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S

Stefan De Gendt

interuniversity microelectronics centre

52H指数
1.0K论文数
1.3W被引数
收录论文 196
发表时间
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A High-Resolution EUV Zinc-Oximate Resist: Why Post-exposure Bake Fails to Improve Lithography Performance高分辨率EUV锌-氧肟酸盐抗蚀剂：为何后曝光烘烤无法改善光刻性能
errThe Journal of Physical Chemistry C
IF3.2
err2026-04-29
err0
PREAI
errYing-Lin Chen; Fabian Holzmeier; Roberto Fallica; Tan Manuel Marcello Nathanael; Fernando M. Fernandes; Benoit Hackens; Dhirendra P. Singh; Thierry Conard; Li-Ting Tseng; Thomas M. Gädda; Sarah Seefried; Zhongmei Han; Stefan De Gendt; Kevin Dorney; Danilo De Simone
err分享
err收藏
Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone采用N2/H2等离子体暴露和六氟乙酰丙酮的镍原子层刻蚀
errACS Applied Electronic Materials
IF4.7
err2026-04-24
err0
PREAI
errAli Mohamed Ali; Guillaume Krieger; Jean-Philippe Soulié; Harm C. M. Knoops; Wilhelmus M. M. Kessels; Stefan De Gendt; Souvik Kundu; Jean-François de Marneffe
err分享
err收藏
Electronic effects of localized strain in graphene石墨烯局域应变的电子效应
errCarbon
IF11.6
err2026-02-04
err0
PREAI
errZviadi Zarkua; Robin Smeyers; Aleksandr Seliverstov; Renan Villarreal; Ahmed Samir Lotfy; Rikkie Joris; Muhammad Saad; Hung-Chieh Tsai; Stefan De Gendt; Steven Brems; Steven De Feyter; Felix Junge; Hans Hofsäss; Giovanni Di Santo; Luca Petaccia; Simona Achilli; E. Harriet Åhlgren; François M. Peeters; Milorad V. Milošević; Lucian Covaci
err分享
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Reducing the Environmental Impact of Wet Chemical Processes for Advanced Semiconductor Manufacturing减少先进半导体制造中湿化学工艺的环境影响
errSustainable Chemistry
IF4.2
err2026-02-02
err0
errOAAI
errGocyla, Mateusz; Boakes, Lizzie; Struyf, Herbert; Chokri, Rachid; Vandevenne, Tibo; Van Caneghem, Jo; Rolin, Cedric; De Gendt, Stefan
err分享
err收藏
Transient-Assisted Processing (TAP): A Path to Low-Emission Dry Etching in the Ångström-Node Era
errACS Sustainable Chemistry and Engineering
IF7.3
err2026-01-20
err0
PREAI
errAtefeh Fathzadeh; Philippe Bezard; Emily Gallagher; Giel Arnauts; Stefan De Gendt
err分享
err收藏
Fundamental understanding of exposure and process chemistry of Sn-based metal oxide resists: effects of ambient environment during post-exposure delay and bake基于锡的金属氧化物抗蚀剂的光刻胶曝光和工艺化学基础理解：后曝光延迟和烘烤过程中环境气氛的影响
errJournal of Micro-Nanopatterning Materials and Metrology-JM3
IF1.8
err2026-01-01
err0
PREAI
errPollentier, Ivan; Holzmeier, Fabian; Fallica, Roberto; Chen, Ying-Lin; Singh, Dhirendra P.; Piatti, Lorenzo; Suh, Hyo Seon; De Simone, Danilo; De Gendt, Stefan; Van Der Heide, Paul; Petersen, John; Dorney, Kevin
err分享
err收藏
Hard Mask Strategies in Nanoscale Patterning of Mg-Based Oxide Semiconductors: Implications for Advanced Device Architectures
errACS APPLIED NANO MATERIALS
IF5.5
err2025-12-01
err0
PREAI
errGhorbani, Leila; Pavel, Alexandru; Dekkers, Hendrik F. W.; De Gendt, Stefan; Kundu, Shreya
err分享
err收藏
Photocatalytic TiO2 surface combined with lithography defined area-selective deposition of Ru: Selectivity and defect formation mechanisms光催化TiO2表面结合光刻定义的区域选择性沉积Ru：选择性与缺陷形成机制
errSurfaces and Interfaces
IF6.3
err2025-11-29
err0
PREAI
errJayant K. Lodha; Stefan De Gendt; Silvia Armini
err分享
err收藏
Patterning of Mg-Based Oxide Semiconductors (MgZnO) at Sub-100 nm Pitches: Reactive Ion Etching versus Atomic Layer EtchingMg基氧化物半导体(MgZnO)在亚100 nm间距上的图形化：反应离子刻蚀与原子层刻蚀
errACS Applied Materials & Interfaces
IF8.2
err2025-10-29
err0
PREAI
errLeila Ghorbani; Souvik Kundu; Alexandru Pavel; Shankha Mukherjee; Anastasiia Kruv; Stefan De Gendt; Shreya Kundu
err分享
err收藏
A dry-wet quasi-ALE approach for transition metals: tungsten as a model system一种干湿准ALE方法用于过渡金属：以钨为模型系统
errApplied Surface Science
IF6.9
err2025-10-24
err0
errOAAI
errCinzia Chan; Jean-François de Marneffe; Christopher Gort; Jill Serron; Marta Agati; Felix Seidel; Jan P. Hofmann; Stefan De Gendt; Dennis H. van Dorp
err分享
err收藏
Phase and orientation evolution of Bismuth during heteroepitaxy on ML-MoS2/Sapphire (0001) surfaces铋在异质外延生长于ML-MoS2/蓝宝石(0001)表面的相和取向演化
errJournal of Materials Science
IF3.9
err2025-09-05
err0
PREAI
errGaohang He; Aryan Afzalian; Olivier Richard; Stefanie Sergeant; Thomas Nuytten; Surajit Sutar; Kaustuv Banerjee; César Javier Lockhart de la Rosa; Gouri Sankar Kar; Stefan De Gendt; Clement Merckling
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err收藏
Structural transformation for BaBiO3-δ thin films grown on SrTiO3-buffered Si(001) induced by an in-situ molecular beam epitaxy cooldown process在SrTiO3缓冲Si(001)上生长的BaBiO3-δ薄膜通过原位分子束外延冷却过程引起的结构转变
errCommunications Materials
IF9.6
err2025-08-20
err0
errOAAI
errIslam Ahmed; Olivier Richard; Partrick Carolan; Marco Gambin; Luca Ceccon; Moloud Kaviani; Stefan De Gendt; Clement Merckling
err分享
err收藏
Study on Next-Generation EUV Lithography Technology: Hyper NA; the Highest Potential for Practical Implementation下一代EUV光刻技术的研究：高NA；最高实用化潜力
errACS Applied Materials & Interfaces
IF8.2
err2025-08-11
err0
PREAI
errInhwan Lee; Joern-Holger Franke; Vicky Philipsen; Kurt Ronse; Stefan De Gendt; Eric Hendrickx
err分享
err收藏
Transfer of Substitutionally Implanted Graphene取代性植入石墨烯的转移
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-03-24
err0
PREAI
errZarkua, Z; Lotfy, AS; Maesen, Z; Seliverstov, A; He, C; Joris, R; Saad, M; van Stiphout, K; Tsai, HC; Junge, F; Hofsaess, HC; Lacovig, P; Lizzit, S; Di Santo, G; Petaccia, L; Choueikani, F; Ohresser, P; De Feyter, S; De Gendt, S; Brems, S; van de Vondel, J; Villarreal, R; Pereira, LMC
err分享
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Isolating the Role of Photoionization for Copolymer Present in Extreme Ultraviolet Photoresists by Gas Phase Electron-Ion Coincidence Experiments通过气相电子-离子符合实验，分离出存在于极紫外光刻胶中的共聚物的光致电离作用
erracs applied engineering materials
IF4.7
err2025-01-14
err0
PREAI
errSajjadian, FS; Laffert, V; Singh, DP; Galleni, L; Pollentier, I; Richter, R; van Setten, MJ; De Gendt, S; Conard, T; Holzmeier, F
err分享
err收藏
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
errNANOMATERIALS
IF4.3
err2024-07-16
err0
errOAAI
errLodha, Jayant Kumar; Meersschaut, Johan; Pasquali, Mattia; Billington, Hans; Gendt, Stefan De; Armini, Silvia
err分享
err收藏
Achieving High Substitutional Incorporation in Mn-Doped Graphene在Mn掺杂的石墨烯中实现高取代掺入
errACS NANO
IF16
err2024-06-28
err1
PREAI
errVillarreal, Renan; Zarkua, Zviadi; Kretschmer, Silvan; Hendriks, Vince; Hillen, Jonas; Tsai, Hung Chieh; Junge, Felix; Nissen, Matz; Saha, Tanusree; Achilli, Simona; Hofsa''ss, Hans C.; Martins, Michael; De Ninno, Giovanni; Lacovig, Paolo; Lizzit, Silvano; Di Santo, Giovanni; Petaccia, Luca; De Feyter, Steven; De Gendt, Stefan; Brems, Steven; van de Vondel, Joris; Krasheninnikov, Arkady V.; Pereira, Lino M. C.
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Enhancing dielectric passivation on monolayer WS2 via a sacrificial graphene oxide seeding layer
errNPJ 2D MATERIALS AND APPLICATIONS
IF8.8
err2024-03-27
err3
errOAAI
errWyndaele, P. -J.; De Marneffe, J. -F.; Sergeant, S.; De La Rosa, C. J. L.; Brems, S.; Caro, A. M.; De Gendt, S.
err分享
err收藏
Influence of thickness scaling on the electronic structure and optical properties of oxygen deficient BaBiO3-δ thin films grown on SrTiO3-buffered Si(001) substrate
errAPL MATERIALS
IF4.5
err2024-03-05
err0
errOAAI
errAhmed, I.; Korytov, M.; Sergeant, S.; Nuytten, T.; Conard, T.; De Gendt, S.; Merckling, C.
err分享
err收藏
Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist-Utilizing Radical- and Acid-Amplified Cross-Linking利用自由基和酸放大交联的聚合物抗蚀剂的极紫外光刻性能和反应机理
errCHEMISTRY OF MATERIALS
IF7
err2024-02-01
err7
PREAI
errNaqvi, Bilal A.; Enomoto, Satoshi; Machida, Kohei; Takata, Yui; Kozawa, Takahiro; Muroya, Yusa; De Gendt, Stefan; De Simone, Danilo
err分享
err收藏

研究方向

暂无研究方向
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合作期刊
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