未登录

J

Jaakko Julin

University of Jyvaskyla

H指数:18

被引数:1,582

个人简介

暂无内容

教育背景

暂无内容

工作经历

暂无内容

荣誉奖项

暂无内容

Hexane and octane as gas ionizing chamber detector gas applied to ToF-ERDA spectrometer

己烷和辛烷作为气态电离室探测器的气体应用于飞行时间-E型逆质谱仪

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

IF1.3

2026-08-010

PRE

Thickness-Driven Modulation of Electronic Transport in SnSe2-grown Films by Low-Temperature Atomic Layer Deposition

ADVANCED ELECTRONIC MATERIALS

IF5.3

2025-12-010

OAAI

Toward roll-to-roll ALD of thermoelectric Al-doped ZnO thin films on flexible nanostructured PET membranes

APPLIED PHYSICS LETTERS

IF3.6

2025-03-010

PRE

Ni Drastically Modifies the Microstructure and Electrochemistry of Thin Ti and Cr Layers

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2024-01-162

OA

Droplet slipperiness despite surface heterogeneity at molecular scale (Oct, 10.1038/s441557-023-01346-3, 2023)

NATURE CHEMISTRY

IF20.2

2023-11-280

OAAI

Droplet slipperiness despite surface heterogeneity at molecular scale

NATURE CHEMISTRY

IF20.2

2023-10-2320

OAAI

Low-temperature ALD of highly conductive antimony films through the reaction of silylamide with alkoxide and alkylamide precursors

MATERIALS TODAY CHEMISTRY

IF6.7

2023-08-012

PRE

Photo-enhanced O-, H- and Br- ion production in caesium sputter negative ion source-no evidence for resonant ion pair production

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2022-09-093

OA

Strong absorption and ultrafast localisation in NaBiS2 nanocrystals with slow charge-carrier recombination

NATURE COMMUNICATIONS

IF15.7

2022-08-2436

OAAI

Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinc

CHEMISTRY OF MATERIALS

IF7

2022-05-233

OAAI

Influence of B content on microstructure, phase composition and mechanical properties of CVD Ti(B,N) coatings

IF2.9

2022-03-0111

OA

Impact of Si on the high-temperature oxidation of AlCr(Si)N coatings

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

IF14.3

2022-02-0119

OAAI

Tuning of Emission Wavelength of CaS:Eu by Addition of Oxygen Using Atomic Layer Deposition

IF3.2

2021-10-113

OAAI

Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure

SURFACE & COATINGS TECHNOLOGY

IF6.1

2021-07-010

OAAI

Measurement of the 2H(p, γ)3 He S factor at 265-1094 keV

PHYSICAL REVIEW C

IF3.4

2021-04-198

OAAI

Correlated effects of fluorine and hydrogen in fluorinated tin oxide (FTO) transparent electrodes deposited by sputtering at room temperature

室温下溅射沉积的氟化氧化锡 (FTO) 透明电极中氟和氢的相关影响

APPLIED SURFACE SCIENCE

IF6.9

2021-01-017

PREAI

Reaction Pathways for Atomic Layer Deposition with Lithium Hexamethyl Disilazide, Trimethyl Phosphate, and Oxygen Plasma

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2020-12-088

OAAI

Directionality of metal-induced crystallization and layer exchange in amorphous carbon/nickel thin film stacks

IF11.6

2020-04-019

PREAI

Lithium Diffusion in Ion-Beam Sputter-Deposited Lithium-Silicon Layers

离子束溅射沉积的锂硅层中的锂扩散

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2020-03-2711

PREAI

Microstructural evolution and thermal stability of AlCr(Si)N hard coatings revealed by in-situ high-temperature high-energy grazing incidence transmission X-ray diffraction

ACTA MATERIALIA

IF9.3

2020-03-0139

PREAI