M. Copel - Publications, H-index & Citations

M. Copel

international business machines (ibm)

55H指数

271论文数

1.2W被引数

收录论文 60

发表时间

Atomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources

CHEMISTRY OF MATERIALS

IF7

2021-03-30

PREAI

Farmer, Damon B.; Copel, Matthew; Todorov, Teodor; Ott, John A.; Hopstaken, Marinus; Bui, Holt; Tabachnick, Charles; Fraczak, Gloria; Totir, George

The future of MRS Governance

MRS BULLETIN

IF4.9

2020-01-10

OAAI

Fitzsimmons, Michael R.; Copel, Matt; Osman, Todd M.

Single-domain epitaxial silicene on diboride thin films

APPLIED PHYSICS LETTERS

IF3.6

2016-04-12

OAAI

Fleurence, A.; Gill, T. G.; Friedlein, R.; Sadowski, J. T.; Aoyagi, K.; Copel, M.; Tromp, R. M.; Hirjibehedin, C. F.; Yamada-Takamura, Y.

Giant Piezoresistive On/Off Ratios in Rare-Earth Chalcogenide Thin Films Enabling Nanomechanical Switching 实现纳米机械开关的稀土硫族化物薄膜中的巨型压阻开/关比

NANO LETTERS

IF9.1

2013-09-12

PREAI

Copel, M.; Kuroda, M. A.; Gordon, M. S.; Liu, X-H; Mahajan, S. S.; Martyna, G. J.; Moumen, N.; Armstrong, C.; Rossnagel, S. M.; Shaw, T. M.; Solomon, P. M.; Theis, T. N.; Yurkas, J. J.; Zhu, Y.; Newns, D. M.

Consistently low subthreshold swing in carbon nanotube transistors using lanthanum oxide

APPLIED PHYSICS LETTERS

IF3.6

2013-01-08

PREAI

Franklin, Aaron D.; Bojarczuk, Nestor A.; Copel, Matthew

Highly Efficient Fluorescence Quenching with Graphene

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2012-01-20

148

PREAI

Kasry, Amal; Ardakani, Ali A.; Tulevski, George S.; Menges, Bernhard; Copel, Matthew; Vyklicky, Libor

Defects in Cu(In,Ga)Se2 Chalcopyrite Semiconductors: A Comparative Study of Material Properties, Defect States, and Photovoltaic Performance

ADVANCED ENERGY MATERIALS

IF26

2011-08-19

163

PREAI

Cao, Qing; Gunawan, Oki; Copel, Matthew; Reuter, Kathleen B.; Chey, S. Jay; Deline, Vaughn R.; Mitzi, David B.

Band alignment at the Cu2ZnSn(SxSe1-x)4/CdS interface

APPLIED PHYSICS LETTERS

IF3.6

2011-06-21

294

PREAI

Haight, Richard; Barkhouse, Aaron; Gunawan, Oki; Shin, Byungha; Copel, Matt; Hopstaken, Marinus; Mitzi, David B.

Compatibility challenges for high-κ materials integration into CMOS technology

MRS BULLETIN

IF4.9

2011-01-31

PREAI

Guha, S; Gusev, E; Copel, M; Ragnarsson, LÅ; Buchanan, DA

Stability of terbium scandate on Si(100)

APPLIED PHYSICS LETTERS

IF3.6

2010-11-03

OAAI

Copel, M.; Bojarczuk, N.; Edge, L. F.; Guha, S.

Decoupling graphene from SiC(0001) via oxidation

PHYSICAL REVIEW B

IF3.7

2010-07-27

125

OAAI

Oida, S.; McFeely, F. R.; Hannon, J. B.; Tromp, R. M.; Copel, M.; Chen, Z.; Sun, Y.; Farmer, D. B.; Yurkas, J.

Physical origins of mobility degradation in extremely scaled SiO2/HfO2 gate stacks with La and Al induced dipoles

APPLIED PHYSICS LETTERS

IF3.6

2010-04-01

PREAI

Ando, Takashi; Copel, Matt; Bruley, John; Frank, Martin M.; Watanabe, Heiji; Narayanan, Vijay

Temperature-dependent La- and Al-induced dipole behavior monitored by femtosecond pump/probe photoelectron spectroscopy

APPLIED PHYSICS LETTERS

IF3.6

2010-03-29

PREAI

Arimura, Hiroaki; Haight, Richard; Brown, Stephen L.; Kellock, Andrew; Callegari, Alessandro; Copel, Matthew; Watanabe, Heiji; Narayanan, Vijay; Ando, Takashi

Interaction of La2O3 capping layers with HfO2 gate dielectrics

APPLIED PHYSICS LETTERS

IF3.6

2009-11-24

PREAI

Copel, M.; Guha, S.; Bojarczuk, N.; Cartier, E.; Narayanan, V.; Paruchuri, V.

Oxygen passivation of vacancy defects in metal-nitride gated HfO2/SiO2/Si devices

APPLIED PHYSICS LETTERS

IF3.6

2009-07-27

PREAI

Cartier, E.; Hopstaken, M.; Copel, M.