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Samsung Electronics Company Ltd
学者数4
论文数3
被引数0
关联论文 (3)
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Role of Energy-Dependent Secondary Electron Emissions in Nonlinear Amplification of Plasma Density in Capacitive RF Discharge for Surface ProcessingShin, J.H.; Kim, C.H.; Lee, H.J. 能量依赖性二次电子发射在电容射频放电中非线性放大等离子体密度的作用(用于表面处理)。Plasma Process. Polym. 2026, 23, e70232. [Google Scholar] [CrossRef] [Scilit]

