Excellent conformality of atmospheric-pressure plasma-enhanced spatial atomic layer deposition with subsecond plasma exposure timesAPPLIED PHYSICS LETTERSIF3.62023-10-315OA
Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursorDALTON TRANSACTIONSIF3.32022-01-014OA
About the importance of purge time in molecular layer deposition of alucone films†DALTON TRANSACTIONSIF3.32021-01-0118OA
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