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J

Joseph P. Klesko

united states department of energy (doe)

H指数:9

被引数:336

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Optical characterization of deep-level defects in n-type AlxInyGa1-x-yP for the development of solid-state photomultiplier analogs

n型AlxInyGa1-x-yP中深能级缺陷的光学表征，用于固态光电倍增管模拟器件的开发

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

IF2.1

2025-11-300

PRE

Imaging Photonic Resonances within an All-Dielectric Metasurface via Photoelectron Emission Microscopy

advanced photonics

IF3.9

2025-03-010

OA

Reactivity of Atomic Layer Deposition Precursors with OH/H2O-Containing Metal Organic Framework Materials

CHEMISTRY OF MATERIALS

IF7

2019-03-1121

PREAI

Selective Growth of Interface Layers from Reactions of Sc(MeCp)2(Me2pz) with Oxide Substrates

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-09-134

PREAI

Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform

使用三甲基铝与氟化氢或氟化氢对二氧化硅和氧化铝薄膜进行热原子层蚀刻

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-09-0425

PREAI

Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films

低温选择性原子层沉积镍金属薄膜

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2018-04-0941

PREAI

Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water

CHEMISTRY OF MATERIALS

IF7

2018-01-1623

PREAI

Low Temperature, Selective Atomic Layer Deposition of Cobalt Metal Films Using Bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and Alkylamine Precursors

CHEMISTRY OF MATERIALS

IF7

2017-08-16101

PREAI

Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl) cobalt and formic acid

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2016-12-0148

PREAI

Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1

2016-08-252

OAAI

Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films

CHEMISTRY OF MATERIALS

IF7

2016-01-2281

PREAI

Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyI)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyI)-1,4-dihydropyrazine

CHEMISTRY OF MATERIALS

IF7

2015-07-1641

PREAI