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Reactive ion etching of indium gallium zinc oxide (IGZO) and chamber cleaning using low global warming potential gas 使用低全球变暖潜势气体对铟镓锌氧化物 (IGZO) 进行反应离子蚀刻和腔室清洁 Hong, Jong Woo; Tak, Hyun Woo; Cho, Nam Il; Eoh, Hyeong Joon; Kim, Chan Ho; Jeong, Jun Won; Kim, Kyung Lim; Yoo, Hee Jin; Cho, Hyun Min; Jeong, Yu Gwang; Jung, Da Woon; Yeo, Yun Jong; Yeom, Geun Young; Kim, Dong Woo 分享 收藏
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Effect of Cl2 Radical on Dry Development of Spin-Coated Metal Oxide Resist Namgoong, Soo; Kim, Hee Ju; Kang, Yeo Kyung; Kim, Min Cheol; Jang, Yun Jong; Tak, Hyunwoo; Kang, Ji Eun; Lee, Sun Jin; Kim, Myung-Gil; Kim, Dongwoo; Yeom, Geun Young 分享 收藏
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Semi-Metal Edge Contact for Barrier-Free Carrier Transport in MoS2 Field Effect Transistors 半金属边缘接触用于MoS2场效应晶体管中载流子的无障碍传输 Lee, Sungwon; Wang, Xinbiao; Shin, Hoseong; Ali, Nasir; Ngo, Tien Dat; Hwang, Euyheon; Kim, Gil-Ho; Yeom, Geun Young; Watanabe, Kenji; Taniguchi, Takashi; Yoo, Won Jong 分享 收藏
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Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers Lee, Hye Joo; Tak, Hyun Woo; Kim, Seong Bae; Kim, Seul Ki; Park, Tae Hyun; Kim, Ji Yeun; Sung, Dain; Lee, Wonseok; Lee, Seung Bae; Kim, Keunsuk; Cho, Byeong Ok; Kim, Young Lea; Lee, Ki Chan; Kim, Dong Woo; Yeom, Geun Young 分享 收藏
Etched characteristics of nanoscale TiO2 using C4F8-based and BCl3-based gases 使用C4F8-based和BCl3-based气体蚀刻纳米级TiO2的特性 Hong, Jong Woo; Kim, Yeon Hee; Kim, Hee Ju; Tak, Hyun Woo; Goong, Soo Nam; Kim, Seong Bae; Bae, Ki Deok; Lee, Jeong Yub; Bae, Hae Soo; Yeom, Geun Young; Kim, Dong Woo 分享 收藏
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction Choi, Minsu; Lee, Youngseok; You, Yebin; Cho, Chulhee; Jeong, Wonnyoung; Seong, Inho; Choi, Byeongyeop; Kim, Sijun; Seol, Youbin; You, Shinjae; Yeom, Geun Young 分享 收藏
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Indium tin oxide etch characteristics using CxH2x+2(x=1,2,3)/Ar Hong, Jong Woo; Cho, Hyun Min; Jeong, Yu Gwang; Jung, Da Woon; Yeo, Yun Jong; Kang, Ji Eun; Kim, Hee Ju; Tak, Hyun Woo; Yeom, Geun Young; Kim, Dong Woo 分享 收藏
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High-throughput manufacturing of epitaxial membranes from a single wafer by 2D materials-based layer transfer process Kim, Hyunseok; Liu, Yunpeng; Lu, Kuangye; Chang, Celesta S.; Sung, Dongchul; Akl, Marx; Qiao, Kuan; Kim, Ki Seok; Park, Bo-In; Zhu, Menglin; Suh, Jun Min; Kim, Jekyung; Jeong, Junseok; Baek, Yongmin; Ji, You Jin; Kang, Sungsu; Lee, Sangho; Han, Ne Myo; Kim, Chansoo; Choi, Chanyeol; Zhang, Xinyuan; Choi, Hyeong-Kyu; Zhang, Yanming; Wang, Haozhe; Kong, Lingping; Afeefah, Nordin Noor; Ansari, Mohamed Nainar Mohamed; Park, Jungwon; Lee, Kyusang; Yeom, Geun Young; Kim, Sungkyu; Hwang, Jinwoo; Kong, Jing; Bae, Sang-Hoon; Shi, Yunfeng; Hong, Suklyun; Kong, Wei; Kim, Jeehwan 分享 收藏
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide C3H2F6异构体的氢氟碳结构对氧化硅高深宽比刻蚀的影响 Tak, Hyun Woo; Lee, Hye Joo; Wen, Long; Kang, Byung Jin; Sung, Dain; Bae, Jeong Woon; Kim, Dong Woo; Lee, Wonseok; Lee, Seung Bae; Kim, Keunsuk; Cho, Byeong Ok; Kim, Young Lea; Song, Han Dock; Yeom, Geun Young 分享 收藏
Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode Ji, You Jin; Kim, Hae In; Kim, Ki Hyun; Kang, Ji Eun; San Kim, Doo; Kim, Ki Seok; Ellingboe, A. R.; Kim, Dong Woo; Yeom, Geun Young 分享 收藏
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