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T

Toshiaki Makabe

keio university

38H指数
329论文数
4.8K被引数
收录论文 47
发表时间
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Interrelation of electron diffusion tensor among position; velocity; and phase spaces in gases
errPlasma Sources Science and Technology
IF3.3
err2026-01-21
err0
PREAI
errToshiaki Makabe
err分享
err收藏
Drift velocity of charged particles in gases: general relationship between drift velocities in position and velocity spaces带电粒子在气体中的漂移速度：位置空间和速度空间中漂移速度的一般关系
errPHYSICA SCRIPTA
IF2.6
err2025-02-20
err0
PREAI
errMakabe, Toshiaki
err分享
err收藏
Historical development of electron swarm physics based on the Boltzmann equation towards in-depth understanding of a low-temperature collisional plasma
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-09-26
err2
PREAI
errMakabe, Toshiaki; Sugawara, Hirotake
err分享
err收藏
Current status and new insights about the capacitively coupled electronegative plasma source: injection of energetic beam-like electrons to electrode
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2022-12-22
err4
PREAI
errMakabe, Toshiaki
err分享
err收藏
Review and current status: E H mode transition in low-temperature ICP and related electron dynamics
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2021-02-12
err15
PREAI
errMitsui, Yu; Makabe, Toshiaki
err分享
err收藏
Metastables as a probe for low-temperature plasma characteristics in Ar (vol 52, 213002, 2019)
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2019-04-16
err0
PREAI
errMakabe, Toshiaki
err分享
err收藏
Metastables as a probe for low-temperature plasma characteristics in argon亚稳态作为氩气中低温等离子体特性的探针
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2019-03-14
err15
PREAI
errMakabe, Toshiaki
err分享
err收藏
Velocity distribution of electrons in time-varying low-temperature plasmas: progress in theoretical procedures over the past 70 years
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2018-03-13
err13
PREAI
errMakabe, Toshiaki
err分享
err收藏
Expression for momentum-transfer scattering in inelastic collisions in electron transport in a collisional plasma
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2015-11-09
err10
PREAI
errMakabe, Toshiaki; White, Ronald
err分享
err收藏
Low-pressure nonequilibrium plasma for a top-down nanoprocess
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2011-04-01
err7
PREAI
errMakabe, Toshiaki; Yagisawa, Takashi
err分享
err收藏
Workshop on atomic and molecular collision data for plasma modelling: database needs for semiconductor plasma processing
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2011-04-01
err7
PREAI
errMakabe, Toshiaki; Tatsumi, Tetsuya
err分享
err收藏
Spatiotemporal optical structure of plasmas in the E-to-H mode transition in an inductively coupled plasma in Ar
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2010-09-20
err12
PREAI
errMorishita, Satoshi; Hayashi, Yuichiro; Makabe, Toshiaki
err分享
err收藏
Spatial distribution of nonemissive metastables in a two-frequency capacitively coupled plasma in Ar by using a pair of optical emission lines通过使用一对光发射线，Ar中的双频电容耦合等离子体中非发射亚稳态的空间分布
errAPPLIED PHYSICS LETTERS
IF3.6
err2010-03-15
err12
errOAAI
errOhba, Tomihito; Makabe, Toshiaki
err分享
err收藏
Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2009-06-29
err33
PREAI
errHayashi, Y.; Hirao, S.; Zhang, Y.; Gans, T.; O'Connell, D.; Petrovic, Z. Lj; Makabe, T.
err分享
err收藏
Numerical investigation of relationship between micro-scale pattern, interfacial plasma structure and feature profile during deep-Si etching in two-frequency capacitively coupled plasmas in SF6/O2
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2009-03-12
err11
PREAI
errHamaoka, Fukutaro; Yagisawa, Takashi; Makabe, Toshiaki
err分享
err收藏
Nonequilibrium radio frequency plasma interacting with a surface
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2008-11-14
err9
PREAI
errMakabe, Toshiaki; Yagisawa, Takashi
err分享
err收藏
Diagnostics of N2 dissociation in RF plasmas by vacuum ultraviolet emission and absorption spectroscopy
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2008-05-02
err16
PREAI
errKitajima, Takeshi; Nakano, Toshiki; Samukawa, Seiji; Makabe, Toshiaki
err分享
err收藏
In situ measurement of plasma charging on SiO2 hole bottoms and reduction by negative charge injection during etching
errAPPLIED SURFACE SCIENCE
IF6.9
err2008-04-01
err30
PREAI
errOhmori, T.; Makabe, T.
err分享
err收藏
Diagnostics for low-energy electrons in a two-frequency capacitively coupled plasma in Ar
errAPPLIED PHYSICS LETTERS
IF3.6
err2008-02-19
err18
PREAI
errIshimaru, M.; Ohba, T.; Ohmori, T.; Yagisawa, T.; Kitajima, T.; Makabe, T.
err分享
err收藏
A numerical investigation of atomic oxygen density in an inductively coupled plasma in O2/Ar mixture
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-01-16
err26
PREAI
errSato, Toshikazu; Makabe, Toshiaki
err分享
err收藏

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