Hwanyeol Park

soonchunhyang university

H指数:12

被引数:354

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Deuterium-enabled stabilization of metal/oxide interfaces via suppressed oxygen diffusion in BEOL-compatible InGaZnO thin-film transistors

通过抑制氧扩散实现与BEOL兼容的IGZO薄膜晶体管金属/氧化物界面的氘增强稳定性

j. mater. chem. c

IF0

2026-04-170

First-principles calculations reveal precursor-dependent reaction mechanisms in ZrO2 atomic layer deposition

第一性原理计算揭示了ZrO2原子层沉积中前驱体依赖的反应机理

Scientific Reports

IF3.9

2026-04-160

OAAI

Advances in area-selective atomic layer deposition: surface chemistry, challenges, and future perspectives

区域选择性原子层沉积的进展: 表面化学，挑战和未来前景

Coordination Chemistry Reviews

IF23.5

2026-03-100

PRE

Insights into Tri-silane induced surface reactions on silicon: A first-principles study

对三硅烷诱导的硅表面反应的见解：一项第一性原理研究

Surfaces and Interfaces

IF6.3

2026-02-240

PRE

Elucidating the super-cycle mechanism in atomic layer growth of HfAlOx ternary metal oxide from an ab-initio study

从第一性原理研究阐明HfAlOx三元金属氧化物原子层生长中的超循环机制

Surfaces and Interfaces

IF6.3

2026-02-170

PRE

Multiscale Computational Fluid Dynamics Modelling of Spatial Atomic Layer Deposition Processes: Application to Chamber Design and Process Control

Surfaces and Interfaces

IF6.3

2026-01-200

PRE

Tailoring surface chemistry for area-selective HfO2 films: Experimental and DFT insights

针对区域选择性HfO2薄膜的表面化学调控：实验与DFT见解

Surfaces and Interfaces

IF6.3

2025-08-280

PRE

Accelerating hydrogen evolution catalyst discovery via data-driven strategy for high-performance single-atom catalysts embedded in h-BN

通过数据驱动策略加速高性能嵌入h-BN的单原子催化剂的氢进化催化剂发现

JOURNAL OF ENERGY CHEMISTRY

IF14.9

2025-06-130

PRE

Adsorption of silane radicals governing plasma silicon deposition with dilution gases

硅烷自由基的吸附控制稀释气体下的等离子体硅沉积

PHYSICS OF FLUIDS

IF4.3

2025-04-080

PRE

First-Principles computation-driven mechanism study of tungsten growth on alumina surfaces with TiN nano-islands

TiN纳米岛氧化铝表面钨生长的第一性原理计算驱动机理研究

APPLIED SURFACE SCIENCE

IF6.9

2024-11-010

PRE

Data driven computational design of stable oxygen evolution catalysts by DFT and machine learning: Promising electrocatalysts

通过DFT和机器学习对稳定的析氧催化剂进行数据驱动的计算设计: 有希望的电催化剂

JOURNAL OF ENERGY CHEMISTRY

IF14.9

2024-04-0111

PRE

Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2024-01-223

Effect of dilution gas on the distribution characteristics of capacitively coupled plasma by comparing SiH4/He and SiH4/Ar

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2023-11-077

Ion-exchange enabled new intercalation Li metal fluorides

离子交换使新的插层Li金属氟化物成为可能

ELECTROCHEMISTRY COMMUNICATIONS

IF4.2

2023-10-011

OAAI

First-Principles Investigation of Morphological Evolution of Tungsten Growth on Alumina Surfaces: Implications for Thin-Film Growth

ACS APPLIED NANO MATERIALS

IF5.5

2022-10-213

PRE

Reaction mechanisms of chlorine reduction on hydroxylated alumina in titanium nitride growth: First principles study

APPLIED SURFACE SCIENCE

IF6.9

2021-06-018

PREAI

Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules

通过氨基硅烷抑制剂分子的离散进料增强原子层沉积的Ru薄膜的选择性

APPLIED SURFACE SCIENCE

IF6.9

2021-02-0128

PREAI

Direct observation and catalytic role of mediator atom in 2D materials

SCIENCE ADVANCES

IF12.5

2020-06-129

OAAI

Thermodynamic insights into interfacial interactions in TiN/amorphous Al2O3 hetero-structures: ab initio molecular dynamics and first principles investigation

INORGANIC CHEMISTRY FRONTIERS

IF6.4

2020-01-013

PREAI

First principles investigation on energetics, structure, and mechanical properties of amorphous carbon films doped with B, N, and Cl

掺杂B，N和Cl的非晶碳膜的能量，结构和机械性能的第一性原理研究

SCIENTIFIC REPORTS

IF3.9

2019-12-1217

OAAI

Hwanyeol Park

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