Jürgen Meichsner - Publications, H-index & Citations

Jürgen Meichsner

Universitat Greifswald

28H指数

133论文数

2.5K被引数

收录论文 24

发表时间

On the E-H transition in inductively coupled radio frequency oxygen plasmas: I. Density and temperature of electrons, ground state and singlet metastable molecular oxygen

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2017-01-19

OAAI

Wegner, Th; Kuellig, C.; Meichsner, J.

On the E-H transition in inductively coupled radio frequency oxygen plasmas: II. Electronegativity and the impact on particle kinetics 关于感应耦合射频氧等离子体中的e-h跃迁: II。电负性及其对粒子动力学的影响

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2017-01-19

OAAI

Wegner, Th; Kuellig, C.; Meichsner, J.

Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

MATERIALS

IF3.2

2016-07-19

OAAI

Chandrashekaraiah, Thejaswini Halethimmanahally; Bogdanowicz, Robert; Ruehl, Eckart; Danilov, Vladimir; Meichsner, Juergen; Thierbach, Steffen; Hippler, Rainer

Plasma-deposited fluorocarbon polymer films on titanium for preventing cell adhesion: a surface finishing for temporarily used orthopaedic implants

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2016-05-13

PREAI

Finke, B.; Testrich, H.; Rebl, H.; Walschus, U.; Schlosser, M.; Zietz, C.; Staehlke, S.; Nebe, J. B.; Weltmann, K. D.; Meichsner, J.; Polak, M.

Influence of nanoparticle formation on discharge properties in argon-acetylene capacitively coupled radio frequency plasmas

APPLIED PHYSICS LETTERS

IF3.6

2016-02-10

PREAI

Wegner, Th; Hinz, A. M.; Faupel, F.; Strunskus, T.; Kersten, H.; Meichsner, J.

Electron heating during E-H transition in inductively coupled RF plasmas 感应耦合射频等离子体中e-h跃迁过程中的电子加热

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2015-06-18

PREAI

Wegner, Th; Kuellig, C.; Meichsner, J.

Spatially resolved Langmuir probe diagnostics in a capacitively coupled radio frequency argon and oxygen plasma

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2015-01-08

PREAI

Kuellig, C.; Wegner, Th; Meichsner, J.

Novel insights into the development of barrier discharges by advanced volume and surface diagnostics

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2013-10-31

PREAI

Brandenburg, R.; Bogaczyk, M.; Hoeft, H.; Nemschokmichal, S.; Tschiersch, R.; Kettlitz, M.; Stollenwerk, L.; Hoder, T.; Wild, R.; Weltmann, K-D; Meichsner, J.; Wagner, H-E

Aging effects of plasma polymerized ethylenediamine (PPEDA) thin films on cell-adhesive implant coatings

MATERIALS SCIENCE & ENGINEERING C-MATERIALS FOR BIOLOGICAL APPLICATIONS

IF8.1

2013-10-01

PREAI

Testrich, H.; Rebl, H.; Finke, B.; Hempel, F.; Nebe, B.; Meichsner, J.

Room temperature plasma oxidation in DCSBD: A new method for preparation of silicon dioxide films at atmospheric pressure

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

IF4.6

2013-05-01

PREAI

Skacelova, Dana; Danilov, Vladimir; Schaefer, Jan; Quade, Antje; St'ahel, Pavel; Cernak, Mirko; Meichsner, Juergen

In vivo examination of the local inflammatory response after implantation of Ti6Al4V samples with a combined low-temperature plasma treatment using pulsed magnetron sputtering of copper and plasma-polymerized ethylenediamine

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN MEDICINE

IF4.5

2013-01-12

PREAI

Hoene, Andreas; Patrzyk, Maciej; Walschus, Uwe; Stranak, Vitezslav; Hippler, Rainer; Testrich, Holger; Meichsner, Juergen; Finke, Birgit; Rebl, Henrike; Nebe, Barbara; Zietz, Carmen; Bader, Rainer; Podbielski, Andreas; Schlosser, Michael

Ionization by bulk heating of electrons in capacitive radio frequency atmospheric pressure microplasmas

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2012-12-20

OAAI

Hemke, T.; Eremin, D.; Mussenbrock, T.; Derzsi, A.; Donko, Z.; Dittmann, K.; Meichsner, J.; Schulze, J.

Modification of Polydimethylsiloxane Coatings by H2 RF Plasma, Xe2*Excimer VUV Radiation, and Low-Energy Electron Beams

Macromolecular Materials and Engineering

IF4.6

2012-06-18

PREAI

Swiderek, Petra; Jolondz, Evgeni; Bredehoeft, Jan Hendrik; Borrmann, Tobias; Doelle, Christopher; Ott, Matthias; Schmueser, Christoph; Hartwig, Andreas; Danilov, Vladimir; Wagner, Hans-Erich; Meichsner, Juergen

Absolute number density and kinetic analysis of the CF radical in pulsed CF4 + H2 radio-frequency plasmas

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2012-04-04

PREAI

Stepanov, S.; Meichsner, J.

Plasma processes for cell-adhesive titanium surfaces based on nitrogen-containing coatings

SURFACE & COATINGS TECHNOLOGY

IF6.1

2011-07-01

PREAI

Finke, B.; Hempel, F.; Testrich, H.; Artemenko, A.; Rebl, H.; Kylian, O.; Meichsner, J.; Biederman, H.; Nebe, B.; Weltmann, K. -D.; Schroeder, K.