C. Cabral - Publications, H-index & Citations

C. Cabral

international business machines (ibm)

40H指数

186论文数

6.1K被引数

收录论文 20

发表时间

Dust-Sized High-Power-Density Photovoltaic Cells on Si and SOI Substrates for Wafer-Level-Packaged Small Edge Computers

ADVANCED MATERIALS

IF26.8

2020-10-23

PREAI

Li, Ning; Han, Kevin; Spratt, William; Bedell, Stephen; Ren, Jinhan; Gunawan, Oki; Ott, John; Hopstaken, Marinus; Cabral, Cyril, Jr.; Libsch, Frank; Subramanian, Chitra; Shahidi, Ghavam; Sadana, Devendra

Electromigration drift velocity in Al-alloy and Cu-alloy lines

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2019-12-06

PREAI

Hu, CK; Lee, KY; Lee, KL; Cabral, C; Colgan, EG; Stanis, C

Enhanced Grain Growth of Electroplated Copper on Cobalt-Containing Seed Layer

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2013-06-14

OAAI

Huang, Q.; Baker-O'Neal, B. C.; Cabral, C., Jr.; Simonyi, E.; Deline, V. R.; Hopstaken, M.

Irreversible altering of crystalline phase of phase-change Ge-Sb thin films

APPLIED PHYSICS LETTERS

IF3.6

2010-03-23

PREAI

Krusin-Elbaum, L.; Shakhvorostov, D.; Cabral, C., Jr.; Raoux, S.; Jordan-Sweet, J. L.

Evidence for electronic gap-driven metal-semiconductor transition in phase-change materials

PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA

IF9.1

2009-07-07

OAAI

Shakhvorostov, Dmitry; Nistor, Razvan A.; Krusin-Elbaum, Lia; Martyna, Glenn J.; Newns, Dennis M.; Elmegreen, Bruce G.; Liu, Xiao-hu; Hughes, Zak E.; Paul, Sujata; Cabral, Cyril; Raoux, Simone; Shrekenhamer, David B.; Basov, Dimitri N.; Song, Young; Mueser, Martin H.

Direct evidence for abrupt postcrystallization germanium precipitation in thin phase-change films of Sb-15 at.% Ge

APPLIED PHYSICS LETTERS

IF3.6

2008-08-22

OAAI

Cabral, C., Jr.; Krusin-Elbaum, L.; Bruley, J.; Raoux, S.; Deline, V.; Madan, A.; Pinto, T.

Evidence for segregation of Te in Ge2Sb2Te5 films:: Effect on the phase-change stress

APPLIED PHYSICS LETTERS

IF3.6

2007-04-04

115

PREAI

Krusin-Elbaum, L.; Cabral, C., Jr.; Chen, K. N.; Copel, M.; Abraham, D. W.; Reuter, K. B.; Rossnagel, S. M.; Bruley, J.; Deline, V. R.

Irreversible modification of Ge2Sb2Te5 phase change material by nanometer-thin Ti adhesion layers in a device-compatible stack

APPLIED PHYSICS LETTERS

IF3.6

2007-01-30

OAAI

Cabral, C., Jr.; Chen, K. N.; Krusin-Elbaum, L.; Deline, V.

Electrodeposition of Cu on Ta-based layer - II: Cu electrodeposition on Cu/Ta bilayers

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2007-01-01

OAAI

Kelly, J. J.; Zheng, M.; Deligianni, H.; Baker-O'Neal, B. C.; Cabral, C., Jr.

Aluminum mobility and interfacial segregation in fully silicided gate contacts

APPLIED PHYSICS LETTERS

IF3.6

2005-10-12

OAAI

Pezzi, RP; Copel, M; Cabral, C; Baumvol, IJR

A method for measuring barrier heights, metal work functions and fixed charge densities in metal/SiO2/Si capacitors (vol 80, pg 4858, 2002) -: art. no. 059901

APPLIED PHYSICS LETTERS

IF3.6

2005-07-27

PREAI

Zafar, S; Cabral, C; Amos, R; Callegari, A

Interfacial segregation of dopants in fully silicided metal-oxide-semiconductor gates

APPLIED PHYSICS LETTERS

IF3.6

2005-06-14

PREAI

Copel, M; Pezzi, RP; Cabral, C

Physical and electrical analysis of RuxYy alloys for gate electrode applications -: art. no. 053502

APPLIED PHYSICS LETTERS

IF3.6

2005-01-31

PREAI

Chen, B; Suh, Y; Lee, J; Gurganus, J; Misra, V; Cabral, C

Evaluation of thermal stability for CMOS gate metal materials

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2004-01-01

PREAI

Cabral, C; Lavoie, C; Ozcan, AS; Amos, RS; Narayanan, V; Gusev, EP; Jordan-Sweet, JL; Harper, JME

Preparation of SrRuO3 films for advanced CMOS metal gates

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2004-01-01

PREAI

Fröhlich, K; Huseková, K; Machajdík, D; Lupták, R; Tapajna, M; Hooker, JC; Roozeboom, F; Kobzev, AP; Wiemer, C; Ferrari, S; Fanciulli, M; Rossel, C; Cabral, C

Texture of Cu and dilute binary Cu-alloy films: impact of annealing and solute content

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2003-08-01

PREAI

Barmak, K; Gungor, A; Rollett, AD; Cabral, C; Harper, JME

A method for measuring barrier heights, metal work functions and fixed charge densities in metal/SiO2/Si capacitors

APPLIED PHYSICS LETTERS

IF3.6

2002-06-24

PREAI

Zafar, S; Cabral, C; Amos, R; Callegari, A