A. Gicquel - Publications, H-index & Citations

A. Gicquel

Universite Paris 13

46H指数

244论文数

6.5K被引数

收录论文 31

发表时间

Comparison of three optical diagnostic techniques for the measurement of boron atom density in a H2/B2H6 microwave plasma

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2017-11-01

PREAI

Aubert, X.; Duluard, C. Y.; Sadeghi, N.; Gicquel, A.

Self-consistent simulation studies on effect of methane concentration on microwave assisted H2-CH4 plasma at low pressure

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2017-08-07

PREAI

Prasanna, Swaminathan; Michau, Armelle; Rond, Cathy; Hassouni, Khaled; Gicquel, Alix

Spectroscopic study of low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films. Part I: on temperature determination and energetic aspects

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2016-10-03

PREAI

Nave, A. S. C.; Baudrillart, B.; Hamann, S.; Benedic, F.; Lombardi, G.; Gicquel, A.; van Helden, J. H.; Roepcke, J.

Spectroscopic study of low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films. Part II: on plasma chemical processes

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2016-10-03

PREAI

Nave, A. S. C.; Baudrillart, B.; Hamann, S.; Benedic, F.; Lombardi, G.; Gicquel, A.; van Helden, J. H.; Roepcke, J.

Effect of buoyancy on power deposition in microwave cavity hydrogen plasma source

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2016-06-30

PREAI

Prasanna, S.; Rond, C.; Michau, A.; Hassouni, K.; Gicquel, A.

Chemical analysis of H2-B2H6 and H2-CH4-B2H6 microwave CVD plasmas used for diamond deposition

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2016-02-26

PREAI

Rond, Catherine; Salem, Rania; Hamann, Stephan; Lombardi, Guillaume; Roepcke, Juergen; Gicquel, Alix

Structural and magnetic properties of cobalt nanostructures on SiO2/Si(111) substrates

APPLIED SURFACE SCIENCE

IF6.9

2014-11-01

PREAI

Bounour-Bouzamouche, W.; Cherif, S. M.; Farhat, S.; Roussigne, Y.; Tallaire, A.; Gicquel, A.; Lungu, C. P.; Guerioune, M.

Spectroscopic study of H2 microwave plasmas with small admixtures of CH4 and B2H6 used for doped diamond deposition

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2014-07-22

PREAI

Hamann, S.; Rond, C.; Pipa, A. V.; Wartel, M.; Lombardi, G.; Gicquel, A.; Roepcke, J.

Determining electron temperature and electron density in moderate pressure H2/CH4 microwave plasma 确定中压H2/CH4微波等离子体中的电子温度和电子密度

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2014-05-01

PREAI

Derkaoui, N.; Rond, C.; Gries, T.; Henrion, G.; Gicquel, A.

Negative-ion production on carbon materials in hydrogen plasma: influence of the carbon hybridization state and the hydrogen content on H- yield

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2014-02-04

OAAI

Ahmad, Ahmad; Pardanaud, Cedric; Carrere, Marcel; Layet, Jean-Marc; Gicquel, Alix; Kumar, Pravin; Eon, David; Jaoul, Cedric; Engeln, Richard; Cartry, Gilles

Hydrodynamics effects in high power density microwave plasma diamond growth reactors

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2013-09-05

PREAI

Mesbahi, A.; Silva, F.; Farhat, S.; Hassouni, K.; Bonnin, X.; Gicquel, A.

Evaluation of freestanding boron-doped diamond grown by chemical vapour deposition as substrates for vertical power electronic devices

APPLIED PHYSICS LETTERS

IF3.6

2012-03-22

PREAI

Issaoui, R.; Achard, J.; Tallaire, A.; Silva, F.; Gicquel, A.; Bisaro, R.; Servet, B.; Garry, G.; Barjon, J.

Enhanced negative ion yields on diamond surfaces at elevated temperatures

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2011-08-26

PREAI

Kumar, P.; Ahmad, A.; Pardanaud, C.; Carrere, M.; Layet, J. M.; Cartry, G.; Silva, F.; Gicquel, A.; Engeln, R.

Growth of thick heavily boron-doped diamond single crystals: Effect of microwave power density

APPLIED PHYSICS LETTERS

IF3.6

2010-11-01

PREAI

Issaoui, R.; Achard, J.; Silva, F.; Tallaire, A.; Tardieu, A.; Gicquel, A.; Pinault, M. A.; Jomard, F.

Modelling of diamond deposition microwave cavity generated plasmas

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2010-03-30

120

PREAI

Hassouni, K.; Silva, F.; Gicquel, A.

The effects of incident electron current density and temperature on the total electron emission yield of polycrystalline CVD diamond

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2010-03-18

OAAI

Belhaj, M.; Tondu, T.; Inguimbert, V.; Barroy, Pierre; Silva, Francois; Gicquel, Alix

High quality MPACVD diamond single crystal growth: high microwave power density regime

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2007-10-05

171

PREAI

Achard, J.; Silva, F.; Tallaire, A.; Bonnin, X.; Lombardi, G.; Hassouni, K.; Gicquel, A.

Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production:: modelling aspects

NUCLEAR FUSION

IF4

2006-05-22

PREAI

Capitelli, M.; Cacciatore, M.; Celiberto, R.; De Pascale, O.; Diomede, P.; Esposito, F.; Gicquel, A.; Gorse, C.; Hassouni, K.; Laricchiuta, A.; Longo, S.; Pagano, D.; Rutigliano, M.

Gas temperature determination using BH (0-0) A1Π→X1Σ+ emission spectrum in a B2H6 containing plasma for doped diamond deposition

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2006-05-05

PREAI

Rayar, M.; Veis, P.; Foissac, C.; Supiot, P.; Gicquel, A.

Overview of the different aspects in modelling moderate pressure H2 and H2/CH4 microwave discharges

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2006-02-08

PREAI

Hassouni, K; Lombardi, G; Duten, X; Haagelar, G; Silva, F; Gicquel, A; Grotjohn, TA; Capitelli, M; Röpcke, J

研究方向