logo
科言猫学术研究的AI总结
language
手机端手机端
  • Phone Feature微信小程序
简体中文简体中文
notice消息通知
博客博客
delete
arrow
返回
Y

Yukihiro Shimogaki

University of Tokyo

26H指数
373论文数
3.1K被引数
收录论文 48
发表时间
logo
Kinetic analysis and steric-hindrance effects in thermal atomic layer deposition of high-purity cobalt films with dicobalt hexacarbonyl tert-butylacetylene as the precursor以二茂钴六羰基叔丁基乙炔为前驱体的热原子层沉积高纯钴薄膜的动力学分析与位阻效应
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errYamaguchi, Jun; Sato, Noboru; Tamaoki, Naoki; Tsukune, Atsuhiro; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Development of Time-Lag Method on Barrier Properties Evaluation of Ultrathin PVD-Co(W) Films against Cu Diffusion基于时间滞后法对超薄PVD-Co(W)薄膜抑制Cu扩散的阻隔性能评价方法研究
errECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
IF2.2
err2025-10-01
err0
PREAI
errDeng, Yubin; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Surface Reaction Kinetics of Chemical Vapor Infiltration of SiC from CH3SiCl3/H2 Revealed Using Ultradeep Microchannels采用超深微通道揭示的由CH3SiCl3/H2化学气相渗透SiC的表面反应动力学
errACS APPLIED ENGINEERING MATERIALS
IF3.5
err2025-09-01
err0
PREAI
errShima, Kohei; Otaka, Yuhei; Sato, Noboru; Funato, Yuichi; Sugiura, Hidetoshi; Nakahara, Takuya; Fukushima, Yasuyuki; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Kinetic study on heterogeneous nucleation and incubation period during chemical vapor deposition
errJOURNAL OF CHEMICAL PHYSICS
IF3.1
err2023-03-22
err3
PREAI
errShima, Kohei; Otaka, Yuhei; Sato, Noboru; Funato, Yuichi; Fukushima, Yasuyuki; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Conformal and Stoichiometric Chemical Vapor Deposition of Silicon Carbide onto Ultradeep Heterogeneous Micropores by Controlling the Initial Nucleation Stage
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2021-10-29
err7
PREAI
errShima, Kohei; Otaka, Yuhei; Sato, Noboru; Funato, Yuichi; Fukushima, Yasuyuki; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Kinetic analysis of face-centered-cubic Ti1-xAlxN film deposition by chemical vapor deposition
errMATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
IF4.6
err2021-02-01
err7
PREAI
errDeura, Momoko; Sato, Hiroki; Yamaguchi, Jun; Hirabaru, Tomoko; Kubo, Hayato; Momose, Takeshi; Tanibuchi, Takahito; Shimogaki, Yukihiro
err分享
err收藏
Porous Membranes as Sacrificial Layers Enabling Conformal Chemical Vapor Deposition Involving Multiple Film-Forming Species
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2020-10-30
err6
PREAI
errShima, Kohei; Funato, Yuichi; Sato, Noboru; Fukushima, Yasuyuki; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Changes in orientational polarization and structure of silicon dioxide film by fluorine addition
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err37
PREAI
errLim, SW; Shimogaki, Y; Nakano, Y; Tada, K; Komiyama, H
err分享
err收藏
The role of gas-phase reactions during chemical vapor deposition of copper from (hfac)Cu(tmvs)
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err34
PREAI
errChae, YK; Shimogaki, Y; Komiyama, H
err分享
err收藏
Chemical vapor deposition reactor design using small-scale diagnostic experiments combined with computational fluid dynamics simulations
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err16
PREAI
errChae, YK; Egashira, Y; Shimogaki, Y; Sugawara, K; Komiyama, H
err分享
err收藏
Reduction mechanism in the dielectric constant of fluorine-doped silicon dioxide film
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err52
PREAI
errLim, SW; Shimogaki, Y; Nakano, Y; Tada, K; Komiyama, H
err分享
err收藏
Optimization of electron cyclotron resonance reactive ion beam etching reactors for dry etching of GaAs with Cl-2
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err2
PREAI
errNishioka, K; Sugiyama, M; Nezuka, M; Shimogaki, Y; Nakano, Y; Tada, K; Komiyama, H
err分享
err收藏
Kinetic effects of methanol addition on supercritical fluid deposition of TiO2
errJOURNAL OF SUPERCRITICAL FLUIDS
IF4.4
err2018-08-01
err2
PREAI
errZhao, Yu; Jung, Kyubong; Shimoyama, Yusuke; Shimogaki, Yukihiro; Momose, Takeshi
err分享
err收藏
Experimental approach to estimate diffusivity of metal organics in supercritical CO2 at high temperatures
errJOURNAL OF SUPERCRITICAL FLUIDS
IF4.4
err2017-02-01
err5
PREAI
errZhao, Yu; Shimoyama, Yusuke; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition
errADVANCED MATERIALS INTERFACES
IF4.4
err2016-07-07
err10
PREAI
errShima, Kohei; Funato, Yuichi; Sugiura, Hidetoshi; Sato, Noboru; Fukushima, Yasuyuki; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Development of TiSiN CVD process using TiCl4/SiH4/NH3 chemistry for ULSI anti-oxidation barrier applications
errSCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
IF6.9
err2016-01-20
err16
errOAAI
errJun, K; Shimogaki, Y
err分享
err收藏
Diffusion barrier property of TiN and TiN/Al/TiN with FMCVD for Cu interconnection in films deposited ULSI
errSCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
IF6.9
err2016-01-12
err44
errOAAI
errShin, YH; Shimogaki, Y
err分享
err收藏
Material design of plasma-enhanced chemical vapour deposition SiCH films for low-k cap layers in the further scaling of ultra-large-scale integrated devices-Cu interconnects在超大规模集成器件的进一步缩放中，用于低k帽层的等离子体增强化学气相沉积SiCH膜的材料设计-Cu互连
errSCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
IF6.9
err2016-01-12
err6
errOAAI
errShimizu, Hideharu; Nagano, Shuji; Uedono, Akira; Tajima, Nobuo; Momose, Takeshi; Shimogaki, Yukihiro
err分享
err收藏
Solubility of bis-(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) in mixed supercritical CO2 and H2 systems for application in supercritical fluid deposition of Cu
errJOURNAL OF SUPERCRITICAL FLUIDS
IF4.4
err2015-10-01
err8
PREAI
errMomose, Takeshi; Kondo, Aiko; Kamiya, Tatsuya; Yamada, Hideo; Ohara, Junji; Kitamura, Yasuhiro; Uchida, Hirohisa; Shimogaki, Yukihiro; Sugiyama, Masakazu
err分享
err收藏
Precursor-based designs of nano-structures and their processing for Co(W) alloy films as a single layered barrier/liner layer in future Cu-interconnect
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2015-01-01
err17
PREAI
errShimizu, H.; Shima, K.; Suzuki, Y.; Momose, T.; Shimogaki, Y.
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
M
M. Oshima
H 指数: 56 · 论文数: 693
卢
卢红亮 (Hong-Liang Lü)
H 指数: 55 · 论文数: 424
Y
Yoshiaki Nakano
H 指数: 45 · 论文数: 1.3K
E
Eiji Abe
H 指数: 45 · 论文数: 389
R
Ryōsuke Shimizu
H 指数: 44 · 论文数: 359
查看更多