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Journal of Micro-Nanopatterning Materials and Metrology-JM3

IF1.8
论文数9
被引数
期刊论文 9
发表时间
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Enhanced multipopulation GA-BBO with chaotic acceleration for digital lithography mask optimization增强的多种群混沌加速GA-BBO算法在数字光刻掩模优化中的应用
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteHuang, Shengzhou; Pan, Jiani; Wu, Dongjie; Shao, Yongkang; He, Siwen
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Euler-Bernoulli bending theory applied to high NA EUV dense line-space patterning to characterize the line wigglingEuler-Bernoulli弯曲理论在表征高数值孔径EUV密集线-空间图案中线摆动中的应用
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteDe Simone, Danilo; Lorusso, Gian F.
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Optimizing experimental design for fast and accurate CD metrology of interconnects using coherent extreme-ultraviolet scatterometry利用相干极紫外散射测量法优化互连件快速精确的CD计量实验设计
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteKlein, Clay; Jenkins, Nicholas W.; Shao, Yunzhe; Li, Yunhao; Shin, Junho; Park, Seungbeom; Kim, Wookrae; Kapteyn, Henry C.; Murnane, Margaret M.
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Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake基于锡的金属氧化物抗蚀剂的光刻胶曝光和工艺化学基础理解：后曝光延迟和烘烤过程中环境气氛的影响
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
delete0
PREAI
deletePollentier, Ivan; Holzmeier, Fabian; Fallica, Roberto; Chen, Ying-Lin; Singh, Dhirendra P.; Piatti, Lorenzo; Suh, Hyo Seon; De Simone, Danilo; De Gendt, Stefan; Van Der Heide, Paul; Petersen, John; Dorney, Kevin
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Constitutive diffusion model for precise critical dimension patterning via beam shape optimization and effects on uniformity通过束形优化实现精确关键尺寸图形化的本征扩散模型及其对均匀性的影响
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteAlrashdan, Abdullah; Zohdi, Tarek
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Focus enhancement for image-based overlay metrology targets via generative models基于生成模型的图像对准测量标记的焦点增强
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteHyun, Minsung; Kwak, Nojun
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In-line metrology and inspection for hidden structure of lateral gate-all-around devices enabled by high voltage critical dimension scanning electron microscopy高电压关键尺寸扫描电子显微镜赋能的横向全环绕栅器件隐藏结构的在线测量与检测
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteShohjoh, Tomoyasu; Isawa, Miki; Lorusso, Gian Francesco; Horiguchi, Naoto; Mertens, Hans; Bogdanowicz, Janusz; De Bisschop, Peter; Charley, Anne-Laure
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X-ray metrology for advanced semiconductor manufacturing of next-generation logic devices先进半导体制造中下一代逻辑器件的X射线计量学
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deletePandey, Gaurav; Fu, Wei-En; Liu, Chun-Yu; Ho, Chao-Ching; Chen, Liang-Chia
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EUV Lithography: There is Still Much to DoEUV光刻：仍有许多工作要做
deleteJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
delete2026-01-01
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PREAI
deleteLevinson, Harry J.
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