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收藏Safe and cost-effective mist CVD as a homoepitaxial growth technology to fabricate β-Ga2O3 RF MESFETs安全且经济高效的喷雾CVD作为同质外延生长技术,用于制造β-Ga2O3 RF MESFETs
Ikeda, Hikaru; Wakamatsu, Takeru; Ando, Yuji; Takahashi, Hidemasa; Makisako, Ryutaro; Ueda, Tetsuzo; Suda, Jun; Tanaka, Katsuhisa; Fujita, Shizuo; Sugaya, Hidetaka
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收藏Effects of proton irradiation-induced point defects on Shockley-Read-Hall recombination lifetimes in homoepitaxial GaN p-n junctions
Narita, Tetsuo; Kanechika, Masakazu; Tomita, Kazuyoshi; Nagasato, Yoshitaka; Kondo, Takeshi; Uesugi, Tsutomu; Ikeda, Satoshi; Kosaki, Masayoshi; Oka, Tohru; Suda, Jun
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收藏Identification of type of threading dislocation causing reverse leakage in GaN p-n junctions after continuous forward current stress
Narita, Tetsuo; Kanechika, Masakazu; Kojima, Jun; Watanabe, Hiroki; Kondo, Takeshi; Uesugi, Tsutomu; Yamaguchi, Satoshi; Kimoto, Yasuji; Tomita, Kazuyoshi; Nagasato, Yoshitaka; Ikeda, Satoshi; Kosaki, Masayoshi; Oka, Tohru; Suda, Jun
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收藏Increase of reverse leakage current at homoepitaxial GaN p-n junctions induced by continuous forward current stress
Narita, Tetsuo; Nagasato, Yoshitaka; Kanechika, Masakazu; Kondo, Takeshi; Uesugi, Tsutomu; Tomita, Kazuyoshi; Ikeda, Satoshi; Yamaguchi, Satoshi; Kimoto, Yasuji; Kosaki, Masayoshi; Oka, Tohru; Kojima, Jun; Suda, Jun
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收藏Highly effective activation of Mg-implanted p-type GaN by ultra-high-pressure annealing
Sakurai, Hideki; Omori, Masato; Yamada, Shinji; Furukawa, Yukihiro; Suzuki, Hideo; Narita, Tetsuo; Kataoka, Keita; Horita, Masahiro; Bockowski, Michal; Suda, Jun; Kachi, Tetsu
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