Maarit Karppinen

Aalto University

H指数:59

被引数:1.5万

个人简介

暂无内容

教育背景

暂无内容

工作经历

暂无内容

荣誉奖项

暂无内容

Thermoelectric p-Type Iron-Based Ethylenetetrathiolate Coordination Polymers

热电p型铁基乙二硫醇配合物聚合物

Advanced Electronic Materials

IF5.3

2026-08-300

OAAI

Tailoring Photochromism Beyond Human Eye Visibility: On/Off Switchable NIR Absorption in an Aluminosilicate

调控超越人眼可见范围的光致变色：在铝硅酸盐中实现可切换的近红外吸收

Angewandte Chemie-International Edition

IF16.9

2026-07-210

Atomic and Molecular Layer Deposition of Nd- and Eu-Based Oxide and Hybrid Thin Films: Computationally Guided Precursor Selection

原子和分子层沉积法制备Nd和Eu基氧化物及杂化薄膜：计算指导的先驱物选择

Chemistry of Materials

IF7

2026-04-190

Orthorhombic ZrO2 thin films via atomic layer deposition from tris(dimethylamino)cyclopentadienyl zirconium and water

通过原子层沉积法制备的正交相ZrO2薄膜，使用原料为三(二甲胺基)环戊二烯基锆和水

Materials Today Communications

IF4.5

2026-04-070

OAAI

Area-Selective Atomic/Molecular Layer Deposition of Europium-Organic Thin Films on Graphene and Other 2D Materials for Photoluminescent Heterostructures

在石墨烯及其他二维材料上选择性区域原子/分子层沉积铕-有机薄膜用于光致发光异质结构

ACS Nano

IF16

2026-03-160

Atomic layer deposition of zinc oxide films on lateral high-aspect-ratio test structures using diethylzinc and water as precursors

使用二乙基锌和水作为前驱体在横向高纵横比测试结构上沉积氧化锌薄膜的原子层沉积

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1

2026-03-011

PRE

Simultaneous H2O:O2 Co-Reactant Pulsing for Functional Property Control of Atomic Layer Deposited ZnO, TiO2, and Al2O3 Thin Films

同时进行H2O:O2共反应物脉冲以控制原子层沉积的ZnO、TiO2和Al2O3薄膜的功能特性

Advanced Materials Interfaces

IF4.4

2026-02-010

OAAI

Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films

Advanced Materials Technologies

IF6.2

2026-01-310

OAAI

Data-driven discovery and rapid, direct synthesis of MXenes

数据驱动的MXenes发现及其快速直接合成

Science

IF45.8

2026-01-010

OAAI

Atomic Layer Deposition of Highly Conducting NiS2 Thin Films from Elemental Sulfur

ADVANCED MATERIALS INTERFACES

IF4.4

2025-12-010

OAAI

Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study

基于嵌段共聚物方法的区域选择性原子/分子层沉积：以Zn-苯二硫醇沉积为例

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1

2025-12-010

Mixed-anion compounds

混阴离子化合物

Dalton Trans.

IF3.3

2025-10-090

PRE

Tunable Electrical and Optical Properties in Atomic Layer Deposited TiO2:Pt Thin Films via Dynamic Metallic Nanoparticle Formation

通过动态金属纳米粒子形成调控原子层沉积TiO2:Pt薄膜的电学和光学性能

Advanced Materials Interfaces

IF4.4

2025-08-140

OAAI

Toward roll-to-roll ALD of thermoelectric Al-doped ZnO thin films on flexible nanostructured PET membranes

APPLIED PHYSICS LETTERS

IF3.6

2025-03-010

PRE

Highly stable and conformal Ti-organic thin films from sustainable precursors via atomic/molecular layer deposition towards green energy applications

从可持续前体通过原子/分子层沉积到绿色能源应用的高度稳定和保形的钛有机薄膜

CHEMICAL COMMUNICATIONS

IF4.2

2025-01-010

OAAI

Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements

基于稀土元素的功能薄膜的原子和分子层沉积

ADVANCED MATERIALS INTERFACES

IF4.4

2024-08-232

Layer-Engineered Functional Multilayer Thin-Film Structures and Interfaces through Atomic and Molecular Layer Deposition

通过原子和分子层沉积的层工程功能多层薄膜结构和界面

ADVANCED MATERIALS INTERFACES

IF4.4

2024-06-287

OAAI

Chemical Bonding and Crystal Structure Schemes in Atomic/Molecular Layer Deposited Fe-Terephthalate Thin Films

CHEMISTRY OF MATERIALS

IF7

2024-06-250

OAAI

Conformal Zn-Benzene Dithiol Thin Films for Temperature-Sensitive Electronics Grown via Industry-Feasible Atomic/Molecular Layer Deposition Technique

通过工业可行的原子/分子层沉积技术生长的用于温度敏感电子器件的保形Zn-苯二硫醇薄膜

SMALL

IF12.1

2024-06-090

High-pressure evolution of novel R 2 CuTiO 6 ( R = Tb - Lu) perovskite phases

SOLID STATE SCIENCES

IF3.3

2024-05-010

OAAI

Maarit Karppinen

个人简介

教育背景

工作经历

荣誉奖项

研究方向