Esteban A. Marques

istituto per la microelettronica e microsistemi (imm-cnr)

7H指数

15论文数

308被引数

收录论文 8

发表时间

Stability of TiN(001) surfaces in humid air and aqueous environments using ab initio thermodynamics and implicit solvation methods 使用第一性原理热力学和隐式溶剂化方法研究TiN(001)表面在湿空气和水环境中的稳定性

Applied Surface Science

IF6.9

2026-01-01

PREAI

Deretzis, Ioannis; Fisicaro, Giuseppe; Calogero, Gaetano; Ricciarelli, Damiano; Marques, Esteban; Huet, Karim; La Magna, Antonino

Dilute Rhenium Doping and its Impact on Defects in MoS2 稀铼掺杂及其对MoS2中缺陷的影响

ACS NANO

IF16

2023-08-03

PREAI

Torsi, Riccardo; Munson, Kyle T.; Pendurthi, Rahul; Marques, Esteban; Van Troeye, Benoit; Huberich, Lysander; Schuler, Bruno; Feidler, Maxwell; Wang, Ke; Pourtois, Geoffrey; Das, Saptarshi; Asbury, John B.; Lin, Yu-Chuan; Robinson, Joshua A.

A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2023-05-22

OAAI

Kaneda, Yukio; Nye, Rachel A. A.; Marques, Esteban A. A.; Armini, Silvia; Delabie, Annelies; van Setten, Michiel J. J.; Pourtois, Geoffrey

Benchmarking First-Principles Reaction Equilibrium Composition Prediction 基准测试第一原理反应平衡组成预测

MOLECULES

IF4.6

2023-04-22

OAAI

Marques, Esteban A. A.; De Gendt, Stefan; Pourtois, Geoffrey; van Setten, Michiel J. J.

Improving Accuracy and Transferability of Machine Learning Chemical Activation Energies by Adding Electronic Structure Information

JOURNAL OF CHEMICAL INFORMATION AND MODELING

IF5.3

2023-03-03

PREAI

Marques, Esteban; de Gendt, Stefan; Pourtois, Geoffrey; van Setten, Michiel J.

Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity 通过扩散和尺寸依赖性反应性增强亚50 nm纳米图案中钌原子层沉积的选择性

ADVANCED MATERIALS INTERFACES

IF4.4

2021-09-23

PREAI

Clerix, Jan-Willem J.; Marques, Esteban A.; Soethoudt, Job; Grillo, Fabio; Pourtois, Geoffrey; Van Ommen, J. Ruud; Delabie, Annelies

Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion

CHEMISTRY OF MATERIALS

IF7

2020-11-06

OAAI

Grillo, Fabio; Soethoudt, Job; Marques, Esteban A.; de Martin, Lilian; Van Dongen, Kaat; van Ommen, J. Ruud; Delabie, Annelies

Diffusion-Mediated Growth and Size-Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates

ADVANCED MATERIALS INTERFACES

IF4.4

2018-10-17

OAAI

Soethoudt, Job; Grillo, Fabio; Marques, Esteban A.; van Ommen, J. Ruud; Tomczak, Yoann; Nyns, Laura; Van Elshocht, Sven; Delabie, Annelies

研究方向