未登录Interface Investigation on SiGe/Si Multilayer Structures: Influence of Different Epitaxial Process ConditionsSiGe/Si多层结构的界面研究: 不同外延工艺条件的影响
Kong, Zhenzhen; Song, Yanpeng; Wang, Hailing; Liu, Xiaomeng; Wang, Xiangsheng; Liu, Jinbiao; Li, Ben; Su, Jiale; Tan, Xinguang; Luan, Qingjie; Lin, Hongxiao; Ren, Yuhui; Zhang, Yiwen; Liu, Jingxiong; Li, Junfeng; Du, Anyan; Radamson, Henry H.; Zhao, Chao; Ye, Tianchun; Wang, Guilei .png)
分享.png)
收藏Demonstration of Germanium Vertical Gate-All-Around Field-Effect Transistors Featured by Self-Aligned High-κ Metal Gates with Record High Performance锗垂直栅极全包围场效应晶体管的演示，其特征是具有创纪录的高性能的自对准高 κ 金属栅极Xie, Lu; Zhu, Huilong; Zhang, Yongkui; Ai, Xuezheng; Li, Junjie; Wang, Guilei; Liu, Jinbiao; Du, Anyan; Yang, Hong; Yin, Xiaogen; Huang, Weixing; Li, Chen; Li, Yangyang; Wang, Qi; Lu, Shunshun; Kong, Zhenzhen; Xiang, Jinjuan; Du, Yong; Luo, Jun; Li, Junfeng; Radamson, Henry H.; Wang, Wenwu; Ye, Tianchun 分享 收藏 High-Quality Recrystallization of Amorphous Silicon on Si (100) Induced via Laser Annealing at the NanoscaleChen, Zhuo; Zhu, Huilong; Wang, Guilei; Wang, Qi; Xiao, Zhongrui; Zhang, Yongkui; Liu, Jinbiao; Lu, Shunshun; Du, Yong; Yu, Jiahan; Xiong, Wenjuan; Kong, Zhenzhen; Du, Anyan; Yan, Zijin; Zheng, Yantong 分享 收藏 Investigation on Recrystallization Channel for Vertical C-Shaped-Channel Nanosheet FETs by Laser Annealing垂直C形沟道纳米片fet再结晶沟道的激光退火研究Chen, Zhuo; Zhu, Huilong; Wang, Guilei; Wang, Qi; Xiao, Zhongrui; Zhang, Yongkui; Liu, Jinbiao; Lu, Shunshun; Du, Yong; Yu, Jiahan; Xiong, Wenjuan; Kong, Zhenzhen; Du, Anyan; Yan, Zijin; Zheng, Yantong 分享 收藏 Insight into over Repair of Hot Carrier Degradation by GIDL Current in Si p-FinFETs Using Ultra-Fast Measurement TechniqueChang, Hao; Wang, Guilei; Yang, Hong; Liu, Qianqian; Zhou, Longda; Ji, Zhigang; Yu, Ruixi; Wu, Zhenhua; Yin, Huaxiang; Du, Anyan; Li, Junfeng; Luo, Jun; Zhao, Chao; Wang, Wenwu 分享 收藏 Advanced process and electron device technologyZhang, Dan; Su, Xiaojing; Chang, Hao; Xu, Hao; Wang, Xiaolei; He, Xiaobin; Li, Junjie; Zhao, Fei; Yao, Qide; Luo, Yanna; Ma, Xueli; Yang, Hong; Li, Yongliang; Wu, Zhenhua; Su, Yajuan; Yang, Tao; Wei, Yayi; Du, Anyan; Zhu, Huilong; Li, Junfeng; Yin, Huaxiang; Luo, Jun; Ye, Tianchun; Wang, Wenwu 分享 收藏 Investigation on Ge0.8Si0.2-Selective Atomic Layer Wet-Etching of Ge for Vertical Gate-All-Around NanodeviceXie, Lu; Zhu, Huilong; Zhang, Yongkui; Ai, Xuezheng; Li, Junjie; Wang, Guilei; Du, Anyan; Kong, Zhenzhen; Wang, Qi; Lu, Shunshun; Li, Chen; Li, Yangyang; Huang, Weixing; Radamson, Henry H. 分享 收藏 Selective Digital Etching of Silicon-Germanium Using Nitric and Hydrofluoric Acids使用硝酸和氢氟酸对硅锗进行选择性数字蚀刻Li, Chen; Zhu, Huilong; Zhang, Yongkui; Yin, Xiaogen; Jia, Kunpeng; Li, Junjie; Wang, Guilei; Kong, Zhenzhen; Du, Anyan; Yang, Tengzhi; Zhao, Liheng; Huang, Weixing; Xie, Lu; Li, Yangyang; Ai, Xuezheng; Ma, Shishuai; Radamson, Henry H. 分享 收藏 Strained Si0.2Ge0.8/Ge multilayer Stacks Epitaxially Grown on a Low-/High-Temperature Ge Buffer Layer and Selective Wet-Etching of GermaniumXie, Lu; Zhu, Huilong; Zhang, Yongkui; Ai, Xuezheng; Wang, Guilei; Li, Junjie; Du, Anyan; Kong, Zhenzhen; Yin, Xiaogen; Li, Chen; Zhao, Liheng; Li, Yangyang; Jia, Kunpeng; Li, Ben; Radamson, Henry H. 分享 收藏 分享 收藏 分享 收藏 分享 收藏 
.png){kind=icon}
.png){kind=icon}
.png){kind=icon}
.png){kind=icon}
