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E

E. Pargon

cnrs - institute for engineering & systems sciences (insis)

19H指数
311论文数
1.3K被引数
收录论文 18
发表时间
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Correction to “KOH Wet Etching Mechanisms of III–N Nanopillars: Impact of Temperature and Concentration”“KOH湿法腐蚀III–N纳米柱的机理：温度和浓度的影响”的勘误
errACS Applied Materials & Interfaces
IF0
err2026-05-15
err0
PREAI
errLucas Jaloustre; Saron-Rosy Sales De Mello; Sébastien Labau; Camille Petit-Etienne; Erwine Pargon
err分享
err收藏
KOH Wet Etching Mechanisms of III-N Nanopillars: Impact of Temperature and ConcentrationIII-N纳米柱的KOH湿法蚀刻机制：温度和浓度的影响
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-05-06
err0
PREAI
errLucas, J; Saron-Rosy, SD; Sebastien, L; Camille, PE; Erwine, P
err分享
err收藏
Fabrication of high aspect ratio AlN nanopillars by top-down approach combining plasma etching and wet etching等离子体刻蚀和湿法刻蚀相结合的自上而下方法制备高深宽比AlN纳米柱
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2024-10-01
err0
PREAI
errJaloustre, Lucas; De Mello, Saron Sales; Labau, Sebastien; Petit-Etienne, Camille; Pargon, Erwine
err分享
err收藏
Faceting mechanisms of GaN nanopillar under KOH wet etching
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2024-04-01
err2
errOAAI
errJaloustre, Lucas; De Mello, Saron Sales; Labau, Sebastien; Petit-Etienne, Camille; Pargon, Erwine
err分享
err收藏
3D interconnects for III-V semiconductor heterostructures for miniaturized power devices
errCELL REPORTS PHYSICAL SCIENCE
IF7.3
err2023-12-01
err1
errOAAI
errde Lafontaine, Mathieu; Bidaud, Thomas; Gay, Guillaume; Pargon, Erwine; Petit-Etienne, Camille; Turala, Artur; Stricher, Romain; Ecoffey, Serge; Volatier, Maite; Jaouad, Abdelatif; Valdivia, Christopher E.; Hinzer, Karin; Fafard, Simon; Aimez, Vincent; Darnon, Maxime
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Preferential crystal orientation etching of GaN nanopillars in Cl2 plasma
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2023-10-01
err7
errOAAI
errJaloustre, Lucas; Ackermann, Valentin; De Mello, Saron Sales; Labau, Sebastien; Petit-Etienne, Camille; Pargon, Erwine
err分享
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Reconfigurable Silicon Photonic Chip for the Generation Of Frequency-Bin-Entangled Qudits
errPHYSICAL REVIEW APPLIED
IF4.4
err2023-06-08
err13
errOAAI
errBorghi, Massimo; Tagliavacche, Noemi; Sabattoli, Federico Andrea; El Dirani, Houssein; Youssef, Laurene; Petit-Etienne, Camille; Pargon, Erwine; Sipe, J. E.; Liscidini, Marco; Sciancalepore, Corrado; Galli, Matteo; Bajoni, Daniele
err分享
err收藏
Programmable frequency-bin quantum states in a nano-engineered silicon device
errNATURE COMMUNICATIONS
IF15.7
err2023-01-12
err18
errOAAI
errClementi, Marco; Sabattoli, Federico Andrea; Borghi, Massimo; Gianini, Linda; Tagliavacche, Noemi; El Dirani, Houssein; Youssef, Laurene; Bergamasco, Nicola; Petit-Etienne, Camille; Pargon, Erwine; Sipe, J. E.; Liscidini, Marco; Sciancalepore, Corrado; Galli, Matteo; Bajoni, Daniele
err分享
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Nonlinear coupling of linearly uncoupled resonators through a Mach-Zehnder interferometer
errAPPLIED PHYSICS LETTERS
IF3.6
err2022-11-14
err2
errOAAI
errSabattoli, Federico Andrea; El Dirani, Houssein; Youssef, Laurene; Gianini, Linda; Zatti, Luca; Garrisi, Francesco; Grassani, Davide; Petit-Etienne, Camille; Pargon, Erwine; Sipe, J. E.; Liscidini, Marco; Sciancalepore, Corrado; Bajoni, Daniele; Galli, Matteo
err分享
err收藏
Superspontaneous Four-Wave Mixing in an Array of Silicon Microresonators
errPHYSICAL REVIEW APPLIED
IF4.4
err2022-09-02
err4
errOAAI
errBorghi, Massimo; Sabattoli, Federico Andrea; El Dirani, Houssein; Youssef, Laurene; Petit-Etienne, Camille; Pargon, Erwine; Sipe, J. E.; Mataji-Kojouri, Amideddin; Liscidini, Marco; Sciancalepore, Corrado; Galli, Matteo; Bajoni, Daniele
err分享
err收藏
Multijunction solar cell mesa isolation: Correlation between process, morphology and cell performance
errSOLAR ENERGY MATERIALS AND SOLAR CELLS
IF6.3
err2022-06-01
err3
errOAAI
errde Lafontaine, Mathieu; Ayari, Farah; Pargon, Erwine; Gay, Guillaume; Petit-Etienne, Camille; Turala, Artur; Hamon, Gwenaelle; Jaouad, Abdelatif; Volatier, Maite; Fafard, Simon; Aimez, Vincent; Darnon, Maxime
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err收藏
Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wells
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2021-08-18
err2
errOAAI
errLandesman, J. P.; Isik-Goktas, N.; LaPierre, R. R.; Levallois, C.; Ghanad-Tavakoli, S.; Pargon, E.; Petit-Etienne, C.; Jimenez, J.
err分享
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A Complete Si Photonics Platform Embedding Ultra-Low Loss Waveguides for O- and C-Band一个完整的Si光子学平台，嵌入O和c波段的超低损耗波导
errJOURNAL OF LIGHTWAVE TECHNOLOGY
IF4.8
err2021-01-15
err21
errOAAI
errWilmart, Quentin; Brision, Stephane; Hartmann, Jean-Michel; Myko, Andre; Ribaud, Karen; Petit-Etienne, Camille; Youssef, Laurene; Fowler, Daivid; Charbonnier, Benoit; Sciancalepore, Corrado; Pargon, Erwine; Bernabe, Stephane; Szelag, Bertrand
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Microcomb Source Based on InP DFB/Si3N4 Microring Butt-Coupling
errJOURNAL OF LIGHTWAVE TECHNOLOGY
IF4.8
err2020-10-01
err9
errOAAI
errBoust, Sylvain; El Dirani, Houssein; Youssef, Laurene; Robert, Yannick; Larrue, Alexandre; Petit-Etienne, Camille; Vinet, Eric; Kerdiles, Sebastien; Pargon, Erwine; Faugeron, Mickael; Vallet, Marc; Duport, Francois; Sciancalepore, Corrado; van Dijk, Frederic
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Ultralow-loss tightly confining Si3N4 waveguides and high-Q microresonators
errOPTICS EXPRESS
IF3.3
err2019-10-09
err102
errOAAI
errEl Dirani, Houssein; Youssef, Laurene; Petit-Etienne, Camille; Kerdiles, Sebastien; Grosse, Philippe; Monat, Christelle; Pargon, Erwine; Sciancalepore, Corrado
err分享
err收藏
Influence of plasma process on III-V/Ge multijunction solar cell via etching
errSOLAR ENERGY MATERIALS AND SOLAR CELLS
IF6.3
err2019-06-01
err25
errOAAI
errde Lafontaine, Mathieu; Pargon, Erwine; Petit-Etienne, Camille; Gay, Guillaume; Jaouad, Abdelatif; Gour, Marie-Josee; Volatier, Maite; Fafard, Simon; Aimez, Vincent; Darnon, Maxime
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err收藏
Mapping of mechanical strain induced by thin and narrow dielectric stripes on InP surfaces
errOPTICS LETTERS
IF3.3
err2018-07-17
err7
errOAAI
errLandesman, Jean-Pierre; Cassidy, Daniel T.; Fouchier, Marc; Levallois, Christophe; Pargon, Erwine; Rochat, Nevine; Mokhtari, Merwan; Jimenez, Juan; Torres, Alfredo
err分享
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Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light
errAPPLIED PHYSICS LETTERS
IF3.6
err2009-03-12
err46
PREAI
errPargon, E.; Martin, M.; Menguelti, K.; Azarnouche, L.; Foucher, J.; Joubert, O.
err分享
err收藏

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