Kenneth E. Gonsalves - Publications, H-index & Citations

Kenneth E. Gonsalves

indian institute of technology (iit) - mandi

35H指数

252论文数

4.0K被引数

收录论文 42

发表时间

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning 用于电子束和氦离子束光刻的带有有机碘功能的抗蚀剂: 复杂和16 nm以下的图案化

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2021-04-22

PREAI

Yogesh, Midathala; Moinuddin, Mohamad G.; Chauhan, Manvendra; Sharma, Satinder K.; Ghosh, Subrata; Gonsalves, Kenneth E.

Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation

APPLIED SURFACE SCIENCE

IF6.9

2020-12-01

PREAI

Belmonte, Guilherme K.; Cendrond, Suelen W.; Reddy, Pulikanti Guruprasad; Moura, Cleverson A. S.; Moinuddin, Mohamad Ghulam; Peter, Jerome; Sharma, Satinder K.; Lando, Gabriela Albara; Puiatti, Marcelo; Gonsalves, Kenneth E.; Weibel, Daniel E.

Resists for Helium Ion Beam Lithography: Recent Advances

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2020-11-24

PREAI

Kiran, Nagarjuna Ravi; Chauhan, Manvendra; Sharma, Satinder K.; Ghosh, Subrata; Gonsalves, Kenneth E.

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography 亚10 nm电子束和氦离子束光刻镍基负性金属氧化物团簇抗蚀剂的研制

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2020-04-08

PREAI

Kumar, Rudra; Chauhan, Manvendra; Moinuddin, Mohamad G.; Sharma, Satinder K.; Gonsalves, Kenneth E.

Polarization Dependence in the Carbon K-Edge Photofragmentation of MAPDST Photoresist: An Experimental and Theoretical Study

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2018-11-26

PREAI

Moura, Cleverson A. S.; Belmonte, Guilherme K.; Segala, Maximiliano; Gonsalves, Kenneth E.; Weibel, Daniel E.

EUV photofragmentation and oxidation of a polyarylene - Sulfonium resist: XPS and NEXAFS study

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY

IF4.7

2018-09-01

PREAI

Belmonte, Guilherme Kretzmann; da Silva Moura, Cleverson Alves; Reddy, Pulikanti Guruprasad; Gonsalves, Kenneth E.; Weibel, Daniel Eduardo

Engineering Multifunctionality in Hybrid Polyoxometalates: Aromatic Sulfonium Octamolybdates as Excellent Photochromic Materials and Self-Separating Catalysts for Epoxidation

INORGANIC CHEMISTRY

IF4.7

2017-08-17

PREAI

Kumar, Ashwani; Gupta, Abhishek Kumar; Devi, Manisha; Gonsalves, Kenneth E.; Pradeep, Chullikkattil P.

Organic-inorganic hybrid photoresists containing hexafluoroantimonate: design, synthesis and high resolution EUV lithography studies

MATERIALS CHEMISTRY FRONTIERS

IF6.4

2017-01-01

PREAI

Reddy, Pulikanti Guruprasad; Kumar, Pawan; Ghosh, Subrata; Pradeep, Chullikkattil P.; Sharma, Satinder K.; Gonsalves, Kenneth E.

A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

MATERIALS CHEMISTRY FRONTIERS

IF6.4

2017-01-01

PREAI

Nandi, Santu; Yogesh, Midathala; Reddy, Pulikanti Guruprasad; Sharma, Satinder K.; Pradeep, Chullikkattil P.; Ghosh, Subrata; Gonsalves, Kenneth E.

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications 聚亚芳基锍盐作为一种新型和通用的非化学放大负色调光刻胶，用于高分辨率极紫外光刻应用

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2016-12-27

PREAI

Reddy, Pulikanti Guruprasad; Pal, Satyendra Prakash; Kumar, Pawan; Pradeep, Chullikkattil P.; Ghosh, Subrata; Sharma, Satinder K.; Gonsalves, Kenneth E.

Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non chemically amplified photoresist

SCIENTIFIC REPORTS

IF3.9

2016-03-15

OAAI

Ghosh, Subrata; Satyanarayana, V. S. V.; Pramanick, Bulti; Sharma, Satinder K.; Pradeep, Chullikkattil P.; Morales-Reyes, Israel; Batina, Nikola; Gonsalves, Kenneth E.

Aromatic Sulfonium Polyoxomolybdates: Solid-State Photochromic Materials with Tunable Properties

CHEMISTRY-A EUROPEAN JOURNAL

IF3.7

2015-11-10

PREAI

Kumar, Ashwani; Devi, Manisha; Mamidi, Narsimha; Gonsalves, Kenneth E.; Pradeep, Chullikkattil P.

Selective Fragmentation of Radiation-Sensitive Novel Polymeric Resist Materials by Inner-Shell Irradiation

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2015-07-23

PREAI

Chagas, Gabriela Ramos; Satyanarayana, Vardhineedi Sri Venkata; Kessler, Felipe; Belmonte, Guilherme Kretzmann; Gonsalves, Kenneth E.; Weibel, Daniel Eduardo

New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-Patterning 含杂化聚合物的新型多金属氧酸盐及其纳米图案化潜力

CHEMISTRY-A EUROPEAN JOURNAL

IF3.7

2014-11-27

PREAI

Kalyani, Vishwanath; Satyanarayana, V. S. V.; Singh, Vikram; Pradeep, Chullikkattil P.; Ghosh, Subrata; Sharma, Satinder K.; Gonsalves, Kenneth E.

Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies 辐射敏感的新型聚合物抗蚀剂材料: 迭代合成及其EUV碎片研究

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2014-03-13

PREAI

Satyanarayana, V. S. V.; Kessler, Felipe; Singh, Vikram; Scheffer, Francine R.; Weibel, Daniel E.; Ghosh, Subrata; Gonsalves, Kenneth E.