arrow
返回
J

Jun Suda

nagoya university

46H指数
611论文数
8.5K被引数
收录论文 45
发表时间
Safe and cost-effective mist CVD as a homoepitaxial growth technology to fabricate β-Ga2O3 RF MESFETs安全且经济高效的喷雾CVD作为同质外延生长技术,用于制造β-Ga2O3 RF MESFETs
err2025-10-01
err0
PREAI
errIkeda, Hikaru; Wakamatsu, Takeru; Ando, Yuji; Takahashi, Hidemasa; Makisako, Ryutaro; Ueda, Tetsuzo; Suda, Jun; Tanaka, Katsuhisa; Fujita, Shizuo; Sugaya, Hidetaka
err分享
err收藏
Record high electron mobilities in high-purity GaN by eliminating C-induced mobility collapse
err2024-01-03
err7
PREAI
errKaneki, Shota; Konno, Taichiro; Kimura, Takeshi; Kanegae, Kazutaka; Suda, Jun; Fujikura, Hajime
err分享
err收藏
Effects of proton irradiation-induced point defects on Shockley-Read-Hall recombination lifetimes in homoepitaxial GaN p-n junctions
err2023-03-14
err2
PREAI
errNarita, Tetsuo; Kanechika, Masakazu; Tomita, Kazuyoshi; Nagasato, Yoshitaka; Kondo, Takeshi; Uesugi, Tsutomu; Ikeda, Satoshi; Kosaki, Masayoshi; Oka, Tohru; Suda, Jun
err分享
err收藏
err分享
err收藏
Identification of type of threading dislocation causing reverse leakage in GaN p-n junctions after continuous forward current stress
err2022-01-27
err20
errOAAI
errNarita, Tetsuo; Kanechika, Masakazu; Kojima, Jun; Watanabe, Hiroki; Kondo, Takeshi; Uesugi, Tsutomu; Yamaguchi, Satoshi; Kimoto, Yasuji; Tomita, Kazuyoshi; Nagasato, Yoshitaka; Ikeda, Satoshi; Kosaki, Masayoshi; Oka, Tohru; Suda, Jun
err分享
err收藏
Increase of reverse leakage current at homoepitaxial GaN p-n junctions induced by continuous forward current stress
err2021-06-22
err15
PREAI
errNarita, Tetsuo; Nagasato, Yoshitaka; Kanechika, Masakazu; Kondo, Takeshi; Uesugi, Tsutomu; Tomita, Kazuyoshi; Ikeda, Satoshi; Yamaguchi, Satoshi; Kimoto, Yasuji; Kosaki, Masayoshi; Oka, Tohru; Kojima, Jun; Suda, Jun
err分享
err收藏
Formation of highly vertical trenches with rounded corners via inductively coupled plasma reactive ion etching for vertical GaN power devices
err2021-03-09
err25
PREAI
errYamada, Shinji; Sakurai, Hideki; Osada, Yamato; Furuta, Kanji; Nakamura, Toshiyuki; Kamimura, Ryuichiro; Narita, Tetsuo; Suda, Jun; Kachi, Tetsu
err分享
err收藏
Mg-implanted bevel edge termination structure for GaN power device applications
err2021-03-03
err28
PREAI
errMatys, Maciej; Ishida, Takashi; Nam, Kyung Pil; Sakurai, Hideki; Narita, Tetsuo; Uesugi, Tsutomu; Bockowski, Michal; Suda, Jun; Kachi, Tetsu
err分享
err收藏
err分享
err收藏
Effects of ultra-high-pressure annealing on characteristics of vacancies in Mg-implanted GaN studied using a monoenergetic positron beam
err2020-10-15
err32
errOAAI
errUedono, Akira; Sakurai, Hideki; Narita, Tetsuo; Sierakowski, Kacper; Bockowski, Michal; Suda, Jun; Ishibashi, Shoji; Chichibu, Shigefusa F.; Kachi, Tetsu
err分享
err收藏
Measurement of avalanche multiplication utilizing Franz-Keldysh effect in GaN p-n junction diodes with double-side-depleted shallow bevel termination
err2019-09-30
err23
PREAI
errMaeda, Takuya; Narita, Tetsuo; Ueda, Hiroyuki; Kanechika, Masakazu; Uesugi, Tsutomu; Kachi, Tetsu; Kimoto, Tsunenobu; Horita, Masahiro; Suda, Jun
err分享
err收藏
Highly effective activation of Mg-implanted p-type GaN by ultra-high-pressure annealing
err2019-09-30
err134
PREAI
errSakurai, Hideki; Omori, Masato; Yamada, Shinji; Furukawa, Yukihiro; Suzuki, Hideo; Narita, Tetsuo; Kataoka, Keita; Horita, Masahiro; Bockowski, Michal; Suda, Jun; Kachi, Tetsu
err分享
err收藏
Deep-level transient spectroscopy studies of electron and hole traps in n-type GaN homoepitaxial layers grown by quartz-free hydride-vapor-phase epitaxy
err2019-07-02
err37
PREAI
errKanegae, Kazutaka; Fujikura, Hajime; Otoki, Yohei; Konno, Taichiro; Yoshida, Takehiro; Horita, Masahiro; Kimoto, Tsunenobu; Suda, Jun
err分享
err收藏