Edward V. Barnat - Publications, H-index & Citations

Edward V. Barnat

Dalian University of Technology

14H指数

127论文数

819被引数

收录论文 9

发表时间

Spatiotemporally resolved measurements of electric field around a piezoelectric transformer using electric-field induced second harmonic (E-FISH) generation 使用电场感应二次谐波 (e-fish) 生成对压电变压器周围的电场进行时空分辨的测量

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2022-03-07

OAAI

Yang, Jinyu; Barnat, Edward, V; Im, Seong-kyun; Go, David B.

Atomic oxygen density determination in the effluent of the COST reference source using in situ effective lifetime measurements in the presence of a liquid interface

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2021-08-24

OAAI

Myers, Brayden; Barnat, Edward; Stapelmann, Katharina

High-fidelity modeling of breakdown in helium: initiation processes and secondary electron emission

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2021-06-09

OAAI

Lietz, Amanda M.; Barnat, Edward, V; Nail, George R.; Roberds, Nicholas A.; Fierro, Andrew S.; Yee, Benjamin T.; Moore, Chris H.; Clem, Paul G.; Hopkins, Matthew M.

Townsend to glow discharge transition for a nanosecond pulse plasma in helium: space charge formation and resulting electric field dynamics

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2021-05-07

OAAI

Simeni, Marien Simeni; Zheng, Yashuang; Barnat, Edward, V; Bruggeman, Peter J.

Hollow plasma structure during the breakdown phase of nanosecond pulsed pin-pin discharges generated with overvoltage

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2020-03-06

OAAI

Chen, Chuan-Jie; Simeni, Marien Simeni; Li, Shou-Zhe; Barnat, Edward, V; Bruggeman, Peter J.

Editorial for plasma diagnostics using spectroscopic methods

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2018-01-11

OAAI

Sasaki, Koichi; Engeln, Richard; Barnat, Edward V.

Manipulating Thermal Conductance at Metal-Graphene Contacts via Chemical Functionalization

NANO LETTERS

IF9.1

2012-01-10

266

PREAI

Hopkins, Patrick E.; Baraket, Mira; Barnat, Edward V.; Beechem, Thomas E.; Kearney, Sean P.; Duda, John C.; Robinson, Jeremy T.; Walton, Scott G.

Spatial and frequency dependence of plasma currents in a 300mm capacitively coupled plasma reactor

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2006-10-24

PREAI

Miller, Paul A.; Barnat, Edward V.; Hebner, Gregory A.; Paterson, Alex M.; Holland, John P.

Frequency dependent plasma characteristics in a capacitively coupled 300mm wafer plasma processing chamber

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2006-10-24

PREAI

Hebner, Gregory A.; Barnat, Edward V.; Miller, Paul A.; Paterson, Alex M.; Holland, John P.

研究方向