Akira Toriumi - Publications, H-index & Citations

Akira Toriumi

University of Tokyo

64H指数

925论文数

1.6W被引数

收录论文 59

发表时间

Roadmap on ferroelectric hafnia- and zirconia-based materials and devices 铁电氧化铪和氧化锆基材料和器件路线图

APL MATERIALS

IF4.5

2023-08-30

OAAI

Silva, Jose P. B.; Alcala, Ruben; Avci, Uygar E.; Barrett, Nick; Begon-Lours, Laura; Borg, Mattias; Byun, Seungyong; Chang, Sou-Chi; Cheong, Sang-Wook; Choe, Duk-Hyun; Coignus, Jean; Deshpande, Veeresh; Dimoulas, Athanasios; Dubourdieu, Catherine; Fina, Ignasi; Funakubo, Hiroshi; Grenouillet, Laurent; Gruverman, Alexei; Heo, Jinseong; Hoffmann, Michael; Hsain, H. Alex; Huang, Fei-Ting; Hwang, Cheol Seong; Iniguez, Jorge; Jones, Jacob L.; Karpov, Ilya V.; Kersch, Alfred; Kwon, Taegyu; Lancaster, Suzanne; Lederer, Maximilian; Lee, Younghwan; Lomenzo, Patrick D.; Martin, Lane W.; Martin, Simon; Migita, Shinji; Mikolajick, Thomas; Noheda, Beatriz; Park, Min Hyuk; Rabe, Karin M.; Salahuddin, Sayeef; Sanchez, Florencio; Seidel, Konrad; Shimizu, Takao; Shiraishi, Takahisa; Slesazeck, Stefan; Toriumi, Akira; Uchida, Hiroshi; Vilquin, Bertrand; Xu, Xianghan; Ye, Kun Hee; Schroeder, Uwe

Zero-dimensionality of a scaled-down VO2 metal-insulator transition via high-resolution electrostatic gating

NPG ASIA MATERIALS

IF8.3

2023-06-30

OAAI

Yajima, Takeaki; Samata, Yusuke; Hamasuna, Satoshi; Pati, Satya Prakash; Toriumi, Akira

Polarization switching in thin doped HfO2 ferroelectric layers

APPLIED PHYSICS LETTERS

IF3.6

2020-12-28

PREAI

Materano, Monica; Lomenzo, Patrick D.; Mulaosmanovic, Halid; Hoffmann, Michael; Toriumi, Akira; Mikolajick, Thomas; Schroeder, Uwe

Regulating phase transformation kinetics via redox reaction in ferroelectric Ge-doped HfO2

APPLIED PHYSICS LETTERS

IF3.6

2020-11-05

OAAI

Yajima, T.; Nishimura, T.; Migita, S.; Tanaka, T.; Uchida, K.; Toriumi, A.

Stepwise internal potential jumps caused by multiple-domain polarization flips in metal/ferroelectric/metal/paraelectric/metal stack

NATURE COMMUNICATIONS

IF15.7

2020-04-20

OAAI

Li, Xiuyan; Toriumi, Akira

Interface reaction kinetics in SiGe oxidation

APPLIED PHYSICS LETTERS

IF3.6

2019-12-02

PREAI

Li, Xiuyan; Noma, Yusuke; Song, Woojin; Nishimura, Tomonori; Toriumi, Akira

Influence of interface dipole layers on the performance of graphene field effect transistors

CARBON

IF11.6

2019-11-01

OAAI

Nagamura, Naoka; Fukidome, Hirokazu; Nagashio, Kosuke; Horiba, Koji; Ide, Takayuki; Funakubo, Kazutoshi; Tashima, Keiichiro; Toriumi, Akira; Suemitsu, Maki; Horn, Karsten; Oshima, Masaharu

Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm

APPLIED PHYSICS LETTERS

IF3.6

2018-03-06

211

PREAI

Tian, Xuan; Shibayama, Shigehisa; Nishimura, Tomonori; Yajima, Takeaki; Migita, Shinji; Toriumi, Akira

Thermal oxidation kinetics of germanium

APPLIED PHYSICS LETTERS

IF3.6

2017-08-01

PREAI