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收藏Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
Lee, Yujin; Seo, Seunggi; Nam, Taewook; Lee, Hyunho; Yoon, Hwi; Sun, Sangkyu; Oh, Il-Kwon; Lee, Sanghun; Shong, Bonggeun; Seo, Jin Hyung; Seok, Jang Hyeon; Kim, Hyungjun
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收藏Comparative study on atomic layer deposition of HfO2via substitution of ligand structure with cyclopentadiene
Park, Sungmin; Park, Bo-Eun; Yoon, Hwi; Lee, Sanghun; Nam, Taewook; Cheon, Taehoon; Kim, Soo-Hyun; Cheon, Hwansung; Im, Sangkyun; Seong, Taegeun; Kim, Hyungjun
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收藏Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor
Lee, Yujin; Lee, Chong Hwon; Nam, Taewook; Lee, Sanghun; Oh, Il-Kwon; Yang, Joon Young; Choi, Dong Wook; Yoo, Choongkeun; Kim, Ho-jin; Kim, Woo-Hee; Kim, Hyungjun
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收藏Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films向O2等离子体中添加Ar对氧化物薄膜的等离子体增强原子层沉积的影响
Jung, Hanearl; Oh, Il-Kwon; Yoon, Chang Mo; Park, Bo-Eun; Lee, Sanghun; Kwon, Ohyung; Lee, Woo Jae; Kwon, Se-Hun; Kim, Woo-Hee; Kim, Hyungjun
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