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E

Engin Çiftyürek

heinrich heine university of dusseldorf
H指数:18
被引数:1,023

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From Precursor Chemistry to Gas Sensors: Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

从前体化学到气体传感器: 用于气体屏障和传感器应用的非自燃锌前体的氧化锌层的等离子体增强原子层沉积工艺工程

SMALL
IF12.1
2020-04-2825
OAAI
Mai, Lukas; Mitschker, Felix; Bock, Claudia; Niesen, Alessia; Ciftyurek, Engin; Rogalla, Detlef; Mickler, Johannes; Erig, Matthias; Li, Zheshen; Awakowicz, Peter; Schierbaum, Klaus; Devi, Anjana
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices

功能化烷基前驱体中氧化锡 (IV) 的低温等离子体增强原子层沉积: SnO2-Based薄膜晶体管器件的制备和评估

ACS APPLIED MATERIALS & INTERFACES
IF8.2
2019-01-0934
PREAI
Mai, Lukas; Zanders, David; Subasi, Ersoy; Ciftyurek, Engin; Hoppe, Christian; Rogalla, Detlef; Gilbert, Wolfram; de los Arcos, Teresa; Schierbaum, Klaus; Grundmeier, Guido; Bock, Claudia; Devi, Anjana
Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors: Process Development, Film Characterization, and Gas Sensing Properties

使用杂配亚氨基脒基前体的钼和氧化钨薄膜的原子层沉积: 工艺开发，薄膜表征和气敏特性

CHEMISTRY OF MATERIALS
IF7
2018-11-1228
PREAI
Mattinen, Miika; Wree, Jan-Lucas; Stegmann, Niklas; Ciftyurek, Engin; El Achhab, Mhamed; King, Peter J.; Mizohata, Kenichiro; Raisanen, Jyrki; Schierbaum, Klaus D.; Devi, Anjana; Ritala, Mikko; Leskela, Markku

研究方向

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K
Klaus Schierbaum
H 指数:35论文数:111被引数:5,621
E
Edward M. Sabolsky
H 指数:30论文数:176被引数:4,022
A
Anjana Devi
H 指数:45论文数:439被引数:6,584
D
Detlef Rogalla
H 指数:38论文数:283被引数:5,013
K
Katarzyna Sabolsky
H 指数:15论文数:81被引数:731
Z
Zheshen Li
H 指数:29论文数:137被引数:3,976
D
David Zanders
H 指数:13论文数:109被引数:562
A
Aleksander Kostka
H 指数:52论文数:256被引数:1.2万
J
Jan‐Lucas Wree
H 指数:12论文数:30被引数:265
C
Claudia Bock
H 指数:19论文数:75被引数:1,156