未登录Advanced process and electron device technology
Zhang, Dan; Su, Xiaojing; Chang, Hao; Xu, Hao; Wang, Xiaolei; He, Xiaobin; Li, Junjie; Zhao, Fei; Yao, Qide; Luo, Yanna; Ma, Xueli; Yang, Hong; Li, Yongliang; Wu, Zhenhua; Su, Yajuan; Yang, Tao; Wei, Yayi; Du, Anyan; Zhu, Huilong; Li, Junfeng; Yin, Huaxiang; Luo, Jun; Ye, Tianchun; Wang, Wenwu .png)
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收藏Investigate on the Mechanism of HfO2/Si0.7Ge0.3 Interface Passivation Based on Low-Temperature Ozone Oxidation and Si-Cap Methods基于低温臭氧氧化和si-cap方法的HfO2/Si0.7Ge0.3界面钝化机理研究Yao, Qide; Ma, Xueli; Wang, Hanxiang; Wang, Yanrong; Wang, Guilei; Zhang, Jing; Liu, Wenkai; Wang, Xiaolei; Yan, Jiang; Li, Yongliang; Wang, Wenwu 分享 收藏 
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