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R

Roger De Gryse

Ghent University

33H指数
177论文数
5.9K被引数
收录论文 31
发表时间
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Modeling reactive magnetron sputtering: Fixing the parameter set (vol 206, pg 3666, 2012)
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2015-09-01
err3
PREAI
errStrijckmans, K.; Leroy, W. P.; De Gryse, R.; Depla, D.
err分享
err收藏
The role of the erosion groove during reactive sputter deposition
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2014-11-01
err22
PREAI
errDepla, D.; Strijckmans, K.; De Gryse, R.
err分享
err收藏
Influencing the hysteresis during reactive magnetron sputtering by gas separation
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2013-11-01
err14
PREAI
errDepla, D.; Haemers, J.; De Gryse, R.
err分享
err收藏
Modeling reactive magnetron sputtering: Fixing the parameter set
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2012-04-01
err38
PREAI
errStrijckmans, K.; Leroy, W. P.; De Gryse, R.; Depla, D.
err分享
err收藏
In-situ XAS study on the Cu and Ce local structural changes in a CuO-CeO2/Al2O3 catalyst under propane reduction and re-oxidation
errJOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
IF4.9
err2009-09-01
err44
errOAAI
errSilversmit, Geert; Poelman, Hilde; Balcaen, Veerle; Heynderickx, Philippe M.; Olea, Maria; Nikitenko, Sergey; Bras, Wim; Smet, Philippe F.; Poelman, Dirk; De Gryse, Roger; Reniers, Marie-Francoise; Marin, Guy B.
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Determination of the effective electron emission yields of compound materials
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-09-19
err70
PREAI
errDepla, D.; Li, X. Y.; Mahieu, S.; De Gryse, R.
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Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiNTiN反应磁控溅射过程中硬度和基体通量的表征
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2008-02-01
err20
PREAI
errMahieu, S.; Depla, D.; De Gryse, R.
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err收藏
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-01-11
err17
PREAI
errLi, X. Y.; Depla, D.; Leroy, W. P.; Haemers, J.; De Gryse, R.
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err收藏
Observation of hysteresis in a non-reactive magnetron discharge
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2007-12-19
err5
PREAI
errMusschoot, J.; Depla, D.; Haemers, J.; De Gryse, R.
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err收藏
Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2007-12-17
err12
PREAI
errMusschoot, J.; Depla, D.; Buyle, G.; Haemers, J.; de Gryse, R.
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err收藏
Photocatalytic activity of dc magnetron sputter deposited amorphous TiO2 thin films
errAPPLIED SURFACE SCIENCE
IF6.9
err2007-10-01
err138
PREAI
errEufinger, K.; Poelman, D.; Poelman, H.; De Gryse, R.; Marin, G. B.
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err收藏
Effect of microstructure and crystallinity on the photocatalytic activity of TiO2 thin films deposited by dc magnetron sputtering
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2007-08-16
err76
PREAI
errEufinger, K.; Poelman, D.; Poelman, H.; De Gryse, R.; Marin, G. B.
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err收藏
Towards a more complete model for reactive magnetron sputtering
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2007-03-16
err95
PREAI
errDepla, D.; Heirwegh, S.; Mahieu, S.; De Gryse, R.
err分享
err收藏
Influence of the target composition on the discharge voltage during magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2006-10-01
err25
PREAI
errDepla, D.; Tomaszewski, H.; Buyle, G.; De Gryse, R.
err分享
err收藏
Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2006-09-01
err24
PREAI
errMusschoot, J.; Depla, D.; Buyle, G.; Haemers, J.; De Gryse, R.
err分享
err收藏
Discharge voltage measurements during magnetron sputtering磁控溅射过程中的放电电压测量
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2006-04-01
err112
PREAI
errDepla, D; Buyle, G; Haemers, J; De Gryse, R
err分享
err收藏
Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2006-01-01
err55
PREAI
errMahieu, S; Ghekiere, P; De Winter, G; De Gryse, R; Depla, D; Van Tendeloo, G; Lebedev, OI
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A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2004-10-01
err27
PREAI
errMahieu, S; De Winter, G; Depla, D; De Gryse, R; Denul, J
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TAP studies on the reoxidation of some partially reduced vanadia-based catalysts
errCATALYSIS TODAY
IF5.3
err2004-07-01
err3
PREAI
errSack, I; Olea, M; Poelman, H; Eufinger, K; De Gryse, R; Marin, GB
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Simplified model for the DC planar magnetron discharge平面磁控直流放电的简化模型
errVACUUM
IF3.9
err2004-06-01
err23
errOAAI
errBuyle, G; Depla, D; Eufinger, K; Haemers, J; De Bosscher, W; De Gryse, R
err分享
err收藏

研究方向

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