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Lam Research Corporation

学者数161
论文数106
被引数1
关联论文 (106)
发表时间
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A class-wise quantum relational calibration network for brain tumor diagnosis一种基于类别的量子关系校准网络用于脑肿瘤诊断
errScientific Reports
IF3.9
err2026-08-04
err0
errOAAI
errJoen-Rong Sheu; Jingnan Xie; Chung-Nan Tsai; Cheng-Ying Hsieh; Ching-Sheng Lin
err分享
err收藏
Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride气体添加剂对硅氧化物和氮化物低温刻蚀中反应势垒的影响
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errFan, Yichen; Lill, Thorsten; Wang, Mingmei; Wu, Dongjun; Iyer, Gopal; Barsukov, Yuri; Yang, Weitao; Singh, Harmeet
err分享
err收藏
Plasma pretreatment to increase benzaldehyde attachment to the SiNx surface before atomic layer etching等离子体预处理以增加苯甲醛在SiNx表面的附着，用于原子层刻蚀前
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err1
PREAI
errWang, Xue; Gasvoda, Ryan J.; Hudson, Eric A.; Kumar, Prabhat; Agarwal, Sumit
err分享
err收藏
Mechanisms of room-temperature SiCN pre-bonding and low-temperature post-annealing of SiCN/nanocrystalline-nanotwinned Cu hybrid joints室温SiCN预键合和低温后退火SiCN/纳米晶-纳米孪晶Cu混合接头的机理
errApplied Surface Science
IF6.9
err2026-04-02
err0
PREAI
errPin-Syuan He; Hung-Ying Chen; Yun-Wei Chiang; Cheng-Chieh Kao; Bo-Cheng Huang; Guanyu Song; Pengyi Zhang; Wei-Lan Chiu; Mu-Ping Hsu; Kuan-Neng Chen; Chang-Chun Lee; Yu-Lan Liu; Kuang-Yu Chen; Chih Chen
err分享
err收藏
Temperature dependence of the growth per cycle during molecular layer deposition of polyurea on plasma deposited SiO2在等离子体沉积SiO2上聚合脲分子层沉积过程中每周期生长的温度依赖性
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errScholl, Wallis E.; Wang, Mingmei; Lill, Thorsten; Singh, Harmeet; Agarwal, Sumit
err分享
err收藏
Modeling insights into amorphous carbon etching by SO2/O2 low-pressure plasmaSO2/O2低压等离子体对无定形碳刻蚀的建模洞察
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errLevko, Dmitry; Wang, Mingmei
err分享
err收藏
Hydrogen bond-mediated activation of HF in SiO2 thermal dry etching: A first-principles study of catalytic additives二氧化硅热干法刻蚀中氢键介导的HF活化：催化添加剂的第一性原理研究
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errHuang, Yihan; Mathur, Monica Sawkar
err分享
err收藏
Formation and stability of ammonium fluorosilicate during etching of SiNx in CH2F2/Ar and SF6/H2 plasmas在CH₂F₂/Ar和SF₆/H₂等离子体中刻蚀SiNx时，氟硅酸铵的形成与稳定性
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errWang, Xue; Hossain, Md Tanzid; Kumar, Prabhat; Lill, Thorsten; Wang, Mingmei; Ozel, Taner; Singh, Harmeet; Agarwal, Sumit
err分享
err收藏
Use of an auxiliary electrode to control plasma properties at the wafer edge in inductively coupled plasmas with a substrate bias在具有基板偏置的感应耦合等离子体中，利用辅助电极控制晶圆边缘的等离子体特性
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errPiskin, Tugba; Sriraman, Saravanapriyan; Lee, Hyunjae; Nam, Sang Ki; Kushner, Mark J.
err分享
err收藏
Thermoelectric instability trends in argon radiofrequency plasmas氩射频等离子体中热电不稳定性的趋势
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err1
PREAI
errAlsaeed, Omar; Yee, Benjamin T.; Scheiner, Brett S.; Qu, Chenhui; Mamunuru, Meenakshi; Kay, Tyler; Lietz, Amanda M.
err分享
err收藏
Growth Mechanism During Initial Stages of Molecular Layer Deposition of Polyurea聚脲分子层沉积初始阶段的生长机制
errLangmuir
IF3.9
err2025-10-14
err0
PREAI
errWallis E. Scholl; Mingmei Wang; Thorsten Lill; Rachel A. Nye de Castro; Eric A. Hudson; Sumit Agarwal
err分享
err收藏
Enhancing the fracture resistance of 3D printed Zirconia via gyroid structures通过格罗皮乌斯结构增强3D打印氧化锆的断裂韧性
errScripta Materialia
IF5.6
err2025-07-24
err0
PREAI
errDahyun D. Lim; Vineeth Parashivamurthy; Jeong-Ho Lee; Xueying Zhao; Amar Kaul; Saman Gheytani; Grace X. Gu
err分享
err收藏
A New Scheduling Approach to Wafer-Residency-Time-Constrained Dual-Arm Cluster Tools Concurrently Processing Multivariety Wafers
errIEEE TRANSACTIONS ON SYSTEMS MAN CYBERNETICS-SYSTEMS
IF8.7
err2025-07-01
err1
PREAI
errWang, Jufeng; Leng, Tingting; Liu, Chunfeng; Zhou, MengChu; Zhao, Side
err分享
err收藏
Understanding the Contribution of Surface Temperature and Hydrogen Radicals to Hydrogen Plasma Reduction of Iron Oxide了解表面温度和氢自由基对氧化铁氢等离子体还原的贡献
errACS SUSTAINABLE CHEMISTRY & ENGINEERING
IF7.3
err2025-05-16
err0
PREAI
errEllis, DS; Pachchigar, V; Rebollar, J; Abuyazid, NH; Uner, NB; Krogstad, JA; Sankaran, RM
err分享
err收藏
Effect of process parameters on the growth of AlN coatings on Al-based alloy
errINTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS
IF4.6
err2025-01-01
err0
PREAI
errSoni, Rohan; Sarin, Vinod K.; Rao, Pratima; Srinivasan, Easwar; Basu, Soumendra N.
err分享
err收藏
Confinement and Threshold Modeling for High Temperature GeSn and GeC/GeCSn Lasers
errIEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
IF5.1
err2025-01-01
err0
PREAI
errReza, Md. Shamim; Dey, Tuhin; Arbogast, Augustus W.; Meng, Qian; Bank, Seth R.; Wistey, Mark A.
err分享
err收藏
Plasma sources for advanced semiconductor applications用于先进半导体应用的等离子体源
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-12-05
err2
errOAAI
errVersolato, Oscar; Kaganovich, Igor; Bera, Kallol; Lill, Thorsten; Lee, Hyo-Chang; Hoekstra, Ronnie; Sheil, John; Nam, Sang Ki
err分享
err收藏
Scheduling of Single-Arm Cluster Tools Handling Multiple Wafer Types Based on Double-Layer Configuration of Processing Modules
errIEEE TRANSACTIONS ON AUTOMATION SCIENCE AND ENGINEERING
IF6.4
err2024-10-01
err5
PREAI
errWang, Jufeng; Leng, Tingting; Liu, Chunfeng; Zhou, MengChu; Zhao, Side
err分享
err收藏
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-08-01
err12
errOAAI
errYu, Pengmei; Merkx, Marc J. M.; Tezsevin, Ilker; Lemaire, Paul C.; Hausmann, Dennis M.; Sandoval, Tania E.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.
err分享
err收藏
A novel adaptation of Naive Bayes methods for improving semiconductor fab yield
errINTERNATIONAL JOURNAL OF DATA SCIENCE AND ANALYTICS
IF2.8
err2024-06-06
err1
PREAI
errDayaratna, Kevin D.; McFarlane, Michael C.
err分享
err收藏