Heeyeop Chae

sungkyunkwan university

34H指数

267论文数

5.2K被引数

收录论文 68

发表时间

Plasma-assisted thermal atomic layer etching of ruthenium via O2/Ar plasma oxidation and formic acid chelation 通过O2/Ar等离子体氧化和甲酸螯合实现铑的等离子体辅助热原子层刻蚀

Applied Surface Science

IF6.9

2026-09-30

PREAI

Kang, Hojin; Ha, Heeju; Lee, Hyeongwu; Hong, Daeun; Park, Hwan; Kim, Jaeho; Choi, Sungmin; Jeon, Minsung; Chae, Heeyeop

Plasma Etching of SiO2 Using Pentafluoropropanol and Hexafluoroisopropanol as Low Global Warming Potential Alternatives to C4F8 使用五氟丙醇和六氟异丙醇作为低全球变暖潜势替代品的SiO2等离子体刻蚀

Plasma Chemistry and Plasma Processing

IF2.5

2026-08-20

PREAI

Sanghyun You; Inkyoung Cho; Minuk Kim; Chaewon Song; Sieun Baek; Daeun Hong; Heeyeop Chae; Chang-Koo Kim

Photolithographic Patterning of Colloidal Quantum Dots Enabled by Plasma-Induced Ligand Polymerization 基于等离子体诱导配体聚合的胶体量子点光刻图案化

Advanced Materials Technologies

IF6.2

2026-08-02

OAAI

Boram Kim; Jaehyeon Kim; Heeyeop Chae

Challenges and prospects of 2D electronics for future monolithic complementary field-effect transistors 二维电子学在未来单片互补场效应晶体管中的挑战与前景

Nature Communications

IF15.7

2026-04-18

OAAI

Md Mobaidul Islam; Yongin Cho; Anamika Sen; Prashant Bisht; Junoh Shim; Joo-On Oh; Geonyong Park; Antonio Rossi; Hyeongwu Lee; Lin Jiang; Camilla Coletti; Bo-In Park; Heeyeop Chae; SangHoon Shin; Heekyeong Park; Sunkook Kim

Temperature Effects on Reaction Kinetics of Hydrogenated Amorphous Carbon Deposition in Inductively Coupled C2H2 Plasmas 温度对感应耦合C2H2等离子体中氢化非晶碳沉积反应动力学的影响

Korean Journal of Chemical Engineering

IF3.2

2026-02-16

PREAI

Jie Li; Hyeonjin Choi; Heeyeop Chae

Data-Driven Endpoint Detection for Small Open Area Etching Using Interpretable Transfer Learning 基于可解释迁移学习的小面积开放区域刻蚀终点检测

IEEE Transactions on Semiconductor Manufacturing

IF2.3

2026-02-01

PREAI

Wang, Zimeng; Kim, Jaehyun; Han, Sanghee; Akcay, Alp; Chae, Heeyeop; Lee, Juseong

Plasma-assisted thermal atomic layer etching for palladium and surface structure analysis with density-functional theory 等离子体辅助热原子层刻蚀用于钯及表面结构分析的密度泛函理论

Applied Surface Science

IF6.9

2025-10-18

PREAI

Hojin Kang; Eugene Huh; Ahyeon Cho; Soo-Yeon Cho; Sangheon Lee; Heeyeop Chae

Line Ratio of Optical Emission Spectroscopy Peaks for Predicting Deposition Rate and Refractive Index of Silicon Nitride in Plasma Enhanced Chemical Vapor Deposition Processes 光学发射光谱峰值线比在等离子体增强化学气相沉积过程中预测氮化硅沉积速率和折射率的应用

PLASMA PROCESSES AND POLYMERS

IF2.9

2025-05-15

OAAI

Youngju Ko; Hyeonjin Choi; Jinmyeong Kim; Namgun Kim; Heeyeop Chae

Atomic Layer-Modified 3D Pd Nanochannels for High-Performance Hydrogen Sensing 用于高性能氢传感的原子层改性3D Pd纳米通道

ACS SENSORS

IF9.1

2025-05-15

PREAI

Cho, A; Kang, H; Cho, Y; Jung, HT; Chae, H; Cho, SY

Merged Red and NIR Light Sources for Photobiomodulation Therapy in Diabetic Wound Healing 合并红光和近红外光源用于糖尿病伤口愈合的光生物调节疗法

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2025-01-17

PREAI

Tri, TT; Nam, ND; Lee, TH; Shin, H; Lee, HJ; Chae, H; Kim, MJ; Jo, DS; Cho, SM

Solution Process-Based Facile Flame-Boosted Low-Valence Transition Metal Doping on Pristine Oxide for Highly Enhanced Photoelectrochemical Solar Water Oxidation Reaction 基于溶液过程的简便火焰增强低价过渡金属掺杂在原始氧化物上，以显著增强光电化学太阳能水分解氧化反应

SUSMAT

IF21.3

2024-12-07

PREAI

Roh, Seung Hun; Kwak, Eujin; Hong, Won Tae; Xia, Chengkai; Kim, Sungsoon; Chae, Heeyeop; Park, Jongwook

Maximization of cytochrome C oxidase enzyme activity by optimizing color conversion from red organic light-emitting diodes

APPLIED MATERIALS TODAY

IF6.9

2024-06-01

PREAI

Tri, Tran Thien; Lim, Saebin; Dang, Nam Nguyen; Chae, Heeyeop; Kim, Haejung; Lee, Hyun Jong; Jo, Deok Su; Cho, Sung Min

Surface wettability control and fluorination modeling of amorphous carbon films fluorinated with CF4 plasma CF4等离子体氟化非晶碳膜表面润湿性控制及氟化建模

APPLIED SURFACE SCIENCE

IF6.9

2023-10-01

PREAI

Li, Jie; Niu, Jingjie; Kim, Yongjae; Chae, Heeyeop

Plasma atomic layer etching of molybdenum with surface fluorination 表面氟化等离子原子层刻蚀钼

APPLIED SURFACE SCIENCE

IF6.9

2023-08-01

PREAI

Kim, Yongjae; Kang, Hojin; Ha, Heeju; Kim, Changkoo; Cho, Sungmin; Chae, Heeyeop

Thermal atomic layer etching of cobalt using plasma chlorination and chelation with hexafluoroacetylacetone 使用等离子体氯化和六氟乙酰丙酮螯合对钴进行热原子层蚀刻

APPLIED SURFACE SCIENCE

IF6.9

2023-05-01

PREAI

Kim, Yongjae; Chae, Somin; Ha, Heeju; Lee, Hyeongwu; Lee, Sangheon; Chae, Heeyeop

Plasma Atomic Layer Etching of SiO2 and Si3N4 with Low Global Warming C4H3F7O Isomers

ACS SUSTAINABLE CHEMISTRY & ENGINEERING

IF7.3

2023-04-13

PREAI

Kim, Yongjae; Kang, Hojin; Kim, Changkoo; Chae, Heeyeop

Effect of Secondary Structures on the Adsorption of Peptides onto Hydrophobic Solid Surfaces Revealed by SALDI-TOF and MD Simulations

ACS OMEGA

IF4.3

2022-11-18

OAAI

No, Young Hyun; Kim, Nam Hyeong; Zafar, Muhammad Shahzad; Park, Seon Hwa; Lee, Jaecheol; Chae, Heeyeop; Yun, Wan Soo; Kim, Young Dok; Kim, Yong Ho

Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2 and Si3N4 Films

ACS SUSTAINABLE CHEMISTRY & ENGINEERING

IF7.3

2022-08-02

PREAI

Kim, Yongjae; Kim, Seoeun; Kang, Hojin; You, Sanghyun; Kim, Changkoo; Chae, Heeyeop

Self-Assembled 4-Aminopyridine Monolayer as a Nucleation-Inducing Layer for Transparent Silver Electrodes

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2022-07-25

PREAI

Jeon, Byung Min; Kim, Chan Ho; Chae, Heeyeop; Lim, Byungkwon; Cho, Sung Min

Bipolar Junction Transistor Exhibiting Excellent Output Characteristics with a Prompt Response against the Selective Protein

ADVANCED FUNCTIONAL MATERIALS

IF19

2022-07-07

PREAI

Dastgeer, Ghulam; Shahzad, Zafar Muhammad; Chae, Heeyeop; Kim, Yong Ho; Ko, Byung Min; Eom, Jonghwa

研究方向