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S

Stefan De Gendt

interuniversity microelectronics centre
H指数:52
被引数:1.2万

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A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance

高分辨率EUV锌-氧肟酸盐抗蚀剂：为何后曝光烘烤无法改善光刻性能

The Journal of Physical Chemistry C
IF3.2
2026-04-290
PRE
Ying-Lin Chen; Fabian Holzmeier; Roberto Fallica; Tan Manuel Marcello Nathanael; Fernando M. Fernandes; Benoit Hackens; Dhirendra P. Singh; Thierry Conard; Li-Ting Tseng; Thomas M. Gädda; Sarah Seefried; Zhongmei Han; Stefan De Gendt; Kevin Dorney; Danilo De Simone
Electronic effects of localized strain in graphene

石墨烯局域应变的电子效应

Carbon
IF11.6
2026-02-040
PRE
Zviadi Zarkua; Robin Smeyers; Aleksandr Seliverstov; Renan Villarreal; Ahmed Samir Lotfy; Rikkie Joris; Muhammad Saad; Hung-Chieh Tsai; Stefan De Gendt; Steven Brems; Steven De Feyter; Felix Junge; Hans Hofsäss; Giovanni Di Santo; Luca Petaccia; Simona Achilli; E. Harriet Åhlgren; François M. Peeters; Milorad V. Milošević; Lucian Covaci
Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake

基于锡的金属氧化物抗蚀剂的光刻胶曝光和工艺化学基础理解：后曝光延迟和烘烤过程中环境气氛的影响

Journal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
2026-01-010
PRE
Pollentier, Ivan; Holzmeier, Fabian; Fallica, Roberto; Chen, Ying-Lin; Singh, Dhirendra P.; Piatti, Lorenzo; Suh, Hyo Seon; De Simone, Danilo; De Gendt, Stefan; Van Der Heide, Paul; Petersen, John; Dorney, Kevin
Transfer of Substitutionally Implanted Graphene

取代性植入石墨烯的转移

ACS APPLIED MATERIALS & INTERFACES
IF8.2
2025-03-240
PRE
Zarkua, Z; Lotfy, AS; Maesen, Z; Seliverstov, A; He, C; Joris, R; Saad, M; van Stiphout, K; Tsai, HC; Junge, F; Hofsaess, HC; Lacovig, P; Lizzit, S; Di Santo, G; Petaccia, L; Choueikani, F; Ohresser, P; De Feyter, S; De Gendt, S; Brems, S; van de Vondel, J; Villarreal, R; Pereira, LMC
Achieving High Substitutional Incorporation in Mn-Doped Graphene

在Mn掺杂的石墨烯中实现高取代掺入

ACS NANO
IF16
2024-06-281
PRE
Villarreal, Renan; Zarkua, Zviadi; Kretschmer, Silvan; Hendriks, Vince; Hillen, Jonas; Tsai, Hung Chieh; Junge, Felix; Nissen, Matz; Saha, Tanusree; Achilli, Simona; Hofsa''ss, Hans C.; Martins, Michael; De Ninno, Giovanni; Lacovig, Paolo; Lizzit, Silvano; Di Santo, Giovanni; Petaccia, Luca; De Feyter, Steven; De Gendt, Stefan; Brems, Steven; van de Vondel, Joris; Krasheninnikov, Arkady V.; Pereira, Lino M. C.

研究方向

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M
Marc Heyns
H 指数:62论文数:1,046被引数:1.5万
T
Thierry Conard
H 指数:42论文数:571被引数:7,186
S
Sven Van Elshocht
H 指数:42论文数:507被引数:7,145
M
Matty Caymax
H 指数:56论文数:870被引数:1.1万
S
Steven Brems
H 指数:24论文数:173被引数:2,286
A
Annelies Delabie
H 指数:43论文数:353被引数:6,038
S
Silvia Armini
H 指数:25论文数:190被引数:2,315
C
Cedric Huyghebaert
H 指数:40论文数:218被引数:6,560
M
Michel Houssa
H 指数:51论文数:534被引数:1.1万
S
Steven De Feyter
H 指数:78论文数:720被引数:2.5万