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J
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
论文数
101
被引数
相关解读
0
订阅
期刊论文
101
相关解读
0
期刊论文
101
发表时间
发表时间
IF
被引数
Enhancement of etch rate and selectivity for tungsten carbide hardmask
碳化钨硬质掩模的刻蚀速率和选择性增强
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Song, Wan Soo; Kim, Beom Seok; Kim, Aram; Hong, Sang Jeen
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Field emission properties of large-area flexible emitter based on polyvinyl alcohol-carbon nanotube nanocomposite
基于聚乙烯醇-碳纳米管纳米复合物的大面积柔性发射极场发射特性
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Filippov, Sergei V.; Vasin, Sergei V.; Trofimuk, Andrei D.; Kolosko, Anatoly G.; Popov, Mikhail E.; Popov, Eugeni O.
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Parametric study and performance evaluation of the louver structure in the pumping pipeline of electron beam evaporation coating equipment
电子束蒸发镀膜设备抽气管道中百叶窗结构的参数化研究及性能评估
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Yuan, Zuhao; Li, Yong; She, Pengcheng; Gong, Jun; Shi, Renping; He, Qiufu; Liu, Fangting; Li, Junhui
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Ultralow-pressure inductively coupled plasma etching of high-aspect-ratio SiO2 structures: Mitigation of transport-limited etching and stable profile control
低压感应耦合等离子体刻蚀高深宽比SiO2结构:缓解传输限制刻蚀和稳定轮廓控制
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Wei, Jiachen; Yang, Chen; Kim, Kyong-Nam; Kwon, Kwang-Ho
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Ion beam mixing effects in focused ion beam time-of-flight secondary ion mass spectrometry
聚焦离子束飞行时间二次离子质谱法中的离子束混合效应
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Gamachchi, Dilan M.; Ziemke, Carson D.; Miller, Jackson M.; Davison, Harrison C.; Vandendaele, Wyatt B.; Denn, Patricia A.; Stoddard, Bryce D.; Davidson, Carter T.; Aurora, Vishvi N.; Stalla, David; Niavol, Somayeh Saadat; Meng, Andrew C.
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On the contrast mechanism of scanning microwave impedance microscopy on buried and doped features
关于扫描微波阻抗显微镜对埋层和掺杂特征的对比机制
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Magnarin, Lorenzo Andrea; Caligaris, Filippo Ozino; Moran-Meza, Jose; Aghassi-Hagmann, Jasmin; Celano, Umberto
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Blade coating-based scalable assembly of electronically active, solution-processed 2D semiconductors
基于刀片涂覆的可扩展组装电子活性、溶液处理的二维半导体
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
1
PRE
AI
Hong, Jiwon; Song, Okin; Kang, Joohoon
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Diffusion-isolated pressure equilibration for multigas refractometry
多气体折射测量中的扩散隔离压力平衡
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Silander, I.; Zakrisson, J.; Axner, O.; Zelan, M.
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Adaptive simulation framework for dynamic shadow mask optimization in physical vapor deposition of optical coatings
光学涂层物理气相沉积中动态阴影掩模优化的自适应仿真框架
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Reyes Ramirez, Bartolome; Carballo Manuel, Claudia; Cervantes-Lozano, Joel; Gonzalez Galicia, Miguel Angel; Mansurova, Svetlana; Korneev, Nikolai
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Impact of ammonia flow rate on nonradiative recombination centers and localized states grown in InGaN multiquantum wells
氨气流量对InGaN多量子阱中非辐射复合中心和局域态生长的影响
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Fan, Ziqi; Liang, Feng; Yang, Jing; Liu, Zongshun; Hou, Yufei; Zhang, Yuheng; Yang, Qian; Zhao, Degang
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Modular mobile sample holder for transport measurements in liquid-helium-free cryostats
无液氦低温恒温器中用于输运测量的模块化移动样品架
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Ilin, Eduard; Colla, Eugene V.; Burkova, Irina
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Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration
离子束整形中光刻胶线宽粗糙度的优化:平台角度配置的系统性研究
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Wu, Xiaojian; Dong, Shuo; Xu, Kaidong; Zhuang, Shiwei
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Influence of Ar ion beam on WSe2 and resulting contact interfaces in 2D field-effect transistors
Ar离子束对WSe2及其在二维场效应晶体管中形成接触界面的影响
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Holmes, Samantha K.; Zhang, Baiyu; Ravel, Victoria M.; Doherty, James L.; Smith, Brittany N.; Franklin, Aaron D.
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Dual-gate Hf-doped InZnO field-effect transistors with sub-0.1 V threshold voltage shift under bias stress
李, T.; 胡, R. 双栅Hf掺杂InZnO场效应晶体管在偏压应力下阈值电压偏移小于0.1 V. 真空科学与技术B 2026, 44, 030602. [Google Scholar] [CrossRef]
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Li, Tiaoyang; Hu, Rongling
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Fully dry-processed positive-tone electron beam lithography using myo-inositol
全干法正性电子束光刻技术使用肌醇六磷酸
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Smith, R. D.; Scherer, A.
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Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects
考虑台面振动效应的极紫外光刻中接触孔明场与暗场成像研究
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Shen, Hao; Zhang, Libin; Wang, Jiashuo; Rui, Dinghai; Su, Yajuan; Wei, Yayi
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Color-tuning of InGaN quantum discs by molecular beam epitaxy
InGaN量子盘的分子束外延颜色调谐
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Vafadar, Mohammad Fazel; Radford, Melissa; Kavanagh, Karen L.; Zhao, Songrui
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Effect of hydrogen annealing on the hydrogen sensing response of palladium thin films
氢退火对钯薄膜氢气传感响应的影响
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Tang, Zheng; Jiao, Yizhou; Feng, Le; Zhang, Qiaogen; Fu, Zhong; Hu, Kai; Hu, Dan; Zhao, Aihua
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Ag-doping induced enhancement in power factor of flexible n-type Bi2Te2.7Se0.3 thin films
Ag掺杂诱导的柔性n型Bi₂Te₂.₇Se₀.₃薄膜功率因子的增强
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Tian, Xujiang; Wu, Chonghao; Ma, Congming; Liang, Shaojun; Zhu, Hanming; Yue, Song
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Multiphysics simulation of non-uniform magnetic fields' effect on plasma uniformity in capacitively coupled plasmas
电容耦合等离子体中非均匀磁场对等离子体均匀性的多物理场模拟
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF
1.2
2026-05-01
0
PRE
AI
Cui, Yu-Meng; Liu, Ze-Xuan; Zhang, Si-Bo; Chen, Long; Zhang, Quan-Zhi
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