John N. Randall - Publications, H-index & Citations

John N. Randall

zyvex corporation

27H指数

188论文数

3.6K被引数

收录论文 17

发表时间

Deep learning for electron and scanning probe microscopy: From materials design to atomic fabrication

MRS BULLETIN

IF4.9

2022-11-03

OAAI

Kalinin, Sergei, V; Ziatdinov, Maxim; Spurgeon, Steven R.; Ophus, Colin; Stach, Eric A.; Susi, Toma; Agar, Josh; Randall, John

Atomic-precision advanced manufacturing for Si quantum computing

MRS BULLETIN

IF4.9

2021-08-03

OAAI

Bussmann, Ezra; Butera, Robert E.; Owen, James H. G.; Randall, John N.; Rinaldi, Steven M.; Baczewski, Andrew D.; Misra, Shashank

Advanced Scanning Probe Nanolithography Using GaN Nanowires 使用GaN纳米线的高级扫描探针纳米光刻

NANO LETTERS

IF9.1

2021-06-30

PREAI

Behzadirad, Mahmoud; Mecholdt, Stephan; Randall, John N.; Ballard, Joshua B.; Owen, James; Rishinaramangalam, Ashwin K.; Reum, Alexander; Gotszalk, Teodor; Feezell, Daniel F.; Rangelow, Ivo W.; Busani, Tito

Scanning Tunneling Microscope Control: A Self-Tuning PI Controller Based on Online Local Barrier Height Estimation

IEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY

IF3.9

2019-09-01

PREAI

Tajaddodianfar, Farid; Moheimani, S. O. Reza; Randall, John N.

Toward Selective Ultra-High-Vacuum Atomic Layer Deposition of Metal Oxides on Si(100)

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2016-10-17

PREAI

Dick, Don; Ballard, Joshua B.; Longo, R. C.; Randall, John N.; Cho, Kyeongjae; Chabal, Yves J.

Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2016-02-01

PREAI

Longo, R. C.; Owen, J. H. G.; McDonnell, S.; Dick, D.; Ballard, J. B.; Randall, J. N.; Wallace, R. M.; Chabal, Y. J.; Cho, K.

Ab initio Study of H2 Associative Desorption on Ad-Dimer Reconstructed Si(001) and Ge(001)-(2x1) Surfaces

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2014-05-01

PREAI

Longo, R. C.; Owen, J. H. G.; McDonnell, S.; Ballard, J. B.; Wallace, R. M.; Randall, J. N.; Chabal, Y. J.; Cho, K.

Digermane Deposition on Si(100) and Ge(100): from Adsorption Mechanism to Epitaxial Growth

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2013-12-24

PREAI

Dick, Don; Veyan, Jean-Francois; Longo, R. C.; McDonnell, Stephen; Ballard, Josh B.; Qin, Xiaoye; Dong, Hong; Owen, James H. G.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.

Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2013-09-19

PREAI

McDonnell, Stephen; Longo, Roberto C.; Seitz, Oliver; Ballard, Josh B.; Mordi, Greg; Dick, Don; Owen, James H. G.; Randall, John N.; Kim, Jiyoung; Chabal, Yves J.; Cho, Kyeongjae; Wallace, Robert M.

Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

NATURE COMMUNICATIONS

IF15.7

2012-07-03

OAAI

Schmucker, S. W.; Kumar, N.; Abelson, J. R.; Daly, S. R.; Girolami, G. S.; Bischof, M. R.; Jaeger, D. L.; Reidy, R. F.; Gorman, B. P.; Alexander, J.; Ballard, J. B.; Randall, J. N.; Lyding, J. W.

Patterning of sub-1 nm dangling-bond lines with atomic precision alignment on H:Si(100) surface at room temperature

nanotechnology

IF2.8

2012-06-19

PREAI

Chen, S.; Xu, H.; Goh, K. E. J.; Liu, Lerwen; Randall, J. N.

Si2H6 Dissociative Chemisorption and Dissociation on Si(100)-(2x1) and Ge(100)-(2x1)

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2011-11-29

PREAI

Veyan, Jean-Francois; Choi, Heesung; Huang, Min; Longo, R. C.; Ballard, Josh B.; McDonnell, Stephen; Nadesalingam, Manori P.; Dong, Hong; Chopra, Irinder S.; Owen, James H. G.; Kirk, Wiley P.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.

Using patterned H-resist for controlled three-dimensional growth of nanostructures

APPLIED PHYSICS LETTERS

IF3.6

2011-04-18

PREAI

Goh, K. E. J.; Chen, S.; Xu, H.; Ballard, J.; Randall, J. N.; Von Ehr, J. R.

Fabrication of high-density nanostructures with an atomic force microscope

APPLIED PHYSICS LETTERS

IF3.6

2004-02-23

PREAI

Liu, JF; Von Ehr, JR; Baur, C; Stallcup, R; Randall, J; Bray, K