials science: The case for symbolic knowledge in neuro-symbolic artificial intelligence在材料科学中发布FAIR和机器可操作的评审：神经符号人工智能中符号知识的案例
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deleteD'Souza, Jennifer; Auer, Soren; Poupaki, Eleni; Watkins, Alex; Devi, Anjana; Puurunen, Riikka L.; Karasulu, Bora; Mackus, Adriaan; Kessels, Erwin
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