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Yunhui Shi

hebei university of technology

23H指数
80论文数
2.1K被引数
收录论文 44
发表时间
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Design of TGV high-speed planarization chemical mechanical polishing slurry and research on the microscopic mechanism of material removalTGV高速平坦化化学机械抛光液的配方设计与材料去除微观机理研究
errApplied Surface Science
IF6.9
err2026-07-01
err0
PREAI
errYang, Peng; Wang, Ru; Zhu, Yu; Liang, Zhe; Chen, Yang; Li, Ziyang; Miao, Jiazhi; Zhang, Hongyang; Shi, Yunhui
err分享
err收藏
Synergistic engineering of MoB/Ni3S2 heterostructures in asymmetric supercapacitors for high-performance alternating current line filtering不对称超级电容器中MoB/Ni3S2异质结构的协同工程用于高性能交流线路滤波
errJournal of Energy Storage
IF9.8
err2026-04-22
err0
PREAI
errYao Xu; Jiawei Qiu; Xuedi Yang; Yongxin Wang; Yizhan Wang; Jiabao Cheng; Yunhui Shi
err分享
err收藏
Mechanism and performance optimization of diethylenetriamine in selectivity ratios for silicon and copper removal during TSV back-side CMP二乙烯三胺在硅和铜去除选择性比例中的机制与性能优化：TSV背面化学机械抛光期间
errMicroelectronics Reliability
IF1.9
err2026-02-01
err0
PREAI
errLiang, Zhe; Zhu, Yu; Wang, Ru; Du, Zhanjie; Chen, Yang; Yang, Peng; Shi, Yunhui
err分享
err收藏
Experiments and theoretical calculations for simplified slurry of copper in chemical mechanical polishing using eco-friendly mixed surfactants
errELECTROCHIMICA ACTA
IF5.6
err2026-01-21
err0
PREAI
errHe, Chao; Niu, Xinhuan; Liu, Jianghao; Cheng, Jiabao; Dong, Changxin; Li, Xinjie; Wu, Zheng; Zhou, Jiakai; Shi, Yunhui
err分享
err收藏
Research progress of ceria abrasives in STI CMP: optimization and applicationCeO2抛光粉在STI化学机械抛光中的研究进展：优化与应用
errThe International Journal of Advanced Manufacturing Technology
IF0
err2025-09-23
err0
PREAI
errXinyu Zhao; Xinyu Han; Baimei Tan; Jiadong Zhao; Wenyue Qi; Jiaji Geng; Yunhui Shi; Yanyan Huang
err分享
err收藏
Electrode materials in focus: Advancements in pseudocapacitors for AC line filtering电极材料聚焦：赝电容器在交流线路滤波中的进展
errJournal of Energy Storage
IF9.8
err2025-07-15
err0
PREAI
errYao Xu; Yongxin Wang; Jiawei Qiu; Yizhan Wang; Jiabao Cheng; Yunhui Shi
err分享
err收藏
Oxygen Vacancy Engineering in Co-Doped CeO2 for Silica Wafer PolishingCeO2中掺杂Co的氧空位工程用于硅片抛光
errACS Applied Nano Materials
IF5.5
err2025-07-10
err0
PREAI
errJiabao Cheng; Yunhui Shi; Xinhuan Niu; Baimei Tan; Zhe Li; Yanjie Cheng; Yizhan Wang; Jiawei Qiu; Yao Xu; Yongxin Wang; Chao He; Changxin Dong
err分享
err收藏
Improvement of polishing performance of SiO2/Si3N4 by surfactants in CeO2 based slurry通过表面活性剂改善CeO2基浆料中SiO2/Si3N4的抛光性能
errApplied Surface Science
IF6.9
err2025-07-05
err0
PREAI
errXinyu Zhao; Xinyu Han; Fangyuan Wang; Baimei Tan; Yunhui Shi; Jiadong Zhao; Wenyue Qi; Jiaji Geng
err分享
err收藏
Dual modification of Co doped CeO2 abrasives for enhanced chemical mechanical polishing performanceCo掺杂CeO2磨料的双重改性以提高化学机械抛光性能
errCeramics International
IF5.6
err2025-06-11
err0
PREAI
errJiabao Cheng; Yunhui Shi; Yizhan Wang; Jiawei Qiu; Yao Xu; Yongxin Wang; Xinhuan Niu; Baimei Tan
err分享
err收藏
Effect of aminoguanidine hydrochloride on chemical mechanical polishing of Ta-based barrier layers on TSV wafers盐酸氨基脲对TSV硅片上Ta基阻挡层的化学机械抛光的影响
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2025-05-30
err0
PREAI
errZhu, Yu; Wang, Ru; Chen, Xuhua; Du, Zhanjie; Liang, Zhe; Zheng, Tao; Dong, Yanwei; Chen, Yang; Yang, Peng; Shi, Yunhui
err分享
err收藏
Insights into molecular interactions at organic-MBene heterointerfaces for efficient Zn-ion storage (vol 678, pg 95, 2025)有机-MBene异质界面分子相互作用对高效锌离子存储的见解（卷678，页95，2025）
errJOURNAL OF COLLOID AND INTERFACE SCIENCE
IF9.7
err2025-04-01
err0
PREAI
errWang, Yizhan; Shi, Yunhui; Qiu, Jiawei; Cheng, Jiabao; Xu, Yao; Wang, Yongxin
err分享
err收藏
Insights into molecular interactions at organic-MBene heterointerfaces for efficient Zn-ion storage深入了解有机-mb烯异质界面上的分子相互作用以有效存储Zn离子
errJOURNAL OF COLLOID AND INTERFACE SCIENCE
IF9.7
err2025-01-01
err0
PREAI
errWang, Yizhan; Shi, Yunhui; Qiu, Jiawei; Cheng, Jiabao; Xu, Yao; Wang, Yongxin
err分享
err收藏
Exploring the potential of MBenes in AC filtering探索MBenes在交流滤波中的潜力
errAPPLIED MATERIALS TODAY
IF6.9
err2024-12-01
err0
PREAI
errQiu, Jiawei; Cheng, Jiabao; Wang, Yizhan; Xu, Yao; Wang, Yongxin; Shi, Yunhui
err分享
err收藏
Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: Combining experiments and theoretical calculation
errTRIBOLOGY INTERNATIONAL
IF6.9
err2024-11-01
err0
PREAI
errLi, Xinjie; Zou, Yida; Niu, Xinhuan; Jia, Yingqian; Zhan, Ni; Liu, Jianghao; He, Chao; Dong, Changxin; Shi, Yunhui
err分享
err收藏
The effect of amino acid addition in CeO2-based 2-based slurry on SiO2/Si3N4 2 /Si 3 N 4 CMP: Removal rate selectivity, morphology, and mechanism researchCeO2-based 2基浆料中氨基酸添加对SiO2/Si3N4 2/Si 3 N 4 CMP的影响: 去除速率选择性、形态、机理研究
errJOURNAL OF MOLECULAR LIQUIDS
IF5.2
err2024-10-01
err2
PREAI
errHan, Xinyu; Zhang, Shihao; Liu, Renhao; Wang, Fangyuan; Tan, Baimei; Zhao, Xinyu; Zhao, Jiadong; Shi, Yunhui
err分享
err收藏
Exploring the potential of Mbenes in energy storage探索Mbenes在储能方面的潜力
errCOLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
IF5.4
err2024-09-01
err0
PREAI
errLi, Zhe; Cheng, Yanjie; Cheng, Jiabao; Qiu, Jiawei; Shi, Yunhui; Wang, Ru
err分享
err收藏
Chemical-mechanical synergies effects of multi-purpose pH regulators on C-, A-, and R-plane sapphire polishing
errTRIBOLOGY INTERNATIONAL
IF6.9
err2024-07-01
err4
PREAI
errZou, Yida; Niu, Xinhuan; Zhan, Ni; Liu, Jianghao; Li, Xinjie; He, Chao; Dong, Changxin; Shi, Yunhui
err分享
err收藏
The effect of non-ionic surfactants on the removal of cerium oxide particles in STI CMP post cleaning非离子表面活性剂对STI CMP后清洗中氧化铈颗粒去除的影响
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2024-06-01
err1
PREAI
errZhao, Xinyu; Yan, Mei; Wang, Fangyuan; Han, Xinyu; Tan, Baimei; Zhao, Jiadong; Liu, Renhao; Shi, Yunhui
err分享
err收藏
Corrosion inhibition mechanisms of triazole derivatives on copper chemical mechanical polishing: Combined experiment and DFT study三唑衍生物对铜化学机械抛光的缓蚀机理: 结合实验和DFT研究
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-05-01
err15
PREAI
errLiu, Jianghao; Niu, Xinhuan; Jia, Yingqian; Zhan, Ni; Zou, Yida; Shi, Yunhui; Zhou, Jianwei
err分享
err收藏
Three anionic surfactants for corrosion inhibition in cobalt CMP: Research on validity and mechanism三种阴离子表面活性剂在钴CMP中的缓蚀作用: 有效性和机理研究
errSURFACES AND INTERFACES
IF6.3
err2024-04-01
err6
PREAI
errWang, Fangyuan; Zhang, Shihao; Tan, Baimei; Shi, Yunhui; Wang, Xiaolong; Du, Haoyu; Liu, Renhao; Han, Xinyu
err分享
err收藏

研究方向

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合作学者
合作期刊
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陶占良 封面图
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彭
彭生杰 (Shengjie Peng)
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