arrow
返回期刊详情
ACS Applied Electronic Materials 封面图

ACS Applied Electronic Materials

IF4.7
论文数5160
被引数14010
期刊论文 5160
发表时间
In-Substrate Imaging of Diamond–hBN FET Current via Wide-Field Quantum Diamond Microscopy通过宽场量子金刚石显微镜对金刚石–hBN FET电流进行衬底成像
delete2026-06-11
delete0
PREAI
deleteAnuj Bathla; Subrat Kumar Pradhan; Ajit Kumar Dash; Prabhat Anand; M. Girish Chandra; Kenji Watanabe; Takashi Taniguchi; Akshay Singh; Veeresh Deshpande; Kasturi Saha
delete分享
delete收藏
Ultrahigh Photoluminescence Quenching (>90%) and Negative Photoresponse in Vertically Stacked Graphene/WSe2 van der Waals Heterojunctions垂直堆叠的石墨烯/WSe2范德华异质结中超高光致发光猝灭(>90%)和负光响应
delete2026-06-10
delete0
PREAI
deleteYao Feng; Ze Cao; Longkun Yang; Mingyu Shi; Yujing Fan; Zhuoshuai Huang; Mohamed Abid; Fengjiang An; Huei-Ru Fuh; Yuh-Renn Wu; Ching-Ray Chang; Han-Chun Wu
delete分享
delete收藏
A Design of Experiments Framework for Magnetron-Sputtered HfOx in Wafer-Scale Memristive Devices磁控溅射HfOx在晶圆级忆阻器中的实验设计框架
delete2026-06-08
delete0
deleteOAAI
deleteAlexander Shkurmanov; Ilya Petrenyov; Kristina Nikiruy; Andrea Knauer; Jonas Schneegaß; Martin Ziegler
delete分享
delete收藏
Printed 1T1R Arrays for Next-Generation Electronics印刷1T1R阵列用于下一代电子学
delete2026-06-08
delete0
deleteOAAI
deleteRaquel Azevedo Martins; Hongrong Hu; Maria Elias Pereira; Gabriel Cadilha Marques; Asal Kiazadeh; Jasmin Aghassi-Hagmann; Emanuel Carlos
delete分享
delete收藏
Tunable Texture in ZnO Thin Films on 200 mm Wafers: Comparative Study of Zn(DMP)2 and Diethylzinc Precursors for ALD在200 mm晶圆上氧化锌薄膜的可调纹理:ALD中二甲基锌和二乙基锌前驱体的比较研究
delete2026-06-03
delete0
deleteOAAI
deleteKatherine Guzey; Noah Brechmann; Emad Najafidehaghani; Thomas Gemming; Ivan Kaban; Marcel Schmickler; Jean-Pierre Glauber; Volker Hoffmann; Detlef Rogalla; Nicolás Pérez; Harish Parala; Kornelius Nielsch; Anna Lena Schall-Giesecke; Anjana Devi; Nils Boysen
delete分享
delete收藏