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Fully nonlinear phenomenology of the bump-on-tail (BOT) instability with drag, diffusion and Krook relaxation 带有阻尼、扩散和Krook弛豫的驼峰不稳定性(BOT)的全非线性现象学 Zhang, Shi-Jie; Chang, Lei; Bo, Zhao-Ju; Qu, Zhi-Song; Zadiriev, Ilya; Kralkina, Elena; Isayama, Shogo; You, Sin-Jae; Kan, Zi-Chen; Sun, Ji-Kai; Ma, Jing-Jing 分享 收藏
Transition of blue-core mode helicon discharge 蓝芯模式赫利孔放电的转换 Chang, L.; Zhang, S. J.; Wu, J. T.; Zhang, Y. W.; Wang, C.; Peng, Y.; Gao, S. S.; Sun, C. J.; Wang, Q.; Sang, C. F.; Thakur, S. C.; Isayama, S.; You, S. J. 分享 收藏
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Development of industrial-scale L-shaped dielectric barrier discharge reactor for improving capacity retention of graphite anode using plasma pretreatment 等离子体预处理提高石墨阳极容量保持率的工业规模L型介质阻挡放电反应器的研制 Eom, Geon Woong; Hur, Min; Shim, Hyung-chul; Hyun, Seungmin; So, Hye-Mi; Oh, Minsub; Kim, Areum; Jang, Yunseon; Kang, Woo Seok; Kim, Dae-Woong; Kim, Hyeong-U; Lee, Sang Ho; Park, In Yong; Jang, Eui-chan; Ahn, Jisu; Yun, Dong-hyun; Kim, Jae-hyeon; You, Shinjae; Lee, Jin Young 分享 收藏
Time-domain direct capacitive coupling detection technique applicable inside a cavity structure for determination of crossing frequency in a transmission microwave frequency spectrum Cho, Chulhee; Kim, Sijun; Lee, Woobeen; Seong, Inho; Jeong, Wonnyoung; Lee, Youngseok; Seol, Youbin; Na, Byungkeun; Kim, Daewoong; You, Shinjae 分享 收藏
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Plasma Dielectric Etching with C4H2F6 Isomers of Low Global-Warming Potential Choi, Minsu; Lee, Youngseok; Cho, Chulhee; Jeong, Wonnyoung; Seong, Inho; Haque, Jami Md Ehsanul; Choi, Byeongyeop; Seo, Seonghyun; Kim, Sijun; You, Shinjae; Yeom, Geun Young 分享 收藏
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Enhancement of Ar Ion Flux on the Substrate by Heterogeneous Charge Transfer Collision of Ar Atom with He Ion in an Inductively Coupled Ar/He Plasma Seong, Inho; Kim, Sijun; Choi, Minsu; Lee, Woobeen; Jeong, Wonnyoung; Cho, Chulhee; You, Yebin; Lee, Youngseok; Seol, Youbin; You, Shinjae 分享 收藏
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction Choi, Minsu; Lee, Youngseok; You, Yebin; Cho, Chulhee; Jeong, Wonnyoung; Seong, Inho; Choi, Byeongyeop; Kim, Sijun; Seol, Youbin; You, Shinjae; Yeom, Geun Young 分享 收藏
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Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled 离子能量和通量对双频电容耦合Ar/C4F8等离子体中高纵横比SiO2蚀刻特性的贡献: 单个离子能量和通量控制 Jeong, Wonnyoung; Kim, Sijun; Lee, Youngseok; Cho, Chulhee; Seong, Inho; You, Yebin; Choi, Minsu; Lee, Jangjae; Seol, Youbin; You, Shinjae 分享 收藏
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