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H
Hideharu Matsuura
Osaka Electro-Communication University
20
H指数
157
论文数
1.7K
被引数
0
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7
发表时间
发表时间
IF
被引数
Physical picture of nearest-neighbor hopping conduction in heavily Al-doped p-type 4H-SiC
重Al掺杂p型4H-SiC中最近邻跳跃传导的物理图像
Japanese Journal of Applied Physics
IF
1.8
2026-04-30
0
PRE
AI
Matsuura, Hideharu; Narita, Tomoya; Hidaka, Atsuki; Eto, Kazuma; Ji, Shiyang; Kojima, Kazutoshi; Kato, Tomohisa; Yoshida, Sadafumi
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Low-temperature transition from band conduction to nearest-neighbor hopping conduction in heavily Al-doped 4H-SiC epilayers
重Al掺杂4H-SiC外延层中低温下从能带传导到最近邻跳跃传导的转变
Japanese Journal of Applied Physics
IF
1.8
2026-04-17
0
PRE
AI
Matsuura, Hideharu; Narita, Tomoya; Iwatsuki, Mitsuhide; Hidaka, Atsuki; Eto, Kazuma; Ji, Shiyang; Kojima, Kazutoshi; Kato, Tomohisa
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Gated Silicon Drift Detector Fabricated from a Low-Cost Silicon Wafer
由低成本硅晶片制成的门控硅漂移检测器
SENSORS
IF
3.5
2015-05-22
5
OA
AI
Matsuura, Hideharu; Sakurai, Shungo; Oda, Yuya; Fukushima, Shinya; Ishikawa, Shohei; Takeshita, Akinobu; Hidaka, Atsuki
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Influence of excited states of a deep substitutional dopant on majority-carrier concentration in semiconductors
PHYSICAL REVIEW B
IF
3.7
2006-12-26
9
PRE
AI
Matsuura, Hideharu
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Decrease in Al acceptor density in Al-doped 4H-SiC by irradiation with 4.6 MeV electrons
APPLIED PHYSICS LETTERS
IF
3.6
2003-12-15
43
PRE
AI
Matsuura, H; Aso, K; Kagamihara, S; Iwata, H; Ishida, T; Nishikawa, K
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Temperature dependence of electron concentration in type-converted silicon by 1x1017 cm-2 fluence irradiation of 1 MeV electrons
APPLIED PHYSICS LETTERS
IF
3.6
2000-04-10
29
PRE
AI
Matsuura, H; Uchida, Y; Nagai, N; Hisamatsu, T; Aburaya, T; Matsuda, S
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Effects of corrugated insulator on electrical insulation in vacuum
波纹绝缘子对真空电绝缘性能的影响
VACUUM
IF
3.9
1996-06-01
4
PRE
AI
Yamamoto, O; Hara, T; Matsuura, H; Tanabe, Y; Konishi, T
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合作学者
合作期刊
O
Osamu Yamamoto
H 指数: 74 · 论文数: 959
K
Kazutoshi Kojima
H 指数: 31 · 论文数: 389
S
Sadafumi Yoshida
H 指数: 27 · 论文数: 210
T
Takuya Ishida
H 指数: 22 · 论文数: 99
T
T. Hisamatsu
H 指数: 17 · 论文数: 53
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