Multiscale conformal pattern transfer

doi:10.1038/srep28490

2016-06-22

DOI：10.1038/srep28490

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摘要

En 中文

We demonstrate a method for seamless transfer from a parent flat substrate of basically any lithographic top-down or bottom-up pattern onto essentially any kind of surface. The nano-or microscale patterns, spanning macroscopic surface areas, can be transferred with high conformity onto a large variety of surfaces when such patterns are produced on a thin carbon film, grown on top of a sacrificial layer. The latter allows lifting the patterns from the flat parent substrate onto a water-air interface to be picked up by the host surface of choice. We illustrate the power of this technique by functionalizing broad range of materials including glass, plastics, metals, rough semiconductors and polymers, highlighting the potential applications in in situ colorimetry of the chemistry of materials, anti-counterfeit technologies, biomolecular and biomedical studies, light-matter interactions at the nanoscale, conformal photovoltaics and flexible electronics.

Keyword:

ETCH RATES

LITHOGRAPHY

NANOSTRUCTURES

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期刊

Scientific Reports

IF:

3.9

论文数:

27.8W

被引数:

83.5W

机构

chalmers university of technology

学者数:

1.5W

论文数: 1.6W

被引数: 10

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