Michael Hoffmann - Publications, H-index & Citations

Michael Hoffmann

Technische Universitat Dresden

37H指数

106论文数

5.5K被引数

收录论文 35

发表时间

Roadmap on low-power electronics

APL MATERIALS

IF4.5

2024-09-17

OAAI

Ramesh, Ramamoorthy; Salahuddin, Sayeef; Datta, Suman; Diaz, Carlos H.; Nikonov, Dmitri E.; Young, Ian A.; Ham, Donhee; Chang, Meng-Fan; Khwa, Win-San; Lele, Ashwin Sanjay; Binek, Christian; Huang, Yen-Lin; Sun, Yuan-Chen; Chu, Ying-Hao; Prasad, Bhagwati; Hoffmann, Michael; Hu, Jia-Mian; Yao, Zhi (Jackie); Bellaiche, Laurent; Wu, Peng; Cai, Jun; Appenzeller, Joerg; Datta, Supriyo; Camsari, Kerem Y.; Kwon, Jaesuk; Incorvia, Jean Anne C.; Asselberghs, Inge; Ciubotaru, Florin; Couet, Sebastien; Adelmann, Christoph; Zheng, Yi; Lindenberg, Aaron M.; Evans, Paul G.; Ercius, Peter; Radu, Iuliana P.

Roadmap on ferroelectric hafnia- and zirconia-based materials and devices 铁电氧化铪和氧化锆基材料和器件路线图

APL MATERIALS

IF4.5

2023-08-30

OAAI

Silva, Jose P. B.; Alcala, Ruben; Avci, Uygar E.; Barrett, Nick; Begon-Lours, Laura; Borg, Mattias; Byun, Seungyong; Chang, Sou-Chi; Cheong, Sang-Wook; Choe, Duk-Hyun; Coignus, Jean; Deshpande, Veeresh; Dimoulas, Athanasios; Dubourdieu, Catherine; Fina, Ignasi; Funakubo, Hiroshi; Grenouillet, Laurent; Gruverman, Alexei; Heo, Jinseong; Hoffmann, Michael; Hsain, H. Alex; Huang, Fei-Ting; Hwang, Cheol Seong; Iniguez, Jorge; Jones, Jacob L.; Karpov, Ilya V.; Kersch, Alfred; Kwon, Taegyu; Lancaster, Suzanne; Lederer, Maximilian; Lee, Younghwan; Lomenzo, Patrick D.; Martin, Lane W.; Martin, Simon; Migita, Shinji; Mikolajick, Thomas; Noheda, Beatriz; Park, Min Hyuk; Rabe, Karin M.; Salahuddin, Sayeef; Sanchez, Florencio; Seidel, Konrad; Shimizu, Takao; Shiraishi, Takahisa; Slesazeck, Stefan; Toriumi, Akira; Uchida, Hiroshi; Vilquin, Bertrand; Xu, Xianghan; Ye, Kun Hee; Schroeder, Uwe

Local Epitaxial Templating Effects in Ferroelectric and Antiferroelectric ZrO2

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2022-08-05

PREAI

Chae, Kisung; Lombardo, Sarah F.; Tasneem, Nujhat; Tian, Mengkun; Kumarasubramanian, Harish; Hur, Jae; Chern, Winston; Yu, Shimeng; Richter, Claudia; Lomenzo, Patrick D.; Hoffmann, Michael; Schroeder, Uwe; Triyoso, Dina; Consiglio, Steven; Tapily, Kanda; Clark, Robert; Leusink, Gert; Bassiri-Gharb, Nazanin; Bandaru, Prab; Ravichandran, Jayakanth; Kummel, Andrew; Cho, Kyeongjae; Kacher, Josh; Khan, Asif Islam

Atomic layer etching of ferroelectric hafnium zirconium oxide thin films enables giant tunneling electroresistance 铁电铪锆氧化物薄膜的原子层蚀刻实现了巨大的隧穿电阻

APPLIED PHYSICS LETTERS

IF3.6

2022-03-25

PREAI

Hoffmann, M.; Murdzek, J. A.; George, S. M.; Slesazeck, S.; Schroeder, U.; Mikolajick, T.

Antiferroelectric negative capacitance from a structural phase transition in zirconia

NATURE COMMUNICATIONS

IF15.7

2022-03-09

OAAI

Hoffmann, Michael; Wang, Zheng; Tasneem, Nujhat; Zubair, Ahmad; Ravindran, Prasanna Venkatesan; Tian, Mengkun; Gaskell, Anthony Arthur; Triyoso, Dina; Consiglio, Steven; Tapily, Kandabara; Clark, Robert; Hur, Jae; Pentapati, Sai Surya Kiran; Lim, Sung Kyu; Dopita, Milan; Yu, Shimeng; Chern, Winston; Kacher, Josh; Reyes-Lillo, Sebastian E.; Antoniadis, Dimitri; Ravichandran, Jayakanth; Slesazeck, Stefan; Mikolajick, Thomas; Khan, Asif Islam

Ferroelectric gate oxides for negative capacitance transistors

MRS BULLETIN

IF4.9

2021-11-24

PREAI

Hoffmann, Michael; Salahuddin, Sayeef

Intrinsic Nature of Negative Capacitance in Multidomain Hf0.5Zr0.5O2-Based Ferroelectric/Dielectric Heterostructures 基于Hf0.5Zr0.5O2的多畴铁电/介电异质结构中负电容的固有性质

ADVANCED FUNCTIONAL MATERIALS

IF19

2021-10-05

OAAI

Hoffmann, Michael; Gui, Mengcheng; Slesazeck, Stefan; Fontanini, Riccardo; Segatto, Mattia; Esseni, David; Mikolajick, Thomas

Temperature-Dependent Subcycling Behavior of Si-Doped HfO2 Ferroelectric Thin Films

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2021-05-14

PREAI

Li, Shuaidong; Zhou, Dayu; Shi, Zhixin; Hoffmann, Michael; Mikolajick, Thomas; Schroeder, Uwe

Progress and future prospects of negative capacitance electronics: A materials perspective

APL MATERIALS

IF4.5

2021-02-11

108

OAAI

Hoffmann, Michael; Slesazeck, Stefan; Mikolajick, Thomas

Polarization switching in thin doped HfO2 ferroelectric layers

APPLIED PHYSICS LETTERS

IF3.6

2020-12-28

PREAI

Materano, Monica; Lomenzo, Patrick D.; Mulaosmanovic, Halid; Hoffmann, Michael; Toriumi, Akira; Mikolajick, Thomas; Schroeder, Uwe

Hafnia-Based Double-Layer Ferroelectric Tunnel Junctions as Artificial Synapses for Neuromorphic Computing 基于Hafnia的双层铁电隧道结作为神经形态计算的人工突触

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2020-11-19

113

OAAI

Max, Benjamin; Hoffmann, Michael; Mulaosmanovic, Halid; Slesazeck, Stefan; Mikolajick, Thomas

Intrinsic or nucleation-driven switching: An insight from nanoscopic analysis of negative capacitance Hf1-xZrxO2-based structures

APPLIED PHYSICS LETTERS

IF3.6

2020-10-26

PREAI

Stolichnov, I; Cavalieri, M.; Gastaldi, C.; Hoffmann, M.; Schroeder, U.; Mikolajick, T.; Ionescu, A. M.

What's next for negative capacitance electronics?负电容电子的下一步是什么？

NATURE ELECTRONICS

IF40.9

2020-09-09

PREAI

Hoffmann, Michael; Slesazeck, Stefan; Schroeder, Uwe; Mikolajick, Thomas

Why Do Ferroelectrics Exhibit Negative Capacitance?

MATERIALS

IF3.2

2019-11-13

OAAI

Hoffmann, Michael; Ravindran, Prasanna Venkatesan; Khan, Asif Islam

Negative Capacitance for Electrostatic Supercapacitors 静电超级电容器的负电容

ADVANCED ENERGY MATERIALS

IF26

2019-09-17

OAAI

Hoffmann, Michael; Fengler, Franz Paul Gustav; Max, Benjamin; Schroeder, Uwe; Slesazeck, Stefan; Mikolajick, Thomas

Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf0.5Zr0.5O2 Capacitors 体去极化场是掺杂镧的Hf0.5Zr0.5O2电容器中铁电可靠性性能的主要因素

ADVANCED MATERIALS INTERFACES

IF4.4

2019-09-06

PREAI

Mehmood, Furqan; Hoffmann, Michael; Lomenzo, Patrick D.; Richter, Claudia; Materano, Monica; Mikolajick, Thomas; Schroeder, Uwe

A high-affinity fluorescence probe for copper(II) ions and its application in fluorescence lifetime correlation spectroscopy

ANALYTICAL AND BIOANALYTICAL CHEMISTRY

IF3.8

2019-04-26

PREAI

Grueter, Andreas; Hoffmann, Michael; Mueler, Rolf; Wohland, Thorsten; Jung, Gregor

Biosynthesis and Heterologous Production of Argyrins

ACS SYNTHETIC BIOLOGY

IF3.9

2019-04-17

PREAI

Pogorevc, Domen; Tang, Ying; Hoffmann, Michael; Zipf, Gregor; Bernauer, Hubert S.; Popoff, Alexander; Steinmetz, Heinrich; Wenzel, Silke C.

Physical Approach to Ferroelectric Impedance Spectroscopy: The Rayleigh Element

PHYSICAL REVIEW APPLIED

IF4.4

2018-12-03

OAAI

Schenk, T.; Hoffmann, M.; Pesic, M.; Park, M. H.; Richter, C.; Schroeder, U.; Mikolajick, T.

Lanthanide pyrazolecarboxylates for OLEDs and bioimaging

JOURNAL OF LUMINESCENCE

IF3.6

2018-10-01

PREAI

Utochnikova, Valentina V.; Latipov, Egor, V; Dalinger, Alexander, I; Nelyubina, Yulia, V; Vashchenko, Andrey A.; Hoffmann, Michael; Kalyakina, Alena S.; Vatsadze, Sergey Z.; Schepers, Ute; Braese, Stefan; Kuzmina, Natalia P.

研究方向