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J
Jean‐Luc Autran
aix-marseille universite
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25
发表时间
发表时间
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被引数
Photovoltaic response in a resonant tunneling wire-dot-wire junction
APPLIED PHYSICS LETTERS
IF
3.6
2013-07-24
9
PRE
AI
Berbezier, Aude; Autran, Jean-Luc; Michelini, Fabienne
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Modeling of energy bands in ultra-thin layer quantum nanostructures for solar cell applications
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2011-04-01
4
PRE
AI
Munteanu, D.; Autran, J. L.
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Investigation of capacitance-voltage characteristics in Ge/high-κ MOS devices
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2009-07-01
15
PRE
AI
Moreau, M.; Munteanu, D.; Autran, J-L; Bellenger, F.; Mitard, J.; Houssa, M.
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Simulation study of circuit performances of independent double-gate (IDG) MOSFETs with high-permittivity gate dielectrics
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2009-07-01
2
PRE
AI
Loussier, X.; Munteanu, D.; Autran, J. L.
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Boron out-diffusion mechanism in oxide and nitride CMOS sidewall spacer: Impact of the materials properties
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
IF
4.6
2008-12-01
5
PRE
AI
Pelletier, B.; Juhel, M.; Trouiller, C.; Beucher, D.; Autran, J. L.; Morin, P.
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Improved effective mass theory for silicon nanostructures
APPLIED PHYSICS LETTERS
IF
3.6
2008-09-04
13
PRE
AI
Nehari, K.; Lannoo, M.; Michelini, F.; Cavassilas, N.; Bescond, M.; Autran, J. L.
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Full-band study of current across silicon nanowire transistors
APPLIED PHYSICS LETTERS
IF
3.6
2007-03-28
43
OA
AI
Nehari, K.; Cavassilas, N.; Michelini, F.; Bescond, M.; Autran, J. L.; Lannoo, M.
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Microscopic model for dielectric constant in metal-insulator-metal capacitors with high-permittivity metallic oxides -: art. no. 052902
APPLIED PHYSICS LETTERS
IF
3.6
2006-01-31
40
PRE
AI
Bécu, S; Crémer, S; Autran, JL
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Improvement of current-control induced by oxide notch in very short field-effect transistor
APPLIED PHYSICS LETTERS
IF
3.6
2005-08-10
3
PRE
AI
Cavassilas, N; Bescond, M; Autran, JL
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A simulation analysis of FIBL in decananometer Double-Gate MOSFETs with high-κ gate dielectrics
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2005-07-01
16
PRE
AI
Autran, JL; Munteanu, D; Bescond, M; Houssa, M; Said, A
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SiO2, advanced dielectrics and related devices 5 -: Proceedings of the 5th Franco-Italian Symposium on SiO2, Advanced Dielectrics and Related Devices -: Preface
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2005-07-01
1
PRE
AI
Vedda, A; Munteanu, D; Ferrari, M; Paillet, P; Autran, JL
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New oxide quality characterization for charge leakage applications using the floating-gate technique
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2003-07-01
0
PRE
AI
Renard, S; Boivin, P; Autran, JL
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SiO2 and Advanced Dielectrics 4 -: Proceedings of the 4th Franco-Italian Symposium on SiO2 and Advanced Dielectrics, Trento, Italy, September 16-18, 2002 -: Preface
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2003-07-01
0
PRE
AI
Vedda, A; Autran, JL; Ferrari, M; Munteanu, D; Passacantando, M
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Stretch-out of high-permittivity MOS capacitance-voltage curves resulting from a lateral non-uniform oxide charge distribution
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2003-07-01
7
PRE
AI
Autran, JL; Munteanu, D; Dinescu, R; Houssa, M
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Towards a full microscopic approach to the modeling of transistors with nanometer dimensions
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2003-07-01
3
PRE
AI
Bescond, M; Lannoo, M; Goguenheim, D; Autran, JL
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Frequency characterization and modeling of interface traps in HfSixOy/HfO2 gate dielectric stack from a capacitance point-of-view
APPLIED PHYSICS LETTERS
IF
3.6
2002-10-28
65
PRE
AI
Masson, P; Autran, JL; Houssa, M; Garros, X; Leroux, C
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Determination of the electrical properties of 2.5 nm thick silicon-based dielectric films:: thermally grown SiOx
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2001-02-01
4
PRE
AI
Pic, N; Glachant, A; Nitsche, S; Hoarau, JY; Goguenheim, D; Vuillaume, D; Sibai, A; Autran, JL
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Properties of SiO2 films deposited on silicon at low temperatures by plasma enhanced decomposition of hexamethyldisilazane
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-04-01
22
PRE
AI
Pêcheur, A; Autran, JL; Lazarri, JP; Pinard, P
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Study of hot carrier degradation in dram cells combining random telegraph signal and charge pumping measurements
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-04-01
2
PRE
AI
Pierunek, S; Pogany, D; Autran, JL; Leroy, B
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Theoretical and experimental study of the conduction mechanism in Al/Ta2O5/SiO2/Si and Al/Ta2O5/Si3N4/Si structures
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-04-01
11
PRE
AI
Chaneliere, C; Autran, JL; Four, S; Devine, RAB; Balland, B
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研究方向
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合作学者
合作期刊
W
W. L. Warren
H 指数: 57 · 论文数: 284
M
M. Lannoo
H 指数: 54 · 论文数: 472
M
Michel Houssa
H 指数: 51 · 论文数: 534
E
Eric M. Vogel
H 指数: 51 · 论文数: 342
A
A. Vedda
H 指数: 46 · 论文数: 375
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