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J. Leo van Hemmen

Eindhoven University of Technology

49H指数
293论文数
9.7K被引数
收录论文 10
发表时间
Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films
err2011-01-01
err75
errOAAI
errJinesh, K. B.; van Hemmen, J. L.; van de Sanden, M. C. M.; Roozeboom, F.; Klootwijk, J. H.; Besling, W. F. A.; Kessels, W. M. M.
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Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs SubstratesGaAs衬底上Al2O3的热和等离子体增强原子层沉积
err2009-01-01
err22
errOAAI
errSioncke, Sonja; Delabie, Annelies; Brammertz, Guy; Conard, Thierry; Franquet, Alexis; Caymax, Matty; Urbanzcyk, Adam; Heyns, Marc; Meuris, Marc; van Hemmen, J. L.; Keuning, W.; Kessels, W. M. M.
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Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor
err2007-01-01
err274
errOAAI
errvan Hemmen, J. L.; Heil, S. B. S.; Klootwijk, J. H.; Roozeboom, F.; Hodson, C. J.; van de Sanden, M. C. M.; Kessels, W. M. M.
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Downstream ion and radical densities in an Ar-NH3 plasma generated by the expanding thermal plasma technique
err2006-06-15
err14
PREAI
errvan den Oever, P. J.; van Hemmen, J. L.; van Helden, J. H.; Schram, D. C.; Engeln, R.; van de Sanden, M. C. M.; Kessels, W. M. M.
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