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R
R. A. B. Devine
new mexico institute of mining technology
43
H指数
338
论文数
6.9K
被引数
0
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23
发表时间
发表时间
IF
被引数
Tunneling discharge of positive trapped oxide charge in p-channel field effect transistors
APPLIED PHYSICS LETTERS
IF
3.6
2011-08-25
4
PRE
AI
Kambour, K. E.; Kouhestani, C.; Nguyen, D.; Rosen, N.; Devine, R. A. B.
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Interface design to improve stability of polymer solar cells for potential space applications
ENERGY & ENVIRONMENTAL SCIENCE
IF
30.8
2011-01-01
13
PRE
AI
Kumar, Ankit; Rosen, Nadav; Devine, Roderick; Yang, Yang
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Origin of Radiation-Induced Degradation in Polymer Solar Cells
ADVANCED FUNCTIONAL MATERIALS
IF
19
2010-06-25
81
PRE
AI
Kumar, Ankit; Devine, Roderick; Mayberry, Clay; Lei, Bao; Li, Gang; Yang, Yang
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Negative bias temperature instability and relaxation in HfSiON gate stack field effect devices
APPLIED PHYSICS LETTERS
IF
3.6
2008-04-18
0
PRE
AI
Devine, R. A. B.; Hjalmarson, H. P.; Alshareef, H. N.; Quevedo-Lopez, M.
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Negative bias temperature instability and Fowler-Nordheim injection in silicon oxynitride insulators
APPLIED PHYSICS LETTERS
IF
3.6
2007-04-20
2
PRE
AI
Busani, T.; Devine, R. A. B.; Hughes, H. L.
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X-ray irradiation effects in top contact, pentacene based field effect transistors for space related applications
APPLIED PHYSICS LETTERS
IF
3.6
2006-04-12
20
PRE
AI
Devine, RAB; Ling, MM; Mallik, AB; Roberts, M; Bao, Z
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Molecular volume dependence of the electronic and ionic polarizabilities in TiO2 and SiO2 -: art. no. 062902
APPLIED PHYSICS LETTERS
IF
3.6
2005-01-31
9
PRE
AI
Devine, RAB; Busani, T
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Temperature-dependent current transport in low-k inorganic dielectrics
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2004-01-01
3
PRE
AI
Tringe, JW; Solomon, JS; Devine, RAB
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Irradiation and humidity effects on the leakage current in SiOx(CH3)y-based intermetal dielectric films
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2003-01-01
4
PRE
AI
Devine, RAB; Ball, D; Rowe, JD; Tringe, JW
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Electronic traps in mixed Si1-xGexO2 films
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
2001-02-01
3
PRE
AI
Busani, T; Devine, RAB; Martini, M; Spinolo, G; Vedda, A
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A non-volatile MOSFET memory device based on mobile protons in SiO2 thin films
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-09-01
8
OA
AI
Vanheusden, K; Warren, WL; Devine, RAB; Fleetwood, DM; Draper, BL; Schwank, JR
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Properties of tantalum pentoxide (Ta2O5) obtained by plasma assisted deposition using a TaF5 source
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-09-01
8
PRE
AI
Four, S; Devine, RAB; Luo, EZ; Wilson, IH; Cheng, HS
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Growth kinetics and physical characterisation of Si1-xGexO2 films obtained by plasma assisted oxidation
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-09-01
9
PRE
AI
Busani, T; Plantier, H; Devine, RAB; Hernandez, C; Campidelli, Y
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Theoretical and experimental study of the conduction mechanism in Al/Ta2O5/SiO2/Si and Al/Ta2O5/Si3N4/Si structures
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1999-04-01
11
PRE
AI
Chaneliere, C; Autran, JL; Four, S; Devine, RAB; Balland, B
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Chemical kinetics of mobile-proton generation and annihilation in SiO2 thin films
APPLIED PHYSICS LETTERS
IF
3.6
1998-08-03
22
PRE
AI
Vanheusden, K; Warren, WL; Fleetwood, DM; Schwank, JR; Shaneyfelt, MR; Draper, BL; Winokur, PS; Devine, RAB; Archer, LB; Brown, GA; Wallace, RM
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Study of Ge bonding and distribution in plasma oxides of Si1-xGex alloys
APPLIED PHYSICS LETTERS
IF
3.6
1998-05-25
21
PRE
AI
Seck, M; Devine, RAB; Hernandez, C; Campidelli, Y; Dupuy, JC
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Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
MATERIALS SCIENCE & ENGINEERING R-REPORTS
IF
26.8
1998-05-01
716
PRE
AI
Chaneliere, C; Autran, JL; Devine, RAB; Balland, B
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Thermally activated electron capture by mobile protons in SiO2 thin films
APPLIED PHYSICS LETTERS
IF
3.6
1998-01-05
27
PRE
AI
Vanheusden, K; Kama, SP; Pugh, RD; Warren, WL; Fleetwood, DM; Devine, RAB; Edwards, AH
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Proceedings of the Franco-Italian Symposium on Structure and Defects in SiO2, Fundamentals and Applications - Agelonde, France - September 23-25 1996 - Preface
JOURNAL OF NON-CRYSTALLINE SOLIDS
IF
3.5
1997-08-01
0
PRE
AI
Devine, RAB; Spinolo, G; Autran, JL; Vedda, A
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Interfacial hardness enhancement in deuterium annealed 0.25 mu m channel metal oxide semiconductor transistors
APPLIED PHYSICS LETTERS
IF
3.6
1997-06-02
68
PRE
AI
Devine, RAB; Autran, JL; Warren, WL; Vanheusdan, KL; Rostaing, JC
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合作学者
合作期刊
Zhenan Bao
(Zhenan Bao)
H 指数: 221 · 论文数: 1.2K
杨
杨旸
(Yang Yang)
H 指数: 161 · 论文数: 716
H
Husam N. Alshareef
H 指数: 143 · 论文数: 746
李
李刚
(Gang Li)
H 指数: 107 · 论文数: 715
R
Robert M. Wallace
H 指数: 91 · 论文数: 621
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