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M

M. S. Ramachandra Rao

indian institute of technology system
H指数:49
被引数:9,729

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Tailoring Surface Terminations (−OH; ═O; −F; or −Cl) in Ti3C2Tx MXenes via Li+; Na+; and K+ Intercalation: Insight into Structural and Electrical Properties

通过Li+、Na+和K+插层调控Ti3C2Tx MXenes的表面终止基团(−OH; ═O; −F; 或 −Cl):对结构与电学性质的见解

2026-04-290
PRE
Computational Study of Gas-Phase and Surface Kinetics in a Clamshell Type Microwave Plasma Chemical Vapor Deposition Reactor for Diamond Growth

计算研究:用于金刚石生长的贝壳型微波等离子体化学气相沉积反应器中的气相和表面动力学

2025-12-010
PRE
Comparative Study on the Effect of Additional Gas Outlet in Substrate Holder on Diamond Quality and Growth Rate in an Microwave Plasma Chemical Vapor Deposition Reactor

微波等离子体化学气相沉积反应器中,基座夹持器附加气体出口对金刚石质量和生长速率影响的比较研究

2025-11-010
PRE