J. W. Mayer - Publications, H-index & Citations

J. W. Mayer

Arizona State University

81H指数

715论文数

2.5W被引数

收录论文 21

发表时间

Spectroscopic study of microwave-enhanced silicon exfoliation

APPLIED PHYSICS LETTERS

IF3.6

2008-02-25

PREAI

Thompson, D. C.; Alford, T. L.; Mayer, J. W.

Microwave annealing for preparation of crystalline hydroxyapatite thin films

JOURNAL OF MATERIALS SCIENCE

IF3.9

2006-11-01

PREAI

Adams, Daniel; Malgas, Gerald F.; Smith, R. D.; Massia, S. P.; Alford, T. L.; Mayer, J. W.

Fabrication of silicon-on-SiO2/diamondlike-carbon dual insulator using ion cutting and mitigation of self-heating effects

APPLIED PHYSICS LETTERS

IF3.6

2006-04-05

PREAI

Di, ZF; Chu, PK; Zhu, M; Fu, RKY; Luo, SH; Shao, L; Nastasi, M; Chen, P; Alford, TL; Mayer, JW; Zhang, M; Liu, WL; Song, ZT; Lin, CL

H-induced platelet and crack formation in hydrogenated epitaxial Si/Si0.98B0.02/Si structures -: art. no. 021901

APPLIED PHYSICS LETTERS

IF3.6

2006-01-09

OAAI

Shao, L; Lin, Y; Swadener, JG; Lee, JK; Jia, QX; Wang, YQ; Nastasi, M; Thompson, PE; Theodore, ND; Alford, TL; Mayer, JW; Chen, P; Lau, SS

Strain-facilitated process for the lift-off of a Si layer of less than 20 nm thickness

APPLIED PHYSICS LETTERS

IF3.6

2005-12-12

OAAI

Shao, L; Lin, Y; Swadener, JG; Lee, JK; Jia, QX; Wang, YQ; Nastasi, M; Thompson, PE; Theodore, ND; Alford, TL; Mayer, JW; Chen, P; Lau, SS

Microwave-cut silicon layer transfer

APPLIED PHYSICS LETTERS

IF3.6

2005-11-22

PREAI

Thompson, DC; Alford, TL; Mayer, JW; Hochbauer, T; Nastasi, M; Lau, SS; Theodore, ND; Henttinen, K; Suni, I; Chu, PK

A technique to study the lattice location of hydrogen atoms in silicon by channeling elastic recoil detection analysis

APPLIED PHYSICS LETTERS

IF3.6

2005-09-19

PREAI

Shao, L; Wang, YQ; Lee, JK; Nastasi, M; Thompson, PE; Theodore, ND; Mayer, JW

Silicon layer transfer using plasma hydrogenation

APPLIED PHYSICS LETTERS

IF3.6

2005-09-08

PREAI

Chen, P; Lau, SS; Chu, PK; Henttinen, K; Suni, T; Suni, I; Theodore, ND; Alford, TL; Mayer, JW; Shao, L; Nastasi, M

Plasma hydrogenation of strained Si/SiGe/Si heterostructure for layer transfer without ion implantation

APPLIED PHYSICS LETTERS

IF3.6

2005-08-22

OAAI

Shao, L; Lin, Y; Lee, JK; Jia, QX; Wang, YQ; Nastasi, M; Thompson, PE; Theodore, ND; Chu, PK; Alford, TL; Mayer, JW; Chen, P; Lau, SS

Optimized energy window of He beams for accurate determination of depth in channeling Rutherford backscattering spectrometry

APPLIED PHYSICS LETTERS

IF3.6

2005-05-24

PREAI

Shao, L; Wang, YQ; Zhang, X; Wetteland, CJ; Nastasi, M; Thompson, PE; Mayer, JW

Investigation of plasma hydrogenation and trapping mechanism for layer transfer -: art. no. 031904

APPLIED PHYSICS LETTERS

IF3.6

2005-01-07

OAAI

Chen, P; Chu, PK; Höchbauer, T; Lee, JK; Nastasi, M; Buca, D; Mantl, S; Loo, R; Caymax, M; Alford, T; Mayer, JW; Theodore, ND; Cai, M; Schmidt, B; Lau, SS

Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

APPLIED PHYSICS LETTERS

IF3.6

2004-11-22

OAAI

Chen, P; Chu, PK; Höchbauer, T; Nastasi, M; Buca, D; Mantl, S; Theodore, ND; Alford, TL; Mayer, JW; Loo, R; Caymax, M; Cai, M; Lau, SS

Formation of silicides in a cavity applicator microwave system

APPLIED PHYSICS LETTERS

IF3.6

2003-11-10

PREAI

Thompson, DC; Kim, HC; Alford, TL; Mayer, JW

The effect of metals (Au, Ag) and oxidizing ambient on interfacial reactions in Au/Si and Ag/Si systems

APPLIED SURFACE SCIENCE

IF6.9

2003-06-01

PREAI

Adams, D; Julies, BA; Mayer, JW; Alford, TL

Use of TiN(O)/Ti as an effective intermediate stress buffer and diffusion barrier for Cu/parylene-n interconnects

APPLIED PHYSICS LETTERS

IF3.6

2001-11-12

PREAI

Gadre, KS; Alford, TL; Mayer, JW

Direct patterning of nanometer-scale silicide structures on silicon by ion-beam implantation through a thin barrier layer

APPLIED PHYSICS LETTERS

IF3.6

2001-04-30

PREAI

Mitan, MM; Pivin, DP; Alford, TL; Mayer, JW

Deep-level transient spectroscopy of Si/Si1-x-yGexCy heterostructures

APPLIED PHYSICS LETTERS

IF3.6

1998-08-03

PREAI

Stein, BL; Yu, ET; Croke, ET; Hunter, AT; Laursen, T; Mayer, JW; Ahn, CC

Crystalline-to-amorphous transition in chemical vapor deposition of pseudomorphic Si1-x-yGexCy films

APPLIED PHYSICS LETTERS

IF3.6

1997-09-22

PREAI

Laursen, T; Chandrasekhar, D; Smith, DJ; Mayer, JW; Huffman, J; Westhoff, R; Robinson, M

Band offsets in Si/Si1-x-yGexCy heterojunctions measured by admittance spectroscopy

APPLIED PHYSICS LETTERS

IF3.6

1997-06-23

PREAI

Stein, BL; Yu, ET; Croke, ET; Hunter, AT; Laursen, T; Bair, AE; Mayer, JW; Ahn, CC

Band gap of Ge rich Si1-x-yGexCy alloys

APPLIED PHYSICS LETTERS

IF3.6

1996-10-21

PREAI

Orner, BA; Olowolafe, J; Roe, K; Kolodzey, J; Laursen, T; Mayer, JW; Spear, J

研究方向