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Satoshi Hamaguchi

University of Osaka

47H指数
431论文数
1.1W被引数
收录论文 51
发表时间
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Enhancing lithium-ion battery analysis: A machine learning approach to investigate innovative silicon thin film anode parameters and discharge capacity提升锂离子电池分析：一种机器学习方法用于研究创新的硅薄膜负极参数和放电容量
errJournal of Power Sources
IF7.9
err2026-03-07
err0
PREAI
errElif Muslu Yilmaz; Aysegul Uygun Oksuz; Satoshi Hamaguchi; Elif Ceren Gok Yildirim; Murat Onur Yildirim; Kazumasa Ikuse; Pierre Vinchon; Nicolas Mauchamp; Esin Eren
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On the role of positive ion neutralization in defect generation in monolayer graphene exposed to sub-threshold energy ions亚阈值能量离子暴露下单层石墨烯中正离子中和在缺陷生成中的作用
errJournal of Physics D: Applied Physics
IF3.2
err2025-12-30
err0
PREAI
errPierre Vinchon; Luc Stafford; Nicolas Mauchamp; Satoshi Hamaguchi
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Comparing the osteogenic effects of sputtered titanium- and strontium titanate (STO)-modified polyetheretherketone比较溅射钛和钛酸锶锆石（STO）修饰的聚醚醚酮的成骨效果
errEMERGENT MATERIALS
IF4.1
err2025-02-25
err0
errOAAI
errIkuta, Masato; Harumningtyas, Anjar Anggraini; Ito, Tomoko; Fujita, Kenta; Kitahara, Takayuki; Bun, Masayuki; Furuichi, Takuya; Hirai, Hiromasa; Ukon, Yuichiro; Tateiwa, Daisuke; Kanie, Yuya; Furuya, Masayuki; Fujimori, Takahito; Okada, Seiji; Hamaguchi, Satoshi; Kaito, Takashi
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Self-consistent calculation of the optical emission spectrum of an argon capacitively coupled plasma based on the coupling of particle simulation with a collisional-radiative model基于粒子模拟与碰撞辐射模型耦合的氩电容耦合等离子体光发射光谱的自洽计算
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2024-06-25
err3
errOAAI
errDonko, Zoltan; Tsankov, Tsanko, V; Hartmann, Peter; Jenina Arellano, Fatima; Czarnetzki, Uwe; Hamaguchi, Satoshi
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Surface chemical reactions of etch stop prevention in plasma-enhanced atomic layer etching of silicon nitride氮化硅的等离子体增强原子层蚀刻中防止蚀刻停止的表面化学反应
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2024-02-01
err6
PREAI
errTercero, Jomar U.; Hirata, Akiko; Isobe, Michiro; Karahashi, Kazuhiro; Fukasawa, Masanaga; Hamaguchi, Satoshi
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First-principles simulation of optical emission spectra for low-pressure argon plasmas and its experimental validation
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-12-18
err6
PREAI
errJenina Arellano, Fatima; Gyulai, Marton; Donko, Zoltan; Hartmann, Peter; Tsankov, Tsanko, V; Czarnetzki, Uwe; Hamaguchi, Satoshi
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Global numerical simulation of chemical reactions in phosphate-buffered saline (PBS) exposed to atmospheric-pressure plasmas
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-08-23
err2
PREAI
errAlfianto, Enggar; Ikuse, Kazumasa; Hamaguchi, Satoshi
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Spectroscopic analysis improvement using convolutional neural networks
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2023-05-26
err4
PREAI
errSaura, N.; Garrido, D.; Benkadda, S.; Ibano, K.; Ueda, Y.; Hamaguchi, S.
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Foundations of machine learning for low-temperature plasmas: methods and case studies
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-03-02
err24
PREAI
errBonzanini, Angelo D.; Shao, Ketong; Graves, David B.; Hamaguchi, Satoshi; Mesbah, Ali
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The 2021 release of the Quantemol database (QDB) of plasma chemistries and reactions
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-12-09
err19
errOAAI
errTennyson, Jonathan; Mohr, Sebastian; Hanicinec, M.; Dzarasova, Anna; Smith, Carrick; Waddington, Sarah; Liu, Bingqing; Alves, Luis L.; Bartschat, Klaus; Bogaerts, Annemie; Engelmann, Sebastian U.; Gans, Timo; Gibson, Andrew R.; Hamaguchi, Satoshi; Hamilton, Kathryn R.; Hill, Christian; O'Connell, Deborah; Rauf, Shahid; van 't Veer, Kevin; Zatsarinny, Oleg
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Foundations of atomic-level plasma processing in nanoelectronics纳米电子学原子级等离子体处理的基础
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-10-25
err26
errOAAI
errArts, Karsten; Hamaguchi, Satoshi; Ito, Tomoko; Karahashi, Kazuhiro; Knoops, Harm C. M.; Mackus, Adriaan J. M.; Kessels, Wilhelmus M. M. (Erwin)
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The 2022 Plasma Roadmap: low temperature plasma science and technology2022等离子体路线图: 低温等离子体科学与技术
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2022-07-05
err301
errOAAI
errAdamovich, I; Agarwal, S.; Ahedo, E.; Alves, L. L.; Baalrud, S.; Babaeva, N.; Bogaerts, A.; Bourdon, A.; Bruggeman, P. J.; Canal, C.; Choi, E. H.; Coulombe, S.; Donko, Z.; Graves, D. B.; Hamaguchi, S.; Hegemann, D.; Hori, M.; Kim, H-H; Kroesen, G. M. W.; Kushner, M. J.; Laricchiuta, A.; Li, X.; Magin, T. E.; Thagard, S. Mededovic; Miller, V; Murphy, A. B.; Oehrlein, G. S.; Puac, N.; Sankaran, R. M.; Samukawa, S.; Shiratani, M.; Simek, M.; Tarasenko, N.; Terashima, K.; Thomas, E., Jr.; Trieschmann, J.; Tsikata, S.; Turner, M. M.; van der Walt, I. J.; van de Sanden, M. C. M.; von Woedtke, T.
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Why are physical sputtering yields similar for incident ions with different masses?-physical sputtering yields of the Lennard-Jones system为什么不同质量的入射离子的物理溅射产率相似？-lennard-jones系统的物理溅射产率
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2022-03-08
err8
errOAAI
errMauchamp, Nicolas A.; Hamaguchi, Satoshi
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Amine modification of calcium phosphate by low-pressure plasma for bone regeneration
errSCIENTIFIC REPORTS
IF3.9
err2021-09-09
err8
errOAAI
errKodama, Joe; Harumningtyas, Anjar Anggraini; Ito, Tomoko; Michlicek, Miroslav; Sugimoto, Satoshi; Kita, Hidekazu; Chijimatsu, Ryota; Ukon, Yuichiro; Kushioka, Junichi; Okada, Rintaro; Kamatani, Takashi; Hashimoto, Kunihiko; Tateiwa, Daisuke; Tsukazaki, Hiroyuki; Nakagawa, Shinichi; Takenaka, Shota; Makino, Takahiro; Sakai, Yusuke; Necas, David; Zajickova, Lenka; Hamaguchi, Satoshi; Kaito, Takashi
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Molecular dynamics simulation of amine groups formation during plasma processing of polystyrene surfaces
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2020-10-30
err11
errOAAI
errMichlicek, Miroslav; Hamaguchi, Satoshi; Zajickova, Lenka
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Modeling characterisation of a bipolar pulsed discharge
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2020-10-16
err7
errOAAI
errDonko, Zoltan; Zajickova, Lenka; Sugimoto, Satoshi; Harumningtyas, Anjar Anggraini; Hamaguchi, Satoshi
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Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species富氟离子物种对Si和SiO2反应离子刻蚀的分子动力学模拟
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2019-12-01
err27
PREAI
errTinacba, Erin Joy Capdos; Isobe, Michiro; Karahashi, Kazuhiro; Hamaguchi, Satoshi
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Effects of excitation voltage pulse shape on the characteristics of atmospheric-pressure nanosecond discharges激励电压脉冲形状对大气压纳秒放电特性的影响
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-07-24
err10
errOAAI
errDonko, Zoltan; Hamaguchi, Satoshi; Gans, Timo
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Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms由定制电压波形驱动的低压电容式氧气RF放电中的离子能量和角度分布
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2018-10-29
err46
errOAAI
errDonko, Zoltan; Derzsi, Aranka; Vass, Mate; Schulze, Julian; Schuengel, Edmund; Hamaguchi, Satoshi
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The effect of photoemission on nanosecond helium microdischarges at atmospheric pressure
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2018-05-29
err36
errOAAI
errDonko, Zoltan; Hamaguchi, Satoshi; Gans, Timo
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研究方向

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合作学者
合作期刊
J
Jonathan Tennyson
H 指数: 104 · 论文数: 1.8K
A
Annemie Bogaerts
H 指数: 102 · 论文数: 981
W
W. M. M. Kessels
H 指数: 81 · 论文数: 617
M
M. C. M. van de Sanden
H 指数: 78 · 论文数: 986
M
Mark J. Kushner
H 指数: 77 · 论文数: 875
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