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Yu. Yu. Lebedinskiǐ

Moscow Institute of Physics and Technology

H指数:23

被引数:1,742

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Atomic Layer Deposited Ultrathin TiO2 layer and its influence on the MoS2/TiO2 and MoS2/TiO2/Ru interfaces

原子层沉积的超薄TiO2层及其对MoS2/TiO2和MoS2/TiO2/Ru界面的影响

IF3.9

2026-05-010

PRE

Size Dependence of the Band Gap of Core-Shell Tantalum and Tantalum Oxide (V) Nanoclusters

IF4.3

2024-12-260

OAAI

Low-Energy He+ Ions Induced Functionalization of the MoS2 Surface for ALD HfO2 Growth Enhancement

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2023-08-171

PRE

Proposal for a nuclear light source

CHINESE PHYSICS C

IF3.1

2023-02-011

OA

Chemical and electronic properties of interfaces between RuO2 and Hf0.5Zr0.5O2 studied by x-ray photoelectron spectroscopy

APPLIED PHYSICS LETTERS

IF3.6

2023-01-094

PRE

Band bending and k-resolved band offsets at the HfO2/n+(p+)Si interfaces explored with synchrotron-radiation ARPES/XPS

PHYSICAL REVIEW MATERIALS

IF3.4

2022-08-304

OA

Influence of the Annealing Temperature and Applied Electric Field on the Reliability of TiN/Hf0.5Zr0.5O2/TiN Capacitors

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2021-09-3017

PREAI

Interface engineering for enhancement of the analog properties of W/WO3- x /HfO2/Pd resistance switched structures

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2021-09-2814

PRE

Radical-Enhanced Atomic Layer Deposition of a Tungsten Oxide Film with the Tunable Oxygen Vacancy Concentration

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2020-07-2419

PREAI

Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2019-11-2221

PREAI

Wake-Up in a Hf0.5Zr0.5O2 Film: A Cycle-by-Cycle Emergence of the Remnant Polarization via the Domain Depinning and the Vanishing of the Anomalous Polarization Switching

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2019-02-1289

PREAI

Size dependence of the Anderson singularity index and Seebeck coefficient of thin monodisperse nanocluster metal films

单分散纳米簇金属薄膜的安德森奇异性指数和塞贝克系数的尺寸依赖性

SURFACE & COATINGS TECHNOLOGY

IF6.1

2018-06-011

PREAI

Size-ordered 63Ni nanocluster film as a betavoltaic battery unit

APPLIED PHYSICS LETTERS

IF3.6

2018-04-055

PREAI

Nanocluster size dependence of electronic properties of Ta, Mo, Co, and Ni thin films formed by magnetron sputtering

IF3.9

2018-03-012

PREAI

Estimation of the operating parameters of miniature radioisotope thermoelectric power unit based on the Th-228 isotope

III INTERNATIONAL CONFERENCE ON LASER AND PLASMA RESEARCHES AND TECHNOLOGIES

IF0

2018-01-120

OAAI

Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy

通过原位角分辨x射线光电子能谱研究原子层沉积的初始和稳态Ru生长

APPLIED SURFACE SCIENCE

IF6.9

2017-10-0123

PREAI

In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2017-04-0650

PREAI

Formation of local thorium silicate compound by electrochemical deposition from an acetone solution of thorium nitrate

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY

IF3.2

2016-11-282

PREAI

Nanocluster metal films as thermoelectric material for radioisotope mini battery unit

chemical physics

IF2.4

2016-10-0110

PREAI

Full ALD Ta2O5-based stacks for resistive random access memory grown with in vacuo XPS monitoring

APPLIED SURFACE SCIENCE

IF6.9

2015-11-0138

PREAI