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Suppressing Interfacial Layer Formation in ZrO2-Based Capacitors with TiN Electrodes via a MgO Thin-Film Oxygen Diffusion Barrier Lee, Seungwoo; Seol, Hyeon Ho; Nam, Min Kyeong; Han, Dong Hee; Kim, Daeyeong; Oh, Hansol; Kim, Hanbyul; Park, Yongjoo; Kim, Youngjin; Jeon, Woojin 分享 收藏
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Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application Kim, Jenam; Kim, Byung Seok; Lee, Ae Jin; Han, Dong Hee; Hwang, Ji Hyeon; Kim, Youngjin; Song, Ki-Chang; Oh, Hansol; Kim, Sangho; Park, Yongjoo; Jeon, Woojin 分享 收藏
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Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications Kim, Ye Won; Lee, Ae Jin; Han, Dong Hee; Lee, Dae Cheol; Hwang, Ji Hyeon; Kim, Youngjin; Moon, Songyi; Youn, Taewon; Lee, Minyung; Jeon, Woojin 分享 收藏
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