logo
科言猫学术研究的AI总结
language
手机端手机端
  • Phone Feature微信小程序
简体中文简体中文
notice消息通知
博客博客
delete
arrow
返回
M

M. Gribelyuk

Tokyo Institute of Technology

29H指数
110论文数
4.4K被引数
收录论文 14
发表时间
logo
Spin Hall magnetic field sensing device using topological insulator
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-12-09
err0
PREAI
errLiu, Min; Zhang, Ruixian; Le, Quang; York, Brian; Hwang, Cherngye; Liu, Xiaoyong; Gribelyuk, Michael; Xu, Xiaoyu; Le, Son; Maeda, Maki; Fan, Tuo; Tao, Yu; Takano, Hisashi; Hai, Pham Nam
err分享
err收藏
High spin Hall angle in BiSb topological insulator and perpendicularly magnetized CoFeB/MgO multilayers with metallic interfacial layers
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-02-14
err2
PREAI
errRuixian, Zhang; Huy, Ho Hoang; Shirokura, Takanori; Hai, Pham Nam; Le, Quang; York, Brian; Hwang, Cherngye; Liu, Xiaoyong; Gribelyuk, Michael; Xu, Xiaoyu; Le, Son; Maeda, Maki; Fan, Tuo; Tao, Yu; Takano, Hisashi
err分享
err收藏
Large inverse spin Hall effect in BiSb topological insulator for 4 Tb/in2 magnetic recording technology
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-01-30
err8
PREAI
errHuy, Ho Hoang; Sasaki, Julian; Khang, Nguyen Huynh Duy; Namba, Shota; Hai, Pham Nam; Le, Quang; York, Brian; Hwang, Cherngye; Liu, Xiaoyong; Gribelyuk, Michael; Xu, Xiaoyu; Le, Son; Ho, Michael; Takano, Hisashi
err分享
err收藏
Modeling and optimization of oxynitride gate dielectrics formation by remote plasma nitridation of silicon dioxide
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err20
errOAAI
errKapila, D; Hattangady, S; Douglas, M; Kraft, R; Gribelyuk, M
err分享
err收藏
In situ investigation of growth and thermal stability of ultrathin Si layers on the HfO2/Si(100) high-κ dielectric system -: art. no. 191904
errAPPLIED PHYSICS LETTERS
IF3.6
err2005-05-02
err22
PREAI
errLebedinskii, YY; Zenkevich, A; Gusev, EP; Gribelyuk, M
err分享
err收藏
Microstructure and thermal stability of HfO2 gate dielectric deposited on Ge(100)
errAPPLIED PHYSICS LETTERS
IF3.6
err2004-09-20
err119
PREAI
errGusev, EP; Shang, H; Copel, M; Gribelyuk, M; D'Emic, C; Kozlowski, P; Zabel, T
err分享
err收藏
Thermal stability of polycrystalline silicon/metal oxide interfaces
errAPPLIED PHYSICS LETTERS
IF3.6
err2002-11-25
err2
PREAI
errCallegari, A; Gousev, E; Zabel, T; Lacey, D; Gribelyuk, M; Jamison, P
err分享
err收藏
Interfacial oxide formation and oxygen diffusion in rare earth oxide-silicon epitaxial heterostructures
errAPPLIED PHYSICS LETTERS
IF3.6
err2002-11-25
err45
PREAI
errNarayanan, V; Guha, S; Copel, M; Bojarczuk, NA; Flaitz, PL; Gribelyuk, M
err分享
err收藏
Quantitative analysis of one-dimensional dopant profile by electron holography
errAPPLIED PHYSICS LETTERS
IF3.6
err2002-04-29
err78
PREAI
errMcCartney, MR; Gribelyuk, MA; Li, J; Ronsheim, P; McMurray, JS; Smith, DJ
err分享
err收藏
Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics
errAPPLIED PHYSICS LETTERS
IF3.6
err2000-10-23
err304
PREAI
errGuha, S; Cartier, E; Gribelyuk, MA; Bojarczuk, NA; Copel, MC
err分享
err收藏
Structure and stability of ultrathin zirconium oxide layers on Si(001)
errAPPLIED PHYSICS LETTERS
IF3.6
err2000-01-24
err729
errOAAI
errCopel, M; Gribelyuk, M; Gusev, E
err分享
err收藏
High-resolution depth profiling in ultrathin Al2O3 films on Si
errAPPLIED PHYSICS LETTERS
IF3.6
err2000-01-10
err417
PREAI
errGusev, EP; Copel, M; Cartier, E; Baumvol, IJR; Krug, C; Gribelyuk, MA
err分享
err收藏
Low temperature chemical vapor deposition of ZrO2 on Si(100) using anhydrous zirconium(IV) nitrate
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2000-01-01
err46
PREAI
errSmith, RC; Hoilien, N; Taylor, CJ; Ma, TZ; Campbell, SA; Roberts, JT; Copel, M; Buchanan, DA; Gribelyuk, M; Gladfelter, WL
err分享
err收藏
Scanning capacitance spectroscopy: An analytical technique for pn-junction delineation in Si devices
errAPPLIED PHYSICS LETTERS
IF3.6
err1998-02-09
err124
PREAI
errEdwards, H; McGlothlin, R; San Martin, R; U, E; Gribelyuk, M; Mahaffy, R; Shih, CK; List, RS; Ukraintsev, VA
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
D
David J. Smith
H 指数: 87 · 论文数: 2.3K
S
Supratik Guha
H 指数: 56 · 论文数: 272
M
M. Copel
H 指数: 55 · 论文数: 271
E
E. Cartier
H 指数: 54 · 论文数: 267
W
Wayne L. Gladfelter
H 指数: 48 · 论文数: 403
查看更多