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M. Taborelli

机构信息待补充

30H指数
157论文数
2.8K被引数
收录论文 21
发表时间
Cleaning of laser-induced periodic surface structures on copper by gentle wet chemical processing通过温和的湿化学处理清洁铜上的激光诱导的周期性表面结构
err2025-01-01
err1
errOAAI
errLorenz, Pierre; Ehrhardt, Martin; Lotnyk, Andriy; Griebel, Jan; Zimmer, Klaus; Zajadacz, Joachim; Himmerlich, Marcel; Bez, Elena; Taborelli, Mauro; Rosenow, Steffen; Tepper, Ronny; Breul, Alexander Max
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Efficient Combination of Surface Texturing and Functional Coating for Very Low Secondary Electron Yield Surfaces and Rough Nonevaporable Getter Films
err2022-11-06
err6
errOAAI
errHimmerlich, Marcel; Zanin, Danilo A.; Taborelli, Mauro; Granadeiro Costa, Angelo Rafael; Pinto, Pedro Costa; Amador, Lucia Lain; Vollenberg, Wilhelmus; Baris, Adrienn; Valdivieso, Elisa Garcia-Tabares; Fontenla, Ana Teresa Perez; Wackerow, Stefan; Abdolvand, Amin
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Enhanced radio-frequency performance of niobium films on copper substrates deposited by high power impulse magnetron sputtering
err2022-04-08
err13
errOAAI
errArzeo, M.; Avino, F.; Pfeiffer, S.; Rosaz, G.; Taborelli, M.; Vega-Cid, L.; Venturini-Delsolaro, W.
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Niobium thin film thickness profile tailoring on complex shape substrates using unbalanced biased High Power Impulse Magnetron Sputtering
err2022-04-01
err10
errOAAI
errRosaz, Guillaume; Bartkowska, Aleksandra; Carlos, Carlota P. A.; Richard, Thibaut; Taborelli, Mauro
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Beam-induced surface modifications as a critical source of heat loads in the Large Hadron Collider
err2021-08-23
err8
errOAAI
errPetit, Valentine; Taborelli, Mauro; Zanin, Danilo Andrea; Himmerlich, Marcel; Neupert, Holger; Chiggiato, Paolo; Iadarola, Giovanni
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The impact of H2 and N2 on the material properties and secondary electron yield of sputtered amorphous carbon films for anti-multipacting applications
err2021-03-01
err7
PREAI
errFernandez, H. Moreno; Himmerlich, M.; Pinto, P. Costa; Coroa, J.; Sousa, D.; Baris, A.; Taborelli, M.
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Role of surface microgeometries on electron escape probability and secondary electron yield of metal surfaces
err2020-01-14
err26
errOAAI
errBajek, D.; Wackerow, S.; Zanin, D. A.; Baudin, L.; Bogdanowicz, K.; Valdivieso, E. Garcia-Tabares; Calatroni, S.; Di Girolamo, B.; Sitko, M.; Himmerlich, M.; Taborelli, M.; Chiggiato, P.; Abdolvand, A.
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The Effect of Pulsed Current and Organic Additives on Hydrogen Incorporation in Electroformed Copper Used in Ultrahigh Vacuum Applications
err2019-05-28
err3
errOAAI
errAmador, L. Lain; Rolet, J.; Doche, M-L; Massuti-Ballester, P.; Gigandet, M-P; Moutarlier, V.; Taborelli, M.; Ferreira, L. M. A.; Chiggiato, P.; Hihn, J-Y
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Development of sputtered Nb3Sn films on copper substrates for superconducting radiofrequency applications
err2019-01-21
err34
errOAAI
errIlyina, E. A.; Rosaz, G.; Descarrega, J. B.; Vollenberg, W.; Lunt, A. J. G.; Leaux, F.; Calatroni, S.; Venturini-Delsolaro, W.; Taborelli, M.
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Brazing of Mo to Glidcop Dispersion Strengthened Copper for Accelerating Structures
err2018-09-07
err3
errOAAI
errCasalegno, Valentina; Perero, Sergio; Ferraris, Monica; Taborelli, Mauro; Izquierdo, Gonzalo Arnau; Sgobba, Stefano; Salvo, Milena
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Carbon coatings with low secondary electron yield
errVACUUM
IF3.9
err2013-12-01
err60
errOAAI
errPinto, P. Costa; Calatroni, S.; Neupert, H.; Letant-Delrieux, D.; Edwards, P.; Chiggiato, P.; Taborelli, M.; Vollenberg, W.; Yin-Vallgren, C.; Colaux, J. L.; Lucas, S.
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Brazing of Mo to a CuZr alloy for the production of bimetallic raw materials for the CLIC accelerating structures
err2010-03-01
err11
PREAI
errSalvo, Milena; Casalegno, Valentina; Rizzo, Stefano; Ferraris, Monica; Izquierdo, Gonzalo Arnau; Heikkinen, Samuli; Sgobba, Stefano; Taborelli, Mauro
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The assessment of metal surface cleanliness by XPS
err2006-04-01
err37
PREAI
errScheuerlein, C.; Taborelli, M.
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The secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings
err2001-03-01
err78
errOAAI
errHenrist, B; Hilleret, N; Scheuerlein, C; Taborelli, M
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Lowering the activation temperature of TiZrV non-evaporable getter films
errVACUUM
IF3.9
err2001-01-01
err74
errOAAI
errProdromides, AE; Scheuerlein, C; Taborelli, M
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