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J
J. O. Chu
机构信息待补充
44
H指数
174
论文数
6.2K
被引数
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21
发表时间
发表时间
IF
被引数
Infographics as a communication tool in pharmacy and pharmaceutical sciences
信息图作为药学及药物科学领域的沟通工具
RESEARCH IN SOCIAL & ADMINISTRATIVE PHARMACY
IF
2.8
2025-07-01
0
PRE
AI
Sasser, Caroline W.; Chu, Joanna; Curigliano, Mia; George, Elizabeth; Murray, Charlotte; Tan, Jun Kai; Nicolla, Sydney N.
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Nanowire metal-oxide-semiconductor field effect transistor with doped epitaxial contacts for source and drain
APPLIED PHYSICS LETTERS
IF
3.6
2007-06-06
70
PRE
AI
Cohen, G. M.; Rooks, M. J.; Chu, J. O.; Laux, S. E.; Solomon, P. M.; Ott, J. A.; Miller, R. J.; Haensch, W.
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Doping of germanium nanowires grown in presence of PH3
APPLIED PHYSICS LETTERS
IF
3.6
2006-12-26
66
PRE
AI
Tutuc, E.; Chu, J. O.; Ott, J. A.; Guha, S.
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Controllable valley splitting in silicon quantum devices
硅量子器件中的可控谷分裂
NATURE PHYSICS
IF
18.4
2006-12-10
258
PRE
AI
Goswami, Srijit; Slinker, K. A.; Friesen, Mark; McGuire, L. M.; Truitt, J. L.; Tahan, Charles; Klein, L. J.; Chu, J. O.; Mooney, P. M.; van der Weide, D. W.; Joynt, Robert; Coppersmith, S. N.; Eriksson, Mark A.
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Morphology of germanium nanowires grown in presence of B2H6 - art. no. 043113
APPLIED PHYSICS LETTERS
IF
3.6
2006-01-26
58
PRE
AI
Tutuc, E; Guha, S; Chu, JO
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Scratch resistance of mineral-filled polypropylene materials
POLYMER ENGINEERING AND SCIENCE
IF
3.2
2004-04-08
128
PRE
AI
Chu, J; Xiang, C; Sue, HJ; Hollis, RD
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Scratch and mar resistance of filled polypropylene materials
POLYMER ENGINEERING AND SCIENCE
IF
3.2
2004-04-08
92
PRE
AI
Chu, J; Rumao, L; Coleman, B
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Roles of additives in scratch resistance of high crystallinity polypropylene copolymers
POLYMER ENGINEERING AND SCIENCE
IF
3.2
2004-04-08
92
PRE
AI
Xiang, C; Sue, HJ; Chu, J; Masuda, K
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Elastic strain relaxation in free-standing SiGe/Si structures
APPLIED PHYSICS LETTERS
IF
3.6
2004-02-16
60
OA
AI
Mooney, PM; Cohen, GM; Chu, JO; Murray, CE
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Quantum-ballistic transport in an etch-defined Si/SiGe quantum point contact
APPLIED PHYSICS LETTERS
IF
3.6
2002-08-26
15
PRE
AI
Wieser, U; Kunze, U; Ismail, K; Chu, JO
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Effect of thermal processing on strain relaxation and interdiffusion in Si/SiGe heterostructures studied using Raman spectroscopy
APPLIED PHYSICS LETTERS
IF
3.6
2001-10-01
56
PRE
AI
Koester, SJ; Rim, K; Chu, JO; Mooney, PM; Ott, JA; Hargrove, MA
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SiGe-on-insulator prepared by wafer bonding and layer transfer for high-performance field-effect transistors
APPLIED PHYSICS LETTERS
IF
3.6
2001-02-26
134
PRE
AI
Huang, LJ; Chu, JO; Canaperi, DF; D'Emic, CP; Anderson, RM; Koester, SJ; Wong, HSP
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Quantum indistinguishability effects of confined polyexcitons
PHYSICAL REVIEW B
IF
3.7
1999-08-15
3
PRE
AI
Shum, K; Mooney, PM; Chu, JO
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Interface morphology in strained layer epitaxy of Si/Si1-xGex layers studied by x-ray scattering under grazing incidence and atomic force microscopy
JOURNAL OF PHYSICS D-APPLIED PHYSICS
IF
3.2
1999-01-01
4
PRE
AI
Kovats, Z; Salditt, T; Metzger, TH; Peisl, J; Stimpel, T; Lorenz, H; Chu, JO; Ismail, K
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X-ray diffraction analysis of SiGe/Si heterostructures on sapphire substrates
APPLIED PHYSICS LETTERS
IF
3.6
1998-08-17
13
PRE
AI
Mooney, PM; Ott, JA; Chu, JO; Jordan-Sweet, JL
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Negative differential conductance in strained Si point contacts and wires
APPLIED PHYSICS LETTERS
IF
3.6
1997-09-15
7
PRE
AI
Koester, SJ; Ismail, K; Lee, KY; Chu, JO
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Dislocation-related photoluminescence peak shift due to atomic interdiffusion in SiGe/Si
APPLIED PHYSICS LETTERS
IF
3.6
1997-08-25
20
PRE
AI
Shum, K; Mooney, PM; Chu, JO
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Quantum-confined biexcitons in Si1-xGex grown on Si(001)
PHYSICAL REVIEW B
IF
3.7
1997-05-15
4
PRE
AI
Shum, K; Mooney, PM; Tilly, LP; Chu, JO
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Negative differential conductance in lateral double-barrier transistors fabricated in strained Si quantum wells
APPLIED PHYSICS LETTERS
IF
3.6
1997-05-05
10
PRE
AI
Koester, SJ; Ismail, K; Lee, KY; Chu, JO
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Weak localization in back-gated Si/Si0.7Ge0.3 quantum-well wires fabricated by reactive ion etching
PHYSICAL REVIEW B
IF
3.7
1996-10-15
23
PRE
AI
Koester, SJ; Ismail, K; Lee, KY; Chu, JO
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H
H.‐S. Philip Wong
H 指数: 106 · 论文数: 780
Sue, Hung-Jue
(Hung‐Jue Sue)
H 指数: 70 · 论文数: 379
K
Koichi Masuda
H 指数: 70 · 论文数: 542
H
Hagen Klauk
H 指数: 69 · 论文数: 400
T
Thomas N. Jackson
H 指数: 64 · 论文数: 423
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