未登录
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏
分享
收藏Atomic-Level Stoichiometry Control of Ferroelectric HfxZryOz Thin Films by Understanding Molecular-Level Chemical Physical Reactions通过理解分子层面的化学物理反应对铁电HfxZryOz薄膜进行原子级化学计量比控制
Trinh, NL; Gu, B; Yang, K; Nguyen, CT; Lee, B; Kim, HM; Kim, H; Kang, Y; Park, MH; Lee, HBR
分享
收藏Insights into the Thermal Decomposition Mechanism of Molybdenum(VI) Iminopyridine Adducts
Watanabe, Lara K.; Rogers, Aaron D.; Atherton, Marshall T.; Lawford, Kieran G.; Gu, Bonwook; Chun, Supill; Lee, Sanghyun; Lee, Dongkyun; Lee, Han-Bo-Ram; Barry, Sean T.
分享
收藏
分享
收藏Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation
Cho, Eun-Hyoung; Kong, Dabin; Cho, Iaan; Leem, Youngchul; Lee, Young Min; Kim, Miso; Nguyen, Chi Thang; Lee, Jeong Yub; Shong, Bonggeun; Lee, Han-Bo-Ram
分享
收藏
分享
收藏
分享
收藏Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films (vol 35, pg 2312-2320, 2023)
Lee, Yujin; Kim, Kangsik; Lee, Zonghoon; Lee, Hong-Sub; Lee, Han-Bo-Ram; Kim, Woo-Hee; Oh, Il-Kwon; Kim, Hyungjun
分享
收藏