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Anjana Devi

fraunhofer gesellschaft

45H指数
438论文数
6.6K被引数
收录论文 144
发表时间
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Tunable Texture in ZnO Thin Films on 200 mm Wafers: Comparative Study of Zn(DMP)2 and Diethylzinc Precursors for ALD在200 mm晶圆上氧化锌薄膜的可调纹理：ALD中二甲基锌和二乙基锌前驱体的比较研究
errACS Applied Electronic Materials
IF4.7
err2026-06-03
err0
errOAAI
errKatherine Guzey; Noah Brechmann; Emad Najafidehaghani; Thomas Gemming; Ivan Kaban; Marcel Schmickler; Jean-Pierre Glauber; Volker Hoffmann; Detlef Rogalla; Nicolás Pérez; Harish Parala; Kornelius Nielsch; Anna Lena Schall-Giesecke; Anjana Devi; Nils Boysen
err分享
err收藏
Publishing FAIR and machine-actionable reviews in materials science: The case for symbolic knowledge in neuro-symbolic artificial intelligence在材料科学中发布FAIR和机器可操作的评审：神经符号人工智能中符号知识的案例
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errD'Souza, Jennifer; Auer, Soren; Poupaki, Eleni; Watkins, Alex; Devi, Anjana; Puurunen, Riikka L.; Karasulu, Bora; Mackus, Adriaan; Kessels, Erwin
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err收藏
Structuring large area WS2 layers grown by atomic layer deposition通过原子层沉积制备大面积WS2层的结构化
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errDoman, Leon; Boysen, Nils; Gemming, Thomas; Shi, Haowen; Devi, Anjana
err分享
err收藏
Atomic and Molecular Layer Deposition of Nd- and Eu-Based Oxide and Hybrid Thin Films: Computationally Guided Precursor Selection原子和分子层沉积法制备Nd和Eu基氧化物及杂化薄膜：计算指导的先驱物选择
errChemistry of Materials
IF7
err2026-04-19
err0
errOAAI
errFlorian Preischel; Amr Ghazy; Merve Seren; Jorit Obenlüneschloß; Rita Mullins; Detlef Rogalla; Thomas Gemming; Michael Nolan; Jörg Debus; Maarit Karppinen; Anjana Devi
err分享
err收藏
Defect Engineering in Atomic-Layer-Deposited Cerium Oxide原子层沉积氧化铈中的缺陷工程
errACS Applied Materials and Interfaces
IF8.2
err2026-03-16
err0
errOAAI
errRudi Tschammer; Marcel Schmickler; Yuliia Kosto; Karsten Henkel; Parmish Kaur; Anjana Devi; Carlos Morales; Jan Ingo Flege
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Ti-metalation of chitosan films by VPM, MPI and PEALD processes: An avenue to antiseptic scaffolds and functional biopolymers通过VPM、MPI和PEALD工艺对壳聚糖薄膜进行Ti-金属化：通向抗菌支架和功能生物聚合物的途径
errApplied Surface Science Advances
IF8.7
err2026-03-07
err0
errOAAI
errMabel Moreno; Anjana Devi; David Zanders; Miryam Arredondo; Davide Mariotti; Ruairi McGlynn; Paula Solar; Sindy Devis; Carolina Klagges; Simón Guerrero; Eglantina Benavente; Matias Alegría; Hugo Sanchéz-Ruderisch; Yusser Olguin; Elizabeth Rivas-Yañez; Valentin Cepus; Michael Krause; Luis Velazquez
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A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films用于低温等离子体增强原子层沉积氧化锗薄膜的液态Ge(IV) 前体
errSmall
IF12.1
err2026-02-19
err0
errOAAI
errFlorian Preischel; Karl Rönnby; Martin Wilken; Jean-Pierre Glauber; Samuel Froeschke; Detlef Rogalla; Thomas Gemming; Alexey A. Popov; Peter Dement; Michael Nolan; Anjana Devi
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Expanding the zinc precursor toolbox: a comparative study of precursors for thermal ALD of ZnO thin films扩展锌前驱体工具箱：用于热ALD法制备ZnO薄膜的前驱体比较研究
errdalton trans.
IF0
err2026-02-16
err0
errOAAI
errJorit Obenlüneschloß; Rajesh Pathak; Vepa Rozyyev; Anil U. Mane; Thomas Gemming; Detlef Rogalla; Jeffrey W. Elam; Anjana Devi
err分享
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HfxZr1-xO2 thin films from chemical vapor deposition of fluorinated β-ketoenamine precursors氟代β-酮烯胺前驱体化学气相沉积法制备的HfxZr1-xO2薄膜
errRSC Applied Interfaces
IF0
err2026-02-01
err0
errOAAI
errFauzi, Billy Oktora Abdilah; Lichtenberg, Andreas; Hegemann, Corinna; Fischer, Thomas; Schmickler, Marcel; Parala, Harish; Devi, Anjana; Mathur, Sanjay
err分享
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Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films
errAdvanced Materials Technologies
IF6.2
err2026-01-31
err0
errOAAI
errTopias Jussila; Jorit Obenlüneschloß; Ji Liu; Olga Partanen; Sami Vasala; Detlef Rogalla; Pieter Glatzel; Michael Nolan; Anjana Devi; Maarit Karppinen
err分享
err收藏
Ruthenium(II) carbonyl amidates – a new class of precursors for atomic layer deposition
errdalton trans.
IF0
err2026-01-29
err0
errOAAI
errJorit Obenlüneschloß; Cara-Lena Nies; Michael Gock; Michael Unkrig-Bau; Jan-Niklas Huster; Michael Nolan; Anjana Devi
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A New Synthetic Method for HfS2 Thin Films Using MOCVD
errACS Applied Materials and Interfaces
IF8.2
err2026-01-23
err0
PREAI
errJean-Pierre Glauber; Nils Boysen; Silan Baspinar; Aleksander Kostka; Detlef Rogalla; Andreas Ostendorf; Harish Parala; Taek-Mo Chung; Anjana Devi
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Cover Feature: Metamorphosis of Multilayered-(NH4)2V7O16 Squares to Zinc Vanadate and w-ZnO Nanoparticles via Zinc Metalation through Atomic Layer Deposition: Precision and Sustainability in Material Transformation (Chem. Methods 1/2026)
errChemistry-Methods
IF3.6
err2026-01-21
err0
errOAAI
errMabel. A. Moreno; Anjana Devi; Luis Velasquez; Guillermo Gonzalez; Daniel Navas
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VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties
errSMALL METHODS
IF9.1
err2025-12-01
err0
errOAAI
errGlauber, Jean-pierre; Lorenz, Julian; Liu, Ji; Seifert, Marietta; Hoffmann, Volker; Abad, Carlos; Rogalla, Detlef; Giebeler, Lars; Harms, Corinna; Wark, Michael; Nolan, Michael; Devi, Anjana
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Atomic Layer Deposition of NiOx: Harnessing the Potential of New Precursor Combinations for Photoelectrochemical Water OxidationNiOx的原子层沉积：利用新型前驱体组合的潜力用于光电化学水氧化
errJ. Mater. Chem. A
IF9.5
err2025-11-05
err0
errOAAI
errVyshnav Kannampalli; Marcel Schmickler; Bruno Fabre; Ludovic Largeau; Antoine Seyeux; Alvarez Jose; Simon D. Elliott; Anjana Devi; Lionel Santinacci
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Metamorphosis of Multilayered-(NH4)2V7O16 Squares to Zinc Vanadate and w-ZnO Nanoparticles via Zinc Metalation through Atomic Layer Deposition: Precision and Sustainability in Material Transformation
errCHEMISTRY-METHODS
IF3.6
err2025-11-01
err0
errOAAI
errMoreno, Mabel. A.; Devi, Anjana; Velasquez, Luis; Gonzalez, Guillermo; Navas, Daniel
err分享
err收藏
Outside Back Cover: Rare Mononuclear Lithium–Carbene Complex for Atomic Layer Deposition of Lithium Containing Thin Films外封底：用于原子层沉积锂含薄膜的稀有单核锂–卡宾配合物
errAngewandte Chemie International Edition
IF16.9
err2025-10-26
err0
errOAAI
errJorit Obenlüneschloß; Nils Boysen; Karl Rönnby; Arbresha Muriqi; Volker Hoffmann; Carlos Abad; Detlef Rogalla; Ulrike Brokmann; Edda Rädlein; Michael Nolan; Anjana Devi
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Heteroleptic Ruthenium p-Cymene Amidinate Complexes─A Synthetic Endeavor to Unearth Precursors for Ru Thin Films异手性钌p-辛基苯胺亚胺络合物─一种合成探索以揭示用于Ru薄膜的前驱体
errInorganic Chemistry
IF4.7
err2025-10-17
err0
PREAI
errJorit Obenlüneschloß; Jacqueline Klimars; Ilamparithy Selvakumar; Bert Mallick; Marcel Schmickler; Martin Wilken; Detlef Rogalla; Michael Gock; Michael Unkrig-Bau; Jan-Niklas Huster; Anjana Devi
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Atomic layer deposition原子层沉积
errNature Reviews Methods Primers
IF56
err2025-10-16
err0
PREAI
errErwin Kessels; Anjana Devi; Jin-Seong Park; Mikko Ritala; Angel Yanguas-Gil; Claudia Wiemer
err分享
err收藏
New dithiooxamide derivatives as promising precursors for ALD/MLD applications新型二硫代乙二酰胺衍生物作为ALD/MLD应用的极具潜力的前驱体
errDalton Trans.
IF3.3
err2025-09-29
err0
errOAAI
errParmish Kaur; Mikko Nisula; Christophe Detavernier; Anjana Devi
err分享
err收藏

研究方向

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合作学者
合作期刊
R
Rainer Waser
H 指数: 113 · 论文数: 1.1K
R
Roland A. Fischer
H 指数: 110 · 论文数: 1.4K
G
Gustaaf Van Tendeloo
H 指数: 108 · 论文数: 1.2K
W
Wu Zhou
H 指数: 107 · 论文数: 439
W
Wolfgang Schuhmann
H 指数: 103 · 论文数: 1.1K
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